DE602006007857D1 - Unabhängiger konditionierender schleifkörper - Google Patents

Unabhängiger konditionierender schleifkörper

Info

Publication number
DE602006007857D1
DE602006007857D1 DE602006007857T DE602006007857T DE602006007857D1 DE 602006007857 D1 DE602006007857 D1 DE 602006007857D1 DE 602006007857 T DE602006007857 T DE 602006007857T DE 602006007857 T DE602006007857 T DE 602006007857T DE 602006007857 D1 DE602006007857 D1 DE 602006007857D1
Authority
DE
Germany
Prior art keywords
grinding body
independent conditioning
conditioning grinding
independent
grinding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006007857T
Other languages
German (de)
English (en)
Inventor
Timothy D Fletcher
Paul S Lugg
Vincent D Romero
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of DE602006007857D1 publication Critical patent/DE602006007857D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245—Pads with fixed abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • B24D7/063—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental with segments embedded in a matrix which is rubbed away during the grinding process
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
DE602006007857T 2005-07-28 2006-07-19 Unabhängiger konditionierender schleifkörper Active DE602006007857D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/191,722 US7169031B1 (en) 2005-07-28 2005-07-28 Self-contained conditioning abrasive article
PCT/US2006/028064 WO2007015911A1 (en) 2005-07-28 2006-07-19 Self-contained conditioning abrasive article

Publications (1)

Publication Number Publication Date
DE602006007857D1 true DE602006007857D1 (de) 2009-08-27

Family

ID=37402642

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006007857T Active DE602006007857D1 (de) 2005-07-28 2006-07-19 Unabhängiger konditionierender schleifkörper

Country Status (8)

Country Link
US (1) US7169031B1 (https=)
EP (1) EP1910026B1 (https=)
JP (1) JP2009502533A (https=)
KR (1) KR101299266B1 (https=)
CN (1) CN101232968B (https=)
DE (1) DE602006007857D1 (https=)
TW (1) TWI399260B (https=)
WO (1) WO2007015911A1 (https=)

Families Citing this family (31)

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US7494519B2 (en) * 2005-07-28 2009-02-24 3M Innovative Properties Company Abrasive agglomerate polishing method
US7594845B2 (en) * 2005-10-20 2009-09-29 3M Innovative Properties Company Abrasive article and method of modifying the surface of a workpiece
KR101281342B1 (ko) * 2005-11-22 2013-07-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 발광용품 어레이 및 이의 제조 방법
US20070128991A1 (en) * 2005-12-07 2007-06-07 Yoon Il-Young Fixed abrasive polishing pad, method of preparing the same, and chemical mechanical polishing apparatus including the same
US20080098659A1 (en) * 2006-10-26 2008-05-01 Chien-Min Sung Methods for securing individual abrasive particles to a substrate in a predetermined pattern
US20100051970A1 (en) * 2006-11-17 2010-03-04 Ouderkirk Andrew J Planarized led with optical extractor
CN101548397B (zh) * 2006-11-17 2011-12-21 3M创新有限公司 用于led光源的光学粘合组合物
JP4561732B2 (ja) * 2006-11-20 2010-10-13 トヨタ自動車株式会社 移動体位置測位装置
EP2087532A1 (en) * 2006-11-20 2009-08-12 3M Innovative Properties Company Optical bonding composition for led light source
US8323072B1 (en) 2007-03-21 2012-12-04 3M Innovative Properties Company Method of polishing transparent armor
US8038750B2 (en) 2007-07-13 2011-10-18 3M Innovative Properties Company Structured abrasive with overlayer, and method of making and using the same
JP5809053B2 (ja) * 2008-07-03 2015-11-10 スリーエム イノベイティブ プロパティズ カンパニー 固定研磨粒子及びそれから作製される物品
WO2010121025A1 (en) * 2009-04-17 2010-10-21 3M Innovative Properties Company Metal particle transfer article, metal modified substrate, and method of making and using the same
US8603350B2 (en) * 2009-07-17 2013-12-10 Ohara Inc. Method of manufacturing substrate for information storage media
US20130005221A1 (en) * 2011-06-30 2013-01-03 Saint-Gobain Ceramics & Plastics, Inc. Method of polishing a workpiece with an abrasive segment comprising abrasive aggregates having silicon carbide particles
US20130065490A1 (en) 2011-09-12 2013-03-14 3M Innovative Properties Company Method of refurbishing vinyl composition tile
CN102490111B (zh) * 2011-11-24 2014-06-11 上海华力微电子有限公司 一种固定磨料化学机械研磨装置
US9050697B2 (en) * 2012-03-20 2015-06-09 Jh Rhodes Company, Inc. Self-conditioning polishing pad and a method of making the same
JP6016301B2 (ja) 2013-02-13 2016-10-26 昭和電工株式会社 単結晶ＳｉＣ基板の表面加工方法、その製造方法及び単結晶ＳｉＣ基板の表面加工用研削プレート
US9633831B2 (en) * 2013-08-26 2017-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same
JP5954293B2 (ja) 2013-10-17 2016-07-20 信越半導体株式会社 研磨用の発泡ウレタンパッドのドレッシング装置
US10315289B2 (en) 2013-12-09 2019-06-11 3M Innovative Properties Company Conglomerate abrasive particles, abrasive articles including the same, and methods of making the same
EP2928275A1 (en) * 2014-04-04 2015-10-07 ABB Technology Ltd Arrangement for cooling components of a subsea electric system
KR20160147917A (ko) 2014-05-02 2016-12-23 쓰리엠 이노베이티브 프로퍼티즈 컴파니 불연속된 구조화된 연마 용품 및 작업편의 연마 방법
CN103962973A (zh) * 2014-05-08 2014-08-06 武汉法山磨料磨具有限公司 一种含羧甲基纤维素钠的树脂砂轮的制作方法
US10086500B2 (en) 2014-12-18 2018-10-02 Applied Materials, Inc. Method of manufacturing a UV curable CMP polishing pad
US10195713B2 (en) 2016-08-11 2019-02-05 3M Innovative Properties Company Lapping pads and systems and methods of making and using the same
US10654146B2 (en) * 2018-01-23 2020-05-19 Seagate Technology Llc One or more charging members used in the manufacture of a lapping plate, and related apparatuses and methods of making
CN109894930B (zh) * 2019-03-22 2021-06-25 湖南科技大学 一种缓释型柔性磨具及抛光方法
CN111300224B (zh) * 2020-04-10 2021-05-21 昆山顺天金属制品有限公司 一种磨料精选的精加工打磨机
CN118927171A (zh) * 2024-09-19 2024-11-12 郑州磨料磨具磨削研究所有限公司 一种研抛一体化复合磨具及其制备方法和应用

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JPS63274782A (ja) 1987-05-02 1988-11-11 Mishima Kosan Co Ltd ステンレス鋼のラッピング液
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JPH04250983A (ja) * 1990-11-01 1992-09-07 Noritake Co Ltd 研削用複合砥石
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US5437754A (en) * 1992-01-13 1995-08-01 Minnesota Mining And Manufacturing Company Abrasive article having precise lateral spacing between abrasive composite members
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US5958794A (en) * 1995-09-22 1999-09-28 Minnesota Mining And Manufacturing Company Method of modifying an exposed surface of a semiconductor wafer
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US6551366B1 (en) * 2000-11-10 2003-04-22 3M Innovative Properties Company Spray drying methods of making agglomerate abrasive grains and abrasive articles
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Also Published As

Publication number Publication date
US7169031B1 (en) 2007-01-30
EP1910026A1 (en) 2008-04-16
JP2009502533A (ja) 2009-01-29
US20070026774A1 (en) 2007-02-01
CN101232968B (zh) 2010-05-19
TWI399260B (zh) 2013-06-21
TW200720021A (en) 2007-06-01
EP1910026B1 (en) 2009-07-15
KR20080030054A (ko) 2008-04-03
CN101232968A (zh) 2008-07-30
KR101299266B1 (ko) 2013-08-23
WO2007015911A1 (en) 2007-02-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition