ATE404708T1 - Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes - Google Patents

Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes

Info

Publication number
ATE404708T1
ATE404708T1 AT07112039T AT07112039T ATE404708T1 AT E404708 T1 ATE404708 T1 AT E404708T1 AT 07112039 T AT07112039 T AT 07112039T AT 07112039 T AT07112039 T AT 07112039T AT E404708 T1 ATE404708 T1 AT E404708T1
Authority
AT
Austria
Prior art keywords
container
uhf
cavity
tube
length
Prior art date
Application number
AT07112039T
Other languages
English (en)
Inventor
Jean-Michel Rius
Nicolas Chomel
Yves-Alban Duclos
Original Assignee
Sidel Participations
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel Participations filed Critical Sidel Participations
Application granted granted Critical
Publication of ATE404708T1 publication Critical patent/ATE404708T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/22—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
    • B05D7/227—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of containers, cans or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Coating Apparatus (AREA)
AT07112039T 2006-07-17 2007-07-09 Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes ATE404708T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0606480A FR2903622B1 (fr) 2006-07-17 2006-07-17 Dispositif pour le depot d'un revetement sur une face interne d'un recipient

Publications (1)

Publication Number Publication Date
ATE404708T1 true ATE404708T1 (de) 2008-08-15

Family

ID=37866288

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07112039T ATE404708T1 (de) 2006-07-17 2007-07-09 Vorrichtung zur abscheidung einer beschichtung auf der inneren fläche eines gefässes

Country Status (10)

Country Link
US (1) US7975646B2 (de)
EP (1) EP1881088B1 (de)
JP (1) JP4612020B2 (de)
CN (1) CN101109076B (de)
AT (1) ATE404708T1 (de)
DE (1) DE602007000073D1 (de)
ES (1) ES2313701T3 (de)
FR (1) FR2903622B1 (de)
MX (1) MX2007008639A (de)
PT (1) PT1881088E (de)

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US8316797B2 (en) 2008-06-16 2012-11-27 Board of Trustees of Michigan State University Fraunhofer USA Microwave plasma reactors
US20110174220A1 (en) * 2008-07-25 2011-07-21 Dr. Laure Plasmatechnologie Gmbh Device for Plasma-Assisted Coating of the Inner Side of Tubular Components
EP2251455B1 (de) 2009-05-13 2017-09-06 SiO2 Medical Products, Inc. PECVD-Beschichtung mittels siliciumorganischem Vorläufer
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
DE102009044496B4 (de) * 2009-11-11 2023-11-02 Muegge Gmbh Vorrichtung zur Erzeugung von Plasma mittels Mikrowellen
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2707521B1 (de) 2011-05-13 2018-08-08 Board Of Trustees Of Michigan State University Verbesserte mikrowellen-plasmareaktoren
JP5368514B2 (ja) * 2011-06-30 2013-12-18 東京エレクトロン株式会社 プラズマ処理装置
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
NL2007809C2 (en) 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
CA2887352A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
JP6509734B2 (ja) 2012-11-01 2019-05-08 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 皮膜検査方法
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
EP2961858B1 (de) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Beschichtete spritze.
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (de) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Beschichtungsverfahren.
EP3114250B1 (de) * 2014-03-03 2024-05-01 Picosun Oy Schutz des inneren eines gasbehälters mit einer ald-beschichtung
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
FR3032975B1 (fr) * 2015-02-23 2017-03-10 Sidel Participations Procede de traitement par plasma de recipients, comprenant une phase d'imagerie thermique
FR3035881B1 (fr) * 2015-05-04 2019-09-27 Sidel Participations Installation pour le traitement de recipients par plasma micro-ondes, comprenant un generateur a etat solide
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
DE102017108992A1 (de) * 2017-04-26 2018-10-31 Khs Corpoplast Gmbh Vorrichtung zur Innenbeschichtung von Behältern
US11469077B2 (en) * 2018-04-24 2022-10-11 FD3M, Inc. Microwave plasma chemical vapor deposition device and application thereof
US11261522B2 (en) * 2018-10-18 2022-03-01 Diamond Foundry Inc. Axisymmetric material deposition from plasma assisted by angled gas flow
DE102020112201A1 (de) 2020-05-06 2021-11-11 Khs Corpoplast Gmbh Vorrichtung und Verfahren zur Beschichtung von Behältern
FR3119506B1 (fr) * 2021-02-03 2023-03-31 Sairem Soc Pour Lapplication Industrielle De La Recherche En Electronique Et Micro Ondes Dispositif de production d’un plasma comprenant une unité d’allumage de plasma

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JPH07321096A (ja) * 1994-05-20 1995-12-08 Daihen Corp マイクロ波プラズマ処理装置
FR2792854B1 (fr) * 1999-04-29 2001-08-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
FR2812568B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Revetement barriere depose par plasma comprenant une couche d'interface, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement
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US20040025791A1 (en) * 2002-08-09 2004-02-12 Applied Materials, Inc. Etch chamber with dual frequency biasing sources and a single frequency plasma generating source
WO2004033753A1 (ja) * 2002-10-09 2004-04-22 Toyo Seikan Kaisha,Ltd. 金属酸化膜の形成方法及び該方法に用いるマイクロ波電源装置
JP4442182B2 (ja) * 2002-10-09 2010-03-31 東洋製罐株式会社 金属酸化膜の形成方法
AU2003290687A1 (en) * 2002-11-12 2004-06-03 Dow Global Technologies Inc. Process and apparatus for depositing plasma coating onto a container
CN101435075B (zh) * 2003-03-12 2011-11-02 东洋制罐株式会社 等离子体处理用气体供给构件
JP4380185B2 (ja) * 2003-03-12 2009-12-09 東洋製罐株式会社 プラスチックボトル内面の化学プラズマ処理方法
WO2004081253A1 (ja) * 2003-03-12 2004-09-23 Toyo Seikan Kaisha Ltd. プラスチック容器の化学プラズマ処理方法及び装置
JP4380197B2 (ja) * 2003-03-28 2009-12-09 東洋製罐株式会社 プラズマｃｖｄ法による化学蒸着膜の形成方法
KR101162377B1 (ko) * 2003-03-28 2012-07-09 도요 세이칸 가부시키가이샤 플라즈마 ｃｖｄ법에 의한 화학 증착막 및 그 형성 방법
JP4254320B2 (ja) * 2003-04-15 2009-04-15 東洋製罐株式会社 マイクロ波プラズマ処理装置及び処理方法
FR2871813B1 (fr) * 2004-06-17 2006-09-29 Sidel Sas Dispositif de depot, par plasma micro-ondes, d'un revetement sur une face d'un recipient en materiau thermoplastique
FR2872148B1 (fr) * 2004-06-24 2006-09-22 Sidel Sas Machine de traitement de bouteilles equipee d'une cartouche de raccordement interchangeable
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Also Published As

Publication number Publication date
JP2008025029A (ja) 2008-02-07
FR2903622A1 (fr) 2008-01-18
EP1881088A1 (de) 2008-01-23
DE602007000073D1 (de) 2008-09-25
EP1881088B1 (de) 2008-08-13
PT1881088E (pt) 2008-11-21
CN101109076B (zh) 2010-09-29
ES2313701T3 (es) 2009-03-01
US7975646B2 (en) 2011-07-12
MX2007008639A (es) 2008-12-19
US20080011232A1 (en) 2008-01-17
CN101109076A (zh) 2008-01-23
JP4612020B2 (ja) 2011-01-12
FR2903622B1 (fr) 2008-10-03

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