DE602006021706D1 - Verfahren und vorrichtung zur herstellung einer porösen quarzglasgrundmasse - Google Patents
Verfahren und vorrichtung zur herstellung einer porösen quarzglasgrundmasseInfo
- Publication number
- DE602006021706D1 DE602006021706D1 DE602006021706T DE602006021706T DE602006021706D1 DE 602006021706 D1 DE602006021706 D1 DE 602006021706D1 DE 602006021706 T DE602006021706 T DE 602006021706T DE 602006021706 T DE602006021706 T DE 602006021706T DE 602006021706 D1 DE602006021706 D1 DE 602006021706D1
- Authority
- DE
- Germany
- Prior art keywords
- preparing
- quartz glass
- glass base
- base mass
- porous quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1446—Means for after-treatment or catching of worked reactant gases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/0144—Means for after-treatment or catching of worked reactant gases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005031557A JP2006219309A (ja) | 2005-02-08 | 2005-02-08 | 多孔質石英ガラス母材の製造方法及び装置 |
PCT/JP2006/302595 WO2006085676A2 (en) | 2005-02-08 | 2006-02-08 | Process and apparatus for producing porous quartz glass base |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006021706D1 true DE602006021706D1 (de) | 2011-06-16 |
Family
ID=36678537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006021706T Active DE602006021706D1 (de) | 2005-02-08 | 2006-02-08 | Verfahren und vorrichtung zur herstellung einer porösen quarzglasgrundmasse |
Country Status (6)
Country | Link |
---|---|
US (1) | US7810356B2 (de) |
EP (1) | EP1853525B1 (de) |
JP (1) | JP2006219309A (de) |
KR (1) | KR101231479B1 (de) |
DE (1) | DE602006021706D1 (de) |
WO (1) | WO2006085676A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2010230859B2 (en) * | 2009-04-01 | 2016-04-14 | Colin Dunlop | Improved patient warming system |
JP2011225412A (ja) * | 2010-04-22 | 2011-11-10 | Asahi Glass Co Ltd | 多孔質石英ガラス母材の製造装置及び製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2557932A1 (de) * | 1975-12-22 | 1977-06-30 | Dynamit Nobel Ag | Verfahren zur herstellung von koernigem quarzglas |
JPS5939737A (ja) * | 1982-08-27 | 1984-03-05 | Sumitomo Electric Ind Ltd | 光フアイバ用ガラス母材の製造方法 |
DE3525495C1 (de) * | 1985-07-17 | 1987-01-02 | Heraeus Schott Quarzschmelze | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
JPS6272536A (ja) * | 1985-09-25 | 1987-04-03 | Asahi Glass Co Ltd | 高純度石英ガラスの製造方法 |
JPH07100614B2 (ja) * | 1985-10-15 | 1995-11-01 | 旭硝子株式会社 | 多孔質石英ガラス母材の製造方法 |
JP2522830B2 (ja) * | 1989-06-30 | 1996-08-07 | 信越石英株式会社 | 半導体熱処理用石英ガラス材料及びその製造方法 |
DE4236578A1 (de) * | 1992-10-29 | 1994-06-23 | Deutsche Bundespost Telekom | Verfahren und Vorrichtung zur Vorformherstellung für Quarzglas- Lichtwellenleiter |
JPH07300333A (ja) * | 1994-05-06 | 1995-11-14 | Shin Etsu Chem Co Ltd | 光ファイバ母材の製造方法 |
US6355587B1 (en) * | 1994-06-30 | 2002-03-12 | Ted A. Loxley | Quartz glass products and methods for making same |
JP3674793B2 (ja) * | 1995-10-31 | 2005-07-20 | 信越石英株式会社 | 紫外線レーザ用石英ガラス光学部材の製造方法 |
JPH09226530A (ja) * | 1996-02-29 | 1997-09-02 | Tokai Rika Co Ltd | 車両用アウタミラーの制御装置 |
JPH10226530A (ja) * | 1997-02-13 | 1998-08-25 | Yazaki Corp | ガラス微粒子の堆積装置 |
US7198247B2 (en) * | 2000-07-31 | 2007-04-03 | Shin-Etsu Quartz Products Co., Ltd. | Mandrel for producing quartz glass and production method for optical fiber mother material, optical fiber and quartz glass body using the same |
EP1440724B1 (de) * | 2001-10-12 | 2009-05-13 | Asahi Glass Company Ltd. | Verfahren zur entfernung von halogenhaltigem gas |
-
2005
- 2005-02-08 JP JP2005031557A patent/JP2006219309A/ja active Pending
-
2006
- 2006-02-08 EP EP06713736A patent/EP1853525B1/de not_active Expired - Fee Related
- 2006-02-08 DE DE602006021706T patent/DE602006021706D1/de active Active
- 2006-02-08 WO PCT/JP2006/302595 patent/WO2006085676A2/en active Application Filing
- 2006-02-08 KR KR1020077018212A patent/KR101231479B1/ko not_active IP Right Cessation
-
2007
- 2007-08-08 US US11/835,668 patent/US7810356B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2006085676A3 (en) | 2006-10-19 |
KR20070104396A (ko) | 2007-10-25 |
EP1853525A2 (de) | 2007-11-14 |
KR101231479B1 (ko) | 2013-02-07 |
US7810356B2 (en) | 2010-10-12 |
EP1853525B1 (de) | 2011-05-04 |
WO2006085676A2 (en) | 2006-08-17 |
US20080006058A1 (en) | 2008-01-10 |
JP2006219309A (ja) | 2006-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE451849T1 (de) | Verfahren und vorrichtung zur herstellung einer konditionierten atmosphäre | |
DE602006001507D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005007563D1 (de) | Lithografische Vorrichtung und Verfahren zur Herstellung einer Vorrichtung | |
DE602005013460D1 (de) | Verfahren und Vorrichtung zur Herstellung eines Faseraggregats | |
DE502004011981D1 (de) | Verfahren zur Herstellung einer Beleuchtungsvorrichtung und Beleuchtungsvorrichtung | |
DE602005020720D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005002155D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005000147D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005021180D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602004014695D1 (de) | Substrat-Haltesystem und Verfahren zur Herstellung einer Vorrichtung | |
DE50306189D1 (de) | Quarzglastiegel und verfahren zur herstellung desselben | |
DE602005004856D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005020893D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602006002439D1 (de) | Lithografische Vorrichtung, Kontaminantfalle und Verfahren zur Herstellung einer Vorrichtung | |
DE602005013038D1 (de) | Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung | |
DE602005010014D1 (de) | Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung | |
DE602005022150D1 (de) | Verfahren und Gerät zur Vorbereitung von Proben | |
DE502006007286D1 (de) | Verfahren und vorrichtung zur aufbereitung edelmetallhaltiger materialien | |
DE602005004949D1 (de) | Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung | |
DE602005020891D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005001835D1 (de) | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung | |
DE602005018927D1 (de) | Verfahren zur herstellung einer gecrimpten anordnung und verbundene anordnung und vorrichtung | |
DE502005007728D1 (de) | Verfahren und vorrichtung zur herstellung einer kette | |
DE602005003082D1 (de) | Verfahren zur Herstellung einer Vorrichtung | |
DE602006008936D1 (de) | Verfahren und vorrichtung zur unterstützung der startdrehung eines flugzeugs |