ATE404708T1 - Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes - Google Patents

Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes

Info

Publication number
ATE404708T1
ATE404708T1 AT07112039T AT07112039T ATE404708T1 AT E404708 T1 ATE404708 T1 AT E404708T1 AT 07112039 T AT07112039 T AT 07112039T AT 07112039 T AT07112039 T AT 07112039T AT E404708 T1 ATE404708 T1 AT E404708T1
Authority
AT
Austria
Prior art keywords
container
uhf
cavity
tube
length
Prior art date
Application number
AT07112039T
Other languages
English (en)
Inventor
Jean-Michel Rius
Nicolas Chomel
Yves-Alban Duclos
Original Assignee
Sidel Participations
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel Participations filed Critical Sidel Participations
Application granted granted Critical
Publication of ATE404708T1 publication Critical patent/ATE404708T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/3222Antennas
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
    • B05D7/227Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of containers, cans or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Coating Apparatus (AREA)
AT07112039T 2006-07-17 2007-07-09 Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes ATE404708T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0606480A FR2903622B1 (fr) 2006-07-17 2006-07-17 Dispositif pour le depot d'un revetement sur une face interne d'un recipient

Publications (1)

Publication Number Publication Date
ATE404708T1 true ATE404708T1 (de) 2008-08-15

Family

ID=37866288

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07112039T ATE404708T1 (de) 2006-07-17 2007-07-09 Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes

Country Status (10)

Country Link
US (1) US7975646B2 (de)
EP (1) EP1881088B1 (de)
JP (1) JP4612020B2 (de)
CN (1) CN101109076B (de)
AT (1) ATE404708T1 (de)
DE (1) DE602007000073D1 (de)
ES (1) ES2313701T3 (de)
FR (1) FR2903622B1 (de)
MX (1) MX2007008639A (de)
PT (1) PT1881088E (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7881785B2 (en) * 2008-03-26 2011-02-01 Cardiac Science Corporation Method and apparatus for defrosting a defibrillation electrode
US8316797B2 (en) 2008-06-16 2012-11-27 Board of Trustees of Michigan State University Fraunhofer USA Microwave plasma reactors
WO2012158532A1 (en) 2011-05-13 2012-11-22 Board Of Trustees Michigan State University Improved microwave plasma reactors
WO2010009724A1 (de) * 2008-07-25 2010-01-28 Dr. Laure Plasmatechnologie Gmbh Vorrichtung zur plasmagestützten beschichtung der innenseite von rohrförmigen bauteilen
EP2251453B1 (de) 2009-05-13 2013-12-11 SiO2 Medical Products, Inc. Behälterhalterung
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
DE102009044496B4 (de) * 2009-11-11 2023-11-02 Muegge Gmbh Vorrichtung zur Erzeugung von Plasma mittels Mikrowellen
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP5368514B2 (ja) * 2011-06-30 2013-12-18 東京エレクトロン株式会社 プラズマ処理装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2013071138A1 (en) 2011-11-11 2013-05-16 Sio2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
NL2007809C2 (en) * 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
JP6509734B2 (ja) 2012-11-01 2019-05-08 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 皮膜検査方法
EP2920567B1 (de) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Verfahren und vorrichtung zur erkennung von schnellen sperrbeschichtungsintegritätseigenschaften
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
KR102167557B1 (ko) 2013-03-11 2020-10-20 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US20160017490A1 (en) 2013-03-15 2016-01-21 Sio2 Medical Products, Inc. Coating method
EP3114250B1 (de) * 2014-03-03 2024-05-01 Picosun Oy Schutz des inneren eines gasbehälters mit einer ald-beschichtung
EP3122917B1 (de) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
FR3032975B1 (fr) * 2015-02-23 2017-03-10 Sidel Participations Procede de traitement par plasma de recipients, comprenant une phase d'imagerie thermique
FR3035881B1 (fr) * 2015-05-04 2019-09-27 Sidel Participations Installation pour le traitement de recipients par plasma micro-ondes, comprenant un generateur a etat solide
BR112018003051B1 (pt) 2015-08-18 2022-12-06 Sio2 Medical Products, Inc Tubo de coleta de sangue submetido a vácuo
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
DE102017108992A1 (de) * 2017-04-26 2018-10-31 Khs Corpoplast Gmbh Vorrichtung zur Innenbeschichtung von Behältern
US11469077B2 (en) * 2018-04-24 2022-10-11 FD3M, Inc. Microwave plasma chemical vapor deposition device and application thereof
US11261522B2 (en) * 2018-10-18 2022-03-01 Diamond Foundry Inc. Axisymmetric material deposition from plasma assisted by angled gas flow
DE102020112201A1 (de) 2020-05-06 2021-11-11 Khs Corpoplast Gmbh Vorrichtung und Verfahren zur Beschichtung von Behältern
FR3119506B1 (fr) * 2021-02-03 2023-03-31 Sairem Soc Pour Lapplication Industrielle De La Recherche En Electronique Et Micro Ondes Dispositif de production d’un plasma comprenant une unité d’allumage de plasma

