DE602006004379D1 - Nanodraht-Struktur und Verfahren zu ihrer Herstellung - Google Patents
Nanodraht-Struktur und Verfahren zu ihrer HerstellungInfo
- Publication number
- DE602006004379D1 DE602006004379D1 DE602006004379T DE602006004379T DE602006004379D1 DE 602006004379 D1 DE602006004379 D1 DE 602006004379D1 DE 602006004379 T DE602006004379 T DE 602006004379T DE 602006004379 T DE602006004379 T DE 602006004379T DE 602006004379 D1 DE602006004379 D1 DE 602006004379D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- nanowire structure
- nanowire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B62—LAND VEHICLES FOR TRAVELLING OTHERWISE THAN ON RAILS
- B62B—HAND-PROPELLED VEHICLES, e.g. HAND CARTS OR PERAMBULATORS; SLEDGES
- B62B3/00—Hand carts having more than one axis carrying transport wheels; Steering devices therefor; Equipment therefor
- B62B3/04—Hand carts having more than one axis carrying transport wheels; Steering devices therefor; Equipment therefor involving means for grappling or securing in place objects to be carried; Loading or unloading equipment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/701—Integrated with dissimilar structures on a common substrate
- Y10S977/72—On an electrically conducting, semi-conducting, or semi-insulating substrate
- Y10S977/721—On a silicon substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/762—Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/762—Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
- Y10S977/766—Bent wire, i.e. having nonliner longitudinal axis
- Y10S977/768—Helical wire
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/788—Of specified organic or carbon-based composition
- Y10S977/789—Of specified organic or carbon-based composition in array format
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/81—Of specified metal or metal alloy composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/936—Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
- Y10S977/938—Field effect transistors, FETS, with nanowire- or nanotube-channel region
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Transportation (AREA)
- Combustion & Propulsion (AREA)
- Catalysts (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050019579A KR101138865B1 (ko) | 2005-03-09 | 2005-03-09 | 나노 와이어 및 그 제조 방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006004379D1 true DE602006004379D1 (de) | 2009-02-05 |
Family
ID=36356576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006004379T Active DE602006004379D1 (de) | 2005-03-09 | 2006-03-07 | Nanodraht-Struktur und Verfahren zu ihrer Herstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US7649192B2 (de) |
EP (1) | EP1700935B1 (de) |
JP (1) | JP2006248893A (de) |
KR (1) | KR101138865B1 (de) |
DE (1) | DE602006004379D1 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7785922B2 (en) * | 2004-04-30 | 2010-08-31 | Nanosys, Inc. | Methods for oriented growth of nanowires on patterned substrates |
KR101138865B1 (ko) * | 2005-03-09 | 2012-05-14 | 삼성전자주식회사 | 나노 와이어 및 그 제조 방법 |
US7230286B2 (en) * | 2005-05-23 | 2007-06-12 | International Business Machines Corporation | Vertical FET with nanowire channels and a silicided bottom contact |
WO2007136412A2 (en) | 2005-12-29 | 2007-11-29 | Nanosys, Inc. | Methods for oriented growth of nanowires on patterned substrates |
DE102006013245A1 (de) * | 2006-03-22 | 2007-10-04 | Infineon Technologies Ag | Verfahren zur Ausbildung von Öffnungen in einer Matrizenschicht und zur Herstellung von Kondensatoren |
US8822030B2 (en) | 2006-08-11 | 2014-09-02 | Aqua Resources Corporation | Nanoplatelet metal hydroxides and methods of preparing same |
US7736485B2 (en) * | 2006-08-11 | 2010-06-15 | Aqua Resources Corporation | Nanoplatelet magnesium hydroxides and methods of preparing same |
KR100829159B1 (ko) * | 2006-11-03 | 2008-05-13 | 한양대학교 산학협력단 | 나노 와이어 및 반도체 소자 제조 방법 |
KR100825765B1 (ko) * | 2006-12-05 | 2008-04-29 | 한국전자통신연구원 | 산화물계 나노 구조물의 제조 방법 |
US20100221894A1 (en) * | 2006-12-28 | 2010-09-02 | Industry-Academic Cooperation Foundation, Yonsei University | Method for manufacturing nanowires by using a stress-induced growth |
KR100872332B1 (ko) * | 2007-05-28 | 2008-12-05 | 연세대학교 산학협력단 | 인장응력을 이용한 단결정 열전 나노선 제조 방법 |
US7670908B2 (en) * | 2007-01-22 | 2010-03-02 | Alpha & Omega Semiconductor, Ltd. | Configuration of high-voltage semiconductor power device to achieve three dimensional charge coupling |
US8143144B2 (en) * | 2007-06-06 | 2012-03-27 | Panasonic Corporation | Semiconductor nanowire and its manufacturing method |
KR100972909B1 (ko) * | 2007-10-31 | 2010-07-28 | 주식회사 하이닉스반도체 | 반도체 소자 및 그 형성 방법 |
KR100952048B1 (ko) * | 2007-11-13 | 2010-04-07 | 연세대학교 산학협력단 | 실리콘 나노 구조체를 이용한 액상 제조 공정 기반의실리콘박막 결정화방법 |
US7897494B2 (en) * | 2008-06-24 | 2011-03-01 | Imec | Formation of single crystal semiconductor nanowires |
KR101475524B1 (ko) | 2008-08-05 | 2014-12-23 | 삼성전자주식회사 | 실리콘 풍부산화물을 포함하는 나노와이어 및 그의제조방법 |
KR101144744B1 (ko) * | 2009-02-11 | 2012-05-24 | 연세대학교 산학협력단 | 나노와이어 밀도를 증대시킬 수 있는 나노와이어 제조 방법 |
US8623288B1 (en) | 2009-06-29 | 2014-01-07 | Nanosys, Inc. | Apparatus and methods for high density nanowire growth |
US8212236B2 (en) | 2010-01-19 | 2012-07-03 | Eastman Kodak Company | II-VI core-shell semiconductor nanowires |
WO2011090863A1 (en) * | 2010-01-19 | 2011-07-28 | Eastman Kodak Company | Ii-vi core-shell semiconductor nanowires |
US8377729B2 (en) | 2010-01-19 | 2013-02-19 | Eastman Kodak Company | Forming II-VI core-shell semiconductor nanowires |
US9012080B2 (en) * | 2010-09-21 | 2015-04-21 | Semiconductor Energy Laboratory Co., Ltd. | Needle-like microstructure and device having needle-like microstructure |
KR101287611B1 (ko) * | 2010-11-15 | 2013-07-18 | 전북대학교산학협력단 | 실리콘 나노선의 제조 방법 |
TWI441305B (zh) * | 2010-12-21 | 2014-06-11 | Ind Tech Res Inst | 半導體裝置 |
KR101329172B1 (ko) | 2012-08-08 | 2013-11-14 | 순천대학교 산학협력단 | 실리콘 나노와이어의 제조방법 및 이를 통해 제조되는 실리콘 나노와이어 |
US9755104B2 (en) * | 2014-05-09 | 2017-09-05 | Epistar Corporation | Method of manufacturing optoelectronic element having rough surface |
KR20160021314A (ko) | 2014-08-14 | 2016-02-25 | 삼성디스플레이 주식회사 | 나노 와이어 제조 방법 |
KR101631854B1 (ko) * | 2015-09-09 | 2016-06-20 | 인천대학교 산학협력단 | 나노 와이어 및 그 제조방법 |
US11394028B2 (en) | 2019-01-21 | 2022-07-19 | Global Graphene Group, Inc. | Graphene-carbon hybrid foam-protected anode active material coating for lithium-ion batteries |
US11973211B2 (en) | 2019-01-28 | 2024-04-30 | Honeycomb Battery Company | Process for producing metal nanowires and nanowire-graphene hybrid particulates |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2519337A1 (fr) * | 1981-12-31 | 1983-07-08 | Thomson Csf | Compose organique du type benzoate de biphenyle triplement substitue, son procede de fabrication et son utilisation comme dopant pour cristal liquide smectique |
RU2099808C1 (ru) * | 1996-04-01 | 1997-12-20 | Евгений Инвиевич Гиваргизов | Способ выращивания ориентированных систем нитевидных кристаллов и устройство для его осуществления (варианты) |
US5976957A (en) * | 1996-10-28 | 1999-11-02 | Sony Corporation | Method of making silicon quantum wires on a substrate |
JP3870459B2 (ja) * | 1996-10-28 | 2007-01-17 | ソニー株式会社 | 量子細線の製造方法 |
US6231744B1 (en) * | 1997-04-24 | 2001-05-15 | Massachusetts Institute Of Technology | Process for fabricating an array of nanowires |
WO2000074107A2 (en) * | 1999-05-31 | 2000-12-07 | Evgeny Invievich Givargizov | Tip structures, devices on their basis, and methods for their preparation |
JP4397491B2 (ja) * | 1999-11-30 | 2010-01-13 | 財団法人国際科学振興財団 | 111面方位を表面に有するシリコンを用いた半導体装置およびその形成方法 |
US7335603B2 (en) * | 2000-02-07 | 2008-02-26 | Vladimir Mancevski | System and method for fabricating logic devices comprising carbon nanotube transistors |
JP2002220300A (ja) * | 2001-01-18 | 2002-08-09 | Vision Arts Kk | ナノファイバーおよびナノファイバーの作製方法 |
US20070297216A1 (en) * | 2001-03-02 | 2007-12-27 | William Marsh Rice University | Self-assembly of molecular devices |
JP4876319B2 (ja) * | 2001-03-09 | 2012-02-15 | ソニー株式会社 | 表示装置およびその製造方法 |
JP2003246700A (ja) * | 2002-02-22 | 2003-09-02 | Japan Science & Technology Corp | シリコンナノニードルの製法 |
DE60212118T2 (de) * | 2002-08-08 | 2007-01-04 | Sony Deutschland Gmbh | Verfahren zur Herstellung einer Kreuzschienenstruktur von Nanodrähten |
JP2004122283A (ja) * | 2002-10-01 | 2004-04-22 | Japan Science & Technology Corp | 規則配列したナノサイズの微細構造物の作製方法 |
JP2004202602A (ja) * | 2002-12-24 | 2004-07-22 | Sony Corp | 微小構造体の製造方法、及び型材の製造方法 |
CA2515105A1 (en) * | 2003-02-07 | 2004-08-19 | Nano Cluster Devices Limited | Templated cluster assembled wires |
US20070003472A1 (en) * | 2003-03-24 | 2007-01-04 | Tolt Zhidan L | Electron emitting composite based on regulated nano-structures and a cold electron source using the composite |
US7067328B2 (en) * | 2003-09-25 | 2006-06-27 | Nanosys, Inc. | Methods, devices and compositions for depositing and orienting nanostructures |
US7351607B2 (en) * | 2003-12-11 | 2008-04-01 | Georgia Tech Research Corporation | Large scale patterned growth of aligned one-dimensional nanostructures |
JP3994166B2 (ja) * | 2004-03-17 | 2007-10-17 | 独立行政法人産業技術総合研究所 | 多溝性表面を有するシリコン基板及びその製造方法 |
KR100553317B1 (ko) * | 2004-04-23 | 2006-02-20 | 한국과학기술연구원 | 실리콘 나노선을 이용한 실리콘 광소자 및 이의 제조방법 |
CN102064102B (zh) * | 2004-06-08 | 2013-10-30 | 桑迪士克公司 | 形成单层纳米结构的方法和器件以及包含这种单层的器件 |
US7344961B2 (en) * | 2004-07-07 | 2008-03-18 | Nanosys, Inc. | Methods for nanowire growth |
JP2006239857A (ja) * | 2005-02-25 | 2006-09-14 | Samsung Electronics Co Ltd | シリコンナノワイヤ、シリコンナノワイヤを含む半導体素子及びシリコンナノワイヤの製造方法 |
KR100624461B1 (ko) * | 2005-02-25 | 2006-09-19 | 삼성전자주식회사 | 나노 와이어 및 그 제조 방법 |
KR101138865B1 (ko) * | 2005-03-09 | 2012-05-14 | 삼성전자주식회사 | 나노 와이어 및 그 제조 방법 |
US7745498B2 (en) * | 2005-04-13 | 2010-06-29 | Nanosys, Inc. | Nanowire dispersion compositions and uses thereof |
US7609432B2 (en) * | 2006-10-13 | 2009-10-27 | Hewlett-Packard Development Company, L.P. | Nanowire-based device and method of making same |
US7850941B2 (en) * | 2006-10-20 | 2010-12-14 | General Electric Company | Nanostructure arrays and methods for forming same |
KR101345432B1 (ko) * | 2007-12-13 | 2013-12-27 | 성균관대학교산학협력단 | 무촉매 단결정 실리콘 나노와이어의 제조방법, 그에 의해형성된 나노와이어 및 이를 포함하는 나노소자 |
-
2005
- 2005-03-09 KR KR1020050019579A patent/KR101138865B1/ko active IP Right Grant
-
2006
- 2006-03-07 EP EP06251195A patent/EP1700935B1/de not_active Expired - Fee Related
- 2006-03-07 DE DE602006004379T patent/DE602006004379D1/de active Active
- 2006-03-08 JP JP2006062815A patent/JP2006248893A/ja active Pending
- 2006-03-08 US US11/369,859 patent/US7649192B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR101138865B1 (ko) | 2012-05-14 |
KR20060098959A (ko) | 2006-09-19 |
US7649192B2 (en) | 2010-01-19 |
JP2006248893A (ja) | 2006-09-21 |
US20060212975A1 (en) | 2006-09-21 |
EP1700935A1 (de) | 2006-09-13 |
EP1700935B1 (de) | 2008-12-24 |
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