DE602006004074D1 - Verfahren zur formung eines entfernbaren randerweiterungselements - Google Patents
Verfahren zur formung eines entfernbaren randerweiterungselementsInfo
- Publication number
- DE602006004074D1 DE602006004074D1 DE602006004074T DE602006004074T DE602006004074D1 DE 602006004074 D1 DE602006004074 D1 DE 602006004074D1 DE 602006004074 T DE602006004074 T DE 602006004074T DE 602006004074 T DE602006004074 T DE 602006004074T DE 602006004074 D1 DE602006004074 D1 DE 602006004074D1
- Authority
- DE
- Germany
- Prior art keywords
- microelectronic substrate
- front surface
- edge
- article
- peripheral edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/162,765 US8202460B2 (en) | 2005-09-22 | 2005-09-22 | Microelectronic substrate having removable edge extension element |
PCT/EP2006/066034 WO2007039381A1 (en) | 2005-09-22 | 2006-09-05 | Microelectronic substrate having removable edge extension element |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006004074D1 true DE602006004074D1 (de) | 2009-01-15 |
Family
ID=37309272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006004074T Active DE602006004074D1 (de) | 2005-09-22 | 2006-09-05 | Verfahren zur formung eines entfernbaren randerweiterungselements |
Country Status (9)
Country | Link |
---|---|
US (2) | US8202460B2 (de) |
EP (1) | EP1927031B1 (de) |
JP (1) | JP4629777B2 (de) |
KR (1) | KR101013050B1 (de) |
CN (1) | CN101263431B (de) |
AT (1) | ATE416399T1 (de) |
DE (1) | DE602006004074D1 (de) |
TW (1) | TW200713417A (de) |
WO (1) | WO2007039381A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017113016A1 (en) | 2015-12-31 | 2017-07-06 | Cfs Concrete Forming Systems Inc. | Structure-lining apparatus with adjustable width and tool for same |
CA3056152C (en) | 2017-04-03 | 2023-07-25 | Cfs Concrete Forming Systems Inc. | Longspan stay-in-place liners |
AU2018386751A1 (en) | 2017-12-22 | 2020-08-06 | Cfs Concrete Forming Systems Inc. | Snap-together standoffs for restoring, repairing, reinforcing, protecting, insulating and/or cladding structures |
CA3128405A1 (en) | 2019-02-08 | 2020-08-13 | Cfs Concrete Forming Systems Inc. | Retainers for restoring, repairing, reinforcing, protecting, insulating and/or cladding structures |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7904113A (nl) * | 1979-05-25 | 1980-11-27 | Philips Nv | Optisch uitleesbare informatieschijf, werkwijze voor de vervaardiging ervan alsmede een inrichting voor het uitvoeren van deze werkwijze. |
JPH01163027A (ja) * | 1987-12-21 | 1989-06-27 | Matsushita Electric Ind Co Ltd | 光学素子の成形方法およびその装置 |
JPH01164034A (ja) | 1987-12-21 | 1989-06-28 | Nec Corp | ウェハース周辺部膜厚均一化機構 |
JPH04284629A (ja) | 1991-03-13 | 1992-10-09 | Kyushu Electron Metal Co Ltd | 半導体基板の製造方法 |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
US5300175A (en) * | 1993-01-04 | 1994-04-05 | Motorola, Inc. | Method for mounting a wafer to a submount |
SG92685A1 (en) | 1999-03-10 | 2002-11-19 | Towa Corp | Method of coating semiconductor wafer with resin and mold used therefor |
JP4011781B2 (ja) | 1999-03-10 | 2007-11-21 | Towa株式会社 | 半導体ウェーハの樹脂被覆方法 |
JP4253393B2 (ja) | 1999-03-10 | 2009-04-08 | Towa株式会社 | 半導体ウェーハの樹脂被覆方法及び金型 |
JP2001093867A (ja) | 1999-09-21 | 2001-04-06 | Rodel Nitta Kk | ウエハ外周部の保護部材及びウエハの研磨方法 |
WO2002091078A1 (en) * | 2001-05-07 | 2002-11-14 | Massachusetts Institute Of Technology | Methods and apparatus employing an index matching medium |
DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
JP4159029B2 (ja) * | 2002-09-11 | 2008-10-01 | コバレントマテリアル株式会社 | セラミックス製プレート |
US6788477B2 (en) * | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
EP1429188B1 (de) | 2002-11-12 | 2013-06-19 | ASML Netherlands B.V. | Lithographischer Projektionsapparat |
SG121819A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7713841B2 (en) * | 2003-09-19 | 2010-05-11 | Micron Technology, Inc. | Methods for thinning semiconductor substrates that employ support structures formed on the substrates |
JP4572539B2 (ja) | 2004-01-19 | 2010-11-04 | 株式会社ニコン | 露光装置及び露光方法、デバイス製造方法 |
US7501226B2 (en) * | 2004-06-23 | 2009-03-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Immersion lithography system with wafer sealing mechanisms |
JP4284629B2 (ja) | 2004-07-01 | 2009-06-24 | 収 伊藤 | コーナーキャンバス巻取り軸とコーナーオーニング装置 |
-
2005
- 2005-09-22 US US11/162,765 patent/US8202460B2/en not_active Expired - Fee Related
-
2006
- 2006-09-05 DE DE602006004074T patent/DE602006004074D1/de active Active
- 2006-09-05 AT AT06793243T patent/ATE416399T1/de not_active IP Right Cessation
- 2006-09-05 CN CN2006800336088A patent/CN101263431B/zh not_active Expired - Fee Related
- 2006-09-05 JP JP2008531657A patent/JP4629777B2/ja not_active Expired - Fee Related
- 2006-09-05 WO PCT/EP2006/066034 patent/WO2007039381A1/en active Application Filing
- 2006-09-05 KR KR1020087006076A patent/KR101013050B1/ko not_active IP Right Cessation
- 2006-09-05 EP EP06793243A patent/EP1927031B1/de not_active Not-in-force
- 2006-09-12 TW TW095133746A patent/TW200713417A/zh unknown
-
2012
- 2012-06-06 US US13/490,239 patent/US8946866B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101263431A (zh) | 2008-09-10 |
EP1927031A1 (de) | 2008-06-04 |
CN101263431B (zh) | 2010-05-26 |
KR20080058336A (ko) | 2008-06-25 |
JP2009509349A (ja) | 2009-03-05 |
TW200713417A (en) | 2007-04-01 |
US20120241913A1 (en) | 2012-09-27 |
ATE416399T1 (de) | 2008-12-15 |
JP4629777B2 (ja) | 2011-02-09 |
KR101013050B1 (ko) | 2011-02-14 |
EP1927031B1 (de) | 2008-12-03 |
WO2007039381A1 (en) | 2007-04-12 |
US8202460B2 (en) | 2012-06-19 |
US8946866B2 (en) | 2015-02-03 |
US20070063392A1 (en) | 2007-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8320 | Willingness to grant licences declared (paragraph 23) | ||
8364 | No opposition during term of opposition |