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07321096A (ja) * 1994-05-20 1995-12-08 Daihen Corp マイクロ波プラズマ処理装置
FR2792854B1 (fr) * 1999-04-29 2001-08-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
FR2812568B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Revetement barriere depose par plasma comprenant une couche d'interface, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement
JP4595276B2 (ja) * 2000-12-25 2010-12-08 東洋製罐株式会社 マイクロ波プラズマ処理方法及び装置
JP2002339074A (ja) * 2001-05-16 2002-11-27 Mitsubishi Heavy Ind Ltd 成膜装置
US20040025791A1 (en) * 2002-08-09 2004-02-12 Applied Materials, Inc. Etch chamber with dual frequency biasing sources and a single frequency plasma generating source
JP4442182B2 (ja) * 2002-10-09 2010-03-31 東洋製罐株式会社 金属酸化膜の形成方法
US7847209B2 (en) * 2002-10-09 2010-12-07 Toyo Seikan Kaisha, Ltd. Method of forming a metal oxide film and microwave power source device used for the above method
BR0315487B1 (pt) * 2002-11-12 2013-12-03 Processo e aparelho para preparar uma barreira protetora para um recipiente tendo uma superfície interna
WO2004081254A1 (ja) * 2003-03-12 2004-09-23 Toyo Seikan Kaisha Ltd. マイクロ波プラズマ処理装置及びプラズマ処理用ガス供給部材
WO2004081253A1 (ja) * 2003-03-12 2004-09-23 Toyo Seikan Kaisha Ltd. プラスチック容器の化学プラズマ処理方法及び装置
JP4380185B2 (ja) * 2003-03-12 2009-12-09 東洋製罐株式会社 プラスチックボトル内面の化学プラズマ処理方法
KR101162377B1 (ko) * 2003-03-28 2012-07-09 도요 세이칸 가부시키가이샤 플라즈마 cvd법에 의한 화학 증착막 및 그 형성 방법
JP4380197B2 (ja) * 2003-03-28 2009-12-09 東洋製罐株式会社 プラズマcvd法による化学蒸着膜の形成方法
JP4254320B2 (ja) * 2003-04-15 2009-04-15 東洋製罐株式会社 マイクロ波プラズマ処理装置及び処理方法
FR2871813B1 (fr) * 2004-06-17 2006-09-29 Sidel Sas Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique
FR2872148B1 (fr) * 2004-06-24 2006-09-22 Sidel Sas Machine de traitement de bouteilles equipee d'une cartouche de raccordement interchangeable
FR2872144B1 (fr) * 2004-06-24 2006-10-13 Sidel Sas Machine de traitement de recipients comportant des moyens de prehension commandes pour saisir les recipients par leur col
US8058156B2 (en) * 2004-07-20 2011-11-15 Applied Materials, Inc. Plasma immersion ion implantation reactor having multiple ion shower grids

Also Published As

Publication number Publication date
ES2313701T3 (es) 2009-03-01
JP2008025029A (ja) 2008-02-07
JP4612020B2 (ja) 2011-01-12
US20080011232A1 (en) 2008-01-17
CN101109076B (zh) 2010-09-29
FR2903622B1 (fr) 2008-10-03
FR2903622A1 (fr) 2008-01-18
MX2007008639A (es) 2008-12-19
EP1881088A1 (de) 2008-01-23
US7975646B2 (en) 2011-07-12
EP1881088B1 (de) 2008-08-13
DE602007000073D1 (de) 2008-09-25
PT1881088E (pt) 2008-11-21
CN101109076A (zh) 2008-01-23

Similar Documents

Publication Publication Date Title
ATE404708T1 (de) Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes
Choi et al. Microwave-excited atmospheric-pressure microplasmas based on a coaxial transmission line resonator
KR101314582B1 (ko) 원자층 성장 장치 및 박막 형성 방법
CN100574003C (zh) 微波谐振腔体
ATE509365T1 (de) Verfahren zum behandeln eines gasstroms
EP3264866A1 (de) Mikrowellenplasmabehandlungsvorrichtung
KR950010714A (ko) 플라즈마 생성방법 및 장치와 그것을 사용한 플라즈마 처리방법 및 장치
KR950034579A (ko) 플라즈마 처리방법 및 장치
CA2830480A1 (en) Method and apparatus for electromagnetically producing a disturbance in a medium with simultaneous resonance of acoustic waves created by the disturbance
JP6501493B2 (ja) プラズマ処理装置
ATE371359T1 (de) Verfahren und vorrichtung zum beschichten mittels mikrowellen-plasmas auf einer fläche eines behälters aus thermoplastischem material
CN103114278A (zh) 平面磁控ecr-pecvd等离子源装置
JPWO2011099247A1 (ja) 液中プラズマ用電極、液中プラズマ発生装置およびプラズマ発生方法
CN101547549A (zh) 等离子体处理装置和方法、及用该方法处理后的被处理体
CN105430860B (zh) 大气压下直接耦合微波液相等离子体发生装置和方法
RU2595156C2 (ru) Плазменный свч реактор для газофазного осаждения алмазных пленок в потоке газа (варианты)
CN218941405U (zh) 便携式微波大气压空气等离子体发生装置
Petasch et al. Gigatron®—a new source for low-pressure plasmas
Yoshida et al. Development of surface-wave ion source using coaxial-type cavity
KR100879928B1 (ko) 마이크로웨이브 플라즈마 반응기 및 이를 포함하는 마이크로웨이브 플라즈마 발생 장치
Takahashi et al. 3P4-6 Effect of superposing ultrasonic wave on microwave plasma under water
WO2022183994A1 (zh) 一种化学元素转化的方法及装置
JP2007258093A (ja) マイクロ波プラズマ発生装置
JPH07130493A (ja) マイクロ波放電管の冷却方法及び装置
Li et al. A Tunable Coaxial Microwave Atmospheric Pressure Room-Temperature Plasma Jet for Material Processing

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties