DE602007000073D1 - Vorrichtung zur Abscheidung einer Beschichtung auf der inneren Fläche eines Gefässes - Google Patents

Vorrichtung zur Abscheidung einer Beschichtung auf der inneren Fläche eines Gefässes

Info

Publication number
DE602007000073D1
DE602007000073D1 DE602007000073T DE602007000073T DE602007000073D1 DE 602007000073 D1 DE602007000073 D1 DE 602007000073D1 DE 602007000073 T DE602007000073 T DE 602007000073T DE 602007000073 T DE602007000073 T DE 602007000073T DE 602007000073 D1 DE602007000073 D1 DE 602007000073D1
Authority
DE
Germany
Prior art keywords
container
uhf
cavity
tube
length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007000073T
Other languages
English (en)
Inventor
Jean-Michel Rius
Nicolas Chomel
Yves-Alban Duclos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sidel Participations SAS
Original Assignee
Sidel Participations SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel Participations SAS filed Critical Sidel Participations SAS
Publication of DE602007000073D1 publication Critical patent/DE602007000073D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
    • B05D7/227—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of containers, cans or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Coating Apparatus (AREA)
DE602007000073T 2006-07-17 2007-07-09 Vorrichtung zur Abscheidung einer Beschichtung auf der inneren Fläche eines Gefässes Active DE602007000073D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0606480A FR2903622B1 (fr) 2006-07-17 2006-07-17 Dispositif pour le depot d'un revetement sur une face interne d'un recipient

Publications (1)

Publication Number Publication Date
DE602007000073D1 true DE602007000073D1 (de) 2008-09-25

Family

ID=37866288

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007000073T Active DE602007000073D1 (de) 2006-07-17 2007-07-09 Vorrichtung zur Abscheidung einer Beschichtung auf der inneren Fläche eines Gefässes

Country Status (10)

Country Link
US (1) US7975646B2 (de)
EP (1) EP1881088B1 (de)
JP (1) JP4612020B2 (de)
CN (1) CN101109076B (de)
AT (1) ATE404708T1 (de)
DE (1) DE602007000073D1 (de)
ES (1) ES2313701T3 (de)
FR (1) FR2903622B1 (de)
MX (1) MX2007008639A (de)
PT (1) PT1881088E (de)

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US7881785B2 (en) * 2008-03-26 2011-02-01 Cardiac Science Corporation Method and apparatus for defrosting a defibrillation electrode
US8316797B2 (en) * 2008-06-16 2012-11-27 Board of Trustees of Michigan State University Fraunhofer USA Microwave plasma reactors
WO2010009724A1 (de) * 2008-07-25 2010-01-28 Dr. Laure Plasmatechnologie Gmbh Vorrichtung zur plasmagestützten beschichtung der innenseite von rohrförmigen bauteilen
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
DE102009044496B4 (de) * 2009-11-11 2023-11-02 Muegge Gmbh Vorrichtung zur Erzeugung von Plasma mittels Mikrowellen
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2707521B1 (de) 2011-05-13 2018-08-08 Board Of Trustees Of Michigan State University Verbesserte mikrowellen-plasmareaktoren
JP5368514B2 (ja) * 2011-06-30 2013-12-18 東京エレクトロン株式会社 プラズマ処理装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
NL2007809C2 (en) * 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (de) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Verfahren und vorrichtung zur erkennung von schnellen sperrbeschichtungsintegritätseigenschaften
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102211788B1 (ko) 2013-03-11 2021-02-04 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
JP6302082B2 (ja) * 2014-03-03 2018-03-28 ピコサン オーワイＰｉｃｏｓｕｎ Ｏｙ Ａｌｄコーティングによるガスコンテナ内部の保護
EP3122917B1 (de) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
FR3032975B1 (fr) * 2015-02-23 2017-03-10 Sidel Participations Procede de traitement par plasma de recipients, comprenant une phase d'imagerie thermique
FR3035881B1 (fr) * 2015-05-04 2019-09-27 Sidel Participations Installation pour le traitement de recipients par plasma micro-ondes, comprenant un generateur a etat solide
KR20180048694A (ko) 2015-08-18 2018-05-10 에스아이오2 메디컬 프로덕츠, 인크. 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
DE102017108992A1 (de) * 2017-04-26 2018-10-31 Khs Corpoplast Gmbh Vorrichtung zur Innenbeschichtung von Behältern
US11469077B2 (en) * 2018-04-24 2022-10-11 FD3M, Inc. Microwave plasma chemical vapor deposition device and application thereof
US11261522B2 (en) * 2018-10-18 2022-03-01 Diamond Foundry Inc. Axisymmetric material deposition from plasma assisted by angled gas flow

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JPH07321096A (ja) * 1994-05-20 1995-12-08 Daihen Corp マイクロ波プラズマ処理装置
FR2792854B1 (fr) * 1999-04-29 2001-08-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
FR2812568B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Revetement barriere depose par plasma comprenant une couche d'interface, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement
JP4595276B2 (ja) * 2000-12-25 2010-12-08 東洋製罐株式会社 マイクロ波プラズマ処理方法及び装置
JP2002339074A (ja) * 2001-05-16 2002-11-27 Mitsubishi Heavy Ind Ltd 成膜装置
US20040025791A1 (en) * 2002-08-09 2004-02-12 Applied Materials, Inc. Etch chamber with dual frequency biasing sources and a single frequency plasma generating source
US7847209B2 (en) * 2002-10-09 2010-12-07 Toyo Seikan Kaisha, Ltd. Method of forming a metal oxide film and microwave power source device used for the above method
JP4442182B2 (ja) * 2002-10-09 2010-03-31 東洋製罐株式会社 金属酸化膜の形成方法
KR20050086510A (ko) * 2002-11-12 2005-08-30 다우 글로벌 테크놀로지스 인크. 용기상에 플라즈마 코팅을 퇴적시키기 위한 방법 및 장치
US20060172085A1 (en) * 2003-03-12 2006-08-03 Toyo Seikan Kaisha, Ltd Method and apparatus for chemical plasma processing of plastic container
JP4380185B2 (ja) * 2003-03-12 2009-12-09 東洋製罐株式会社 プラスチックボトル内面の化学プラズマ処理方法
EP2495350B1 (de) * 2003-03-12 2014-06-18 Toyo Seikan Group Holdings, Ltd. Mikrowellenplasmabehandlungsvorrichtung mit Gasversorgungselement
WO2004087989A1 (ja) * 2003-03-28 2004-10-14 Toyo Seikan Kaisha, Ltd. プラズマcvd法による化学蒸着膜及びその形成方法
JP4380197B2 (ja) * 2003-03-28 2009-12-09 東洋製罐株式会社 プラズマｃｖｄ法による化学蒸着膜の形成方法
JP4254320B2 (ja) * 2003-04-15 2009-04-15 東洋製罐株式会社 マイクロ波プラズマ処理装置及び処理方法
FR2871813B1 (fr) * 2004-06-17 2006-09-29 Sidel Sas Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique
FR2872148B1 (fr) * 2004-06-24 2006-09-22 Sidel Sas Machine de traitement de bouteilles equipee d'une cartouche de raccordement interchangeable
FR2872144B1 (fr) * 2004-06-24 2006-10-13 Sidel Sas Machine de traitement de recipients comportant des moyens de prehension commandes pour saisir les recipients par leur col
US8058156B2 (en) * 2004-07-20 2011-11-15 Applied Materials, Inc. Plasma immersion ion implantation reactor having multiple ion shower grids

Also Published As

Publication number Publication date
US20080011232A1 (en) 2008-01-17
CN101109076B (zh) 2010-09-29
FR2903622A1 (fr) 2008-01-18
US7975646B2 (en) 2011-07-12
ATE404708T1 (de) 2008-08-15
ES2313701T3 (es) 2009-03-01
EP1881088A1 (de) 2008-01-23
FR2903622B1 (fr) 2008-10-03
EP1881088B1 (de) 2008-08-13
JP2008025029A (ja) 2008-02-07
MX2007008639A (es) 2008-12-19
PT1881088E (pt) 2008-11-21
JP4612020B2 (ja) 2011-01-12
CN101109076A (zh) 2008-01-23

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