DE602006002448D1 - Vorrichtung zur Interferenzmessung - Google Patents

Vorrichtung zur Interferenzmessung

Info

Publication number
DE602006002448D1
DE602006002448D1 DE602006002448T DE602006002448T DE602006002448D1 DE 602006002448 D1 DE602006002448 D1 DE 602006002448D1 DE 602006002448 T DE602006002448 T DE 602006002448T DE 602006002448 T DE602006002448 T DE 602006002448T DE 602006002448 D1 DE602006002448 D1 DE 602006002448D1
Authority
DE
Germany
Prior art keywords
interference measurement
interference
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006002448T
Other languages
English (en)
Inventor
Hidejiro Kadowaki
Ko Ishizuka
Shigeki Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE602006002448D1 publication Critical patent/DE602006002448D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer
DE602006002448T 2005-07-28 2006-07-21 Vorrichtung zur Interferenzmessung Active DE602006002448D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005218981A JP4804058B2 (ja) 2005-07-28 2005-07-28 干渉測定装置

Publications (1)

Publication Number Publication Date
DE602006002448D1 true DE602006002448D1 (de) 2008-10-09

Family

ID=37193822

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006002448T Active DE602006002448D1 (de) 2005-07-28 2006-07-21 Vorrichtung zur Interferenzmessung

Country Status (4)

Country Link
US (1) US7554671B2 (de)
EP (1) EP1748276B1 (de)
JP (1) JP4804058B2 (de)
DE (1) DE602006002448D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4914040B2 (ja) * 2005-07-28 2012-04-11 キヤノン株式会社 干渉測定装置
ITMI20061792A1 (it) * 2006-09-21 2008-03-22 Milano Politecnico Apparato di interferometria a bassa coerenza sensibile alla fase
JP5188127B2 (ja) * 2007-09-14 2013-04-24 キヤノン株式会社 絶対位置の計測装置および計測方法
JP4995016B2 (ja) 2007-09-14 2012-08-08 キヤノン株式会社 絶対位置の計測装置及び計測方法
JP2009115486A (ja) * 2007-11-02 2009-05-28 National Institute Of Advanced Industrial & Technology 低コヒーレンス干渉の合致法による長さ測定方法
JP5222954B2 (ja) * 2007-11-13 2013-06-26 ザイゴ コーポレーション 偏光スキャンを利用した干渉計
JP4898639B2 (ja) * 2007-11-22 2012-03-21 キヤノン株式会社 絶対位置の計測装置及び計測方法
TWI384195B (zh) * 2008-10-08 2013-02-01 Ind Tech Res Inst 振動位移與振動頻率決定方法與其裝置
JP5213730B2 (ja) * 2009-01-14 2013-06-19 キヤノン株式会社 調整方法
DE102009039703A1 (de) * 2009-08-31 2011-03-17 Siemens Aktiengesellschaft Lichtsignal
US9194694B2 (en) * 2012-01-31 2015-11-24 Nikon Corporation Interferometer devices for determining initial position of a stage or the like

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63309804A (ja) * 1987-06-11 1988-12-16 Tokyo Seimitsu Co Ltd レ−ザ干渉測定方法
US5127731A (en) * 1991-02-08 1992-07-07 Hughes Aircraft Company Stabilized two-color laser diode interferometer
JPH05149708A (ja) * 1991-11-27 1993-06-15 Jasco Corp 二光束干渉計の基準位置決め方法及び装置
JPH07190712A (ja) * 1993-12-27 1995-07-28 Nikon Corp 干渉計
JPH085314A (ja) * 1994-06-20 1996-01-12 Canon Inc 変位測定方法及び変位測定装置
US5953124A (en) * 1998-01-19 1999-09-14 Zygo Corporation Interferometric methods and systems using low coherence illumination
JP3310945B2 (ja) * 1999-03-11 2002-08-05 株式会社東京精密 非接触表面形状測定方法
JP2001076325A (ja) * 1999-09-07 2001-03-23 Canon Inc 変位検出装置及び情報記録装置
DE10249409B4 (de) * 2001-10-25 2007-09-20 Canon K.K. Interferometer und Positionsmessvorrichtung
US6934035B2 (en) * 2001-12-18 2005-08-23 Massachusetts Institute Of Technology System and method for measuring optical distance
JP3921129B2 (ja) * 2002-05-27 2007-05-30 富士通株式会社 プリズムアