DE602006004379D1 - Nanodraht-Struktur und Verfahren zu ihrer Herstellung - Google Patents

Nanodraht-Struktur und Verfahren zu ihrer Herstellung

Info

Publication number
DE602006004379D1
DE602006004379D1 DE602006004379T DE602006004379T DE602006004379D1 DE 602006004379 D1 DE602006004379 D1 DE 602006004379D1 DE 602006004379 T DE602006004379 T DE 602006004379T DE 602006004379 T DE602006004379 T DE 602006004379T DE 602006004379 D1 DE602006004379 D1 DE 602006004379D1
Authority
DE
Germany
Prior art keywords
production
nanowire structure
nanowire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006004379T
Other languages
English (en)
Inventor
Byoung-Lyong Choi
Eun-Kyung Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of DE602006004379D1 publication Critical patent/DE602006004379D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B62LAND VEHICLES FOR TRAVELLING OTHERWISE THAN ON RAILS
    • B62BHAND-PROPELLED VEHICLES, e.g. HAND CARTS OR PERAMBULATORS; SLEDGES
    • B62B3/00Hand carts having more than one axis carrying transport wheels; Steering devices therefor; Equipment therefor
    • B62B3/04Hand carts having more than one axis carrying transport wheels; Steering devices therefor; Equipment therefor involving means for grappling or securing in place objects to be carried; Loading or unloading equipment
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/12Vaporous components, e.g. vapour-liquid-solid-growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C30B29/605Products containing multiple oriented crystallites, e.g. columnar crystallites
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/701Integrated with dissimilar structures on a common substrate
    • Y10S977/72On an electrically conducting, semi-conducting, or semi-insulating substrate
    • Y10S977/721On a silicon substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/762Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/762Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
    • Y10S977/766Bent wire, i.e. having nonliner longitudinal axis
    • Y10S977/768Helical wire
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/788Of specified organic or carbon-based composition
    • Y10S977/789Of specified organic or carbon-based composition in array format
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/81Of specified metal or metal alloy composition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
    • Y10S977/938Field effect transistors, FETS, with nanowire- or nanotube-channel region

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Transportation (AREA)
  • Combustion & Propulsion (AREA)
  • Catalysts (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE602006004379T 2005-03-09 2006-03-07 Nanodraht-Struktur und Verfahren zu ihrer Herstellung Active DE602006004379D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050019579A KR101138865B1 (ko) 2005-03-09 2005-03-09 나노 와이어 및 그 제조 방법

Publications (1)

Publication Number Publication Date
DE602006004379D1 true DE602006004379D1 (de) 2009-02-05

Family

ID=36356576

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006004379T Active DE602006004379D1 (de) 2005-03-09 2006-03-07 Nanodraht-Struktur und Verfahren zu ihrer Herstellung

Country Status (5)

Country Link
US (1) US7649192B2 (de)
EP (1) EP1700935B1 (de)
JP (1) JP2006248893A (de)
KR (1) KR101138865B1 (de)
DE (1) DE602006004379D1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7785922B2 (en) * 2004-04-30 2010-08-31 Nanosys, Inc. Methods for oriented growth of nanowires on patterned substrates
KR101138865B1 (ko) * 2005-03-09 2012-05-14 삼성전자주식회사 나노 와이어 및 그 제조 방법
US7230286B2 (en) * 2005-05-23 2007-06-12 International Business Machines Corporation Vertical FET with nanowire channels and a silicided bottom contact
WO2007136412A2 (en) 2005-12-29 2007-11-29 Nanosys, Inc. Methods for oriented growth of nanowires on patterned substrates
DE102006013245A1 (de) * 2006-03-22 2007-10-04 Infineon Technologies Ag Verfahren zur Ausbildung von Öffnungen in einer Matrizenschicht und zur Herstellung von Kondensatoren
US8822030B2 (en) 2006-08-11 2014-09-02 Aqua Resources Corporation Nanoplatelet metal hydroxides and methods of preparing same
US7736485B2 (en) * 2006-08-11 2010-06-15 Aqua Resources Corporation Nanoplatelet magnesium hydroxides and methods of preparing same
KR100829159B1 (ko) * 2006-11-03 2008-05-13 한양대학교 산학협력단 나노 와이어 및 반도체 소자 제조 방법
KR100825765B1 (ko) * 2006-12-05 2008-04-29 한국전자통신연구원 산화물계 나노 구조물의 제조 방법
US20100221894A1 (en) * 2006-12-28 2010-09-02 Industry-Academic Cooperation Foundation, Yonsei University Method for manufacturing nanowires by using a stress-induced growth
KR100872332B1 (ko) * 2007-05-28 2008-12-05 연세대학교 산학협력단 인장응력을 이용한 단결정 열전 나노선 제조 방법
US7670908B2 (en) * 2007-01-22 2010-03-02 Alpha & Omega Semiconductor, Ltd. Configuration of high-voltage semiconductor power device to achieve three dimensional charge coupling
US8143144B2 (en) * 2007-06-06 2012-03-27 Panasonic Corporation Semiconductor nanowire and its manufacturing method
KR100972909B1 (ko) * 2007-10-31 2010-07-28 주식회사 하이닉스반도체 반도체 소자 및 그 형성 방법
KR100952048B1 (ko) * 2007-11-13 2010-04-07 연세대학교 산학협력단 실리콘 나노 구조체를 이용한 액상 제조 공정 기반의실리콘박막 결정화방법
US7897494B2 (en) * 2008-06-24 2011-03-01 Imec Formation of single crystal semiconductor nanowires
KR101475524B1 (ko) 2008-08-05 2014-12-23 삼성전자주식회사 실리콘 풍부산화물을 포함하는 나노와이어 및 그의제조방법
KR101144744B1 (ko) * 2009-02-11 2012-05-24 연세대학교 산학협력단 나노와이어 밀도를 증대시킬 수 있는 나노와이어 제조 방법
US8623288B1 (en) 2009-06-29 2014-01-07 Nanosys, Inc. Apparatus and methods for high density nanowire growth
US8212236B2 (en) 2010-01-19 2012-07-03 Eastman Kodak Company II-VI core-shell semiconductor nanowires
WO2011090863A1 (en) * 2010-01-19 2011-07-28 Eastman Kodak Company Ii-vi core-shell semiconductor nanowires
US8377729B2 (en) 2010-01-19 2013-02-19 Eastman Kodak Company Forming II-VI core-shell semiconductor nanowires
US9012080B2 (en) * 2010-09-21 2015-04-21 Semiconductor Energy Laboratory Co., Ltd. Needle-like microstructure and device having needle-like microstructure
KR101287611B1 (ko) * 2010-11-15 2013-07-18 전북대학교산학협력단 실리콘 나노선의 제조 방법
TWI441305B (zh) * 2010-12-21 2014-06-11 Ind Tech Res Inst 半導體裝置
KR101329172B1 (ko) 2012-08-08 2013-11-14 순천대학교 산학협력단 실리콘 나노와이어의 제조방법 및 이를 통해 제조되는 실리콘 나노와이어
US9755104B2 (en) * 2014-05-09 2017-09-05 Epistar Corporation Method of manufacturing optoelectronic element having rough surface
KR20160021314A (ko) 2014-08-14 2016-02-25 삼성디스플레이 주식회사 나노 와이어 제조 방법
KR101631854B1 (ko) * 2015-09-09 2016-06-20 인천대학교 산학협력단 나노 와이어 및 그 제조방법
US11394028B2 (en) 2019-01-21 2022-07-19 Global Graphene Group, Inc. Graphene-carbon hybrid foam-protected anode active material coating for lithium-ion batteries
US11973211B2 (en) 2019-01-28 2024-04-30 Honeycomb Battery Company Process for producing metal nanowires and nanowire-graphene hybrid particulates

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2519337A1 (fr) * 1981-12-31 1983-07-08 Thomson Csf Compose organique du type benzoate de biphenyle triplement substitue, son procede de fabrication et son utilisation comme dopant pour cristal liquide smectique
RU2099808C1 (ru) * 1996-04-01 1997-12-20 Евгений Инвиевич Гиваргизов Способ выращивания ориентированных систем нитевидных кристаллов и устройство для его осуществления (варианты)
US5976957A (en) * 1996-10-28 1999-11-02 Sony Corporation Method of making silicon quantum wires on a substrate
JP3870459B2 (ja) * 1996-10-28 2007-01-17 ソニー株式会社 量子細線の製造方法
US6231744B1 (en) * 1997-04-24 2001-05-15 Massachusetts Institute Of Technology Process for fabricating an array of nanowires
WO2000074107A2 (en) * 1999-05-31 2000-12-07 Evgeny Invievich Givargizov Tip structures, devices on their basis, and methods for their preparation
JP4397491B2 (ja) * 1999-11-30 2010-01-13 財団法人国際科学振興財団 111面方位を表面に有するシリコンを用いた半導体装置およびその形成方法
US7335603B2 (en) * 2000-02-07 2008-02-26 Vladimir Mancevski System and method for fabricating logic devices comprising carbon nanotube transistors
JP2002220300A (ja) * 2001-01-18 2002-08-09 Vision Arts Kk ナノファイバーおよびナノファイバーの作製方法
US20070297216A1 (en) * 2001-03-02 2007-12-27 William Marsh Rice University Self-assembly of molecular devices
JP4876319B2 (ja) * 2001-03-09 2012-02-15 ソニー株式会社 表示装置およびその製造方法
JP2003246700A (ja) * 2002-02-22 2003-09-02 Japan Science & Technology Corp シリコンナノニードルの製法
DE60212118T2 (de) * 2002-08-08 2007-01-04 Sony Deutschland Gmbh Verfahren zur Herstellung einer Kreuzschienenstruktur von Nanodrähten
JP2004122283A (ja) * 2002-10-01 2004-04-22 Japan Science & Technology Corp 規則配列したナノサイズの微細構造物の作製方法
JP2004202602A (ja) * 2002-12-24 2004-07-22 Sony Corp 微小構造体の製造方法、及び型材の製造方法
CA2515105A1 (en) * 2003-02-07 2004-08-19 Nano Cluster Devices Limited Templated cluster assembled wires
US20070003472A1 (en) * 2003-03-24 2007-01-04 Tolt Zhidan L Electron emitting composite based on regulated nano-structures and a cold electron source using the composite
US7067328B2 (en) * 2003-09-25 2006-06-27 Nanosys, Inc. Methods, devices and compositions for depositing and orienting nanostructures
US7351607B2 (en) * 2003-12-11 2008-04-01 Georgia Tech Research Corporation Large scale patterned growth of aligned one-dimensional nanostructures
JP3994166B2 (ja) * 2004-03-17 2007-10-17 独立行政法人産業技術総合研究所 多溝性表面を有するシリコン基板及びその製造方法
KR100553317B1 (ko) * 2004-04-23 2006-02-20 한국과학기술연구원 실리콘 나노선을 이용한 실리콘 광소자 및 이의 제조방법
CN102064102B (zh) * 2004-06-08 2013-10-30 桑迪士克公司 形成单层纳米结构的方法和器件以及包含这种单层的器件
US7344961B2 (en) * 2004-07-07 2008-03-18 Nanosys, Inc. Methods for nanowire growth
JP2006239857A (ja) * 2005-02-25 2006-09-14 Samsung Electronics Co Ltd シリコンナノワイヤ、シリコンナノワイヤを含む半導体素子及びシリコンナノワイヤの製造方法
KR100624461B1 (ko) * 2005-02-25 2006-09-19 삼성전자주식회사 나노 와이어 및 그 제조 방법
KR101138865B1 (ko) * 2005-03-09 2012-05-14 삼성전자주식회사 나노 와이어 및 그 제조 방법
US7745498B2 (en) * 2005-04-13 2010-06-29 Nanosys, Inc. Nanowire dispersion compositions and uses thereof
US7609432B2 (en) * 2006-10-13 2009-10-27 Hewlett-Packard Development Company, L.P. Nanowire-based device and method of making same
US7850941B2 (en) * 2006-10-20 2010-12-14 General Electric Company Nanostructure arrays and methods for forming same
KR101345432B1 (ko) * 2007-12-13 2013-12-27 성균관대학교산학협력단 무촉매 단결정 실리콘 나노와이어의 제조방법, 그에 의해형성된 나노와이어 및 이를 포함하는 나노소자

Also Published As

Publication number Publication date
KR101138865B1 (ko) 2012-05-14
KR20060098959A (ko) 2006-09-19
US7649192B2 (en) 2010-01-19
JP2006248893A (ja) 2006-09-21
US20060212975A1 (en) 2006-09-21
EP1700935A1 (de) 2006-09-13
EP1700935B1 (de) 2008-12-24

Similar Documents

Publication Publication Date Title
DE602006004379D1 (de) Nanodraht-Struktur und Verfahren zu ihrer Herstellung
DE602006020386D1 (de) Duraimplantat und Verfahren zu seiner Herstellung
DE602005020467D1 (de) Dielektrische luneberglinse und verfahren zu ihrer herstellung
DE602006012283D1 (de) Integrierte schaltung und verfahren zu ihrer herstellung
ATE419260T1 (de) C-aryl-glucosid-sglt2-inhibitoren und verfahren zu ihrer herstellung
DE602006012666D1 (de) Ren eignen und verfahren zu deren herstellung
DE602006001686D1 (de) Photoelektrische Umwandleranordnung und Verfahren zu ihrer Herstellung
ATE556077T1 (de) Tetrahydrochinolinderivate und verfahren zu deren herstellung
DE602006013001D1 (de) Zusammensetzung mit verbesserter stabilität und verfahren zu ihrer herstellung
DE102006057312A8 (de) Verbundrohr und Verfahren zu seiner Herstellung
ATE554772T1 (de) Pteridine als hcv-hemmer und verfahren zu ihrer herstellung
DE602005009793D1 (de) Phasenwechselspeicher-Vorrichtung und Verfahren zu ihrer Herstellung
DE112006000438A5 (de) Verschleissverbesserte Kette sowie Verfahren zu deren Herstellung
DE602005026176D1 (de) Rollenlose spule und verfahren zu ihrer herstellung
DE502006003563D1 (de) Polyester-polysiloxan-copolymere und verfahren zu deren herstellung
DE602004021527D1 (de) Honigwabenstruktur und Verfahren zu seiner Herstellung
DE502006009351D1 (de) Feinteiliges azopigment und verfahren zu seiner herstellung
EP1974791A4 (de) Wabenstruktur und herstellungsverfahren dafür
DE502006005961D1 (de) Endoskop und Verfahren zu seiner Herstellung
ATE484298T1 (de) Oberflächlich vernetzte superabsorbierende partikeln und verfahren zu ihrer herstellung
ATE535510T1 (de) Benzylamine, verfahren zu ihrer herstellung und ihre verwendung als entzündungshemmende mittel
DE602006014866D1 (de) Elastisches polyurethangarn und verfahren zu seiner herstellung
ATE517092T1 (de) Tetrahydronaphthalinderivate, verfahren zu ihrer herstellung und ihre verwendung als entzündungshemmer
DE502007004083D1 (de) Widerstandsanordnung und verfahren zu deren herstellung
DE502007002958D1 (de) Armierte supraleitende wicklung und verfahren zu deren herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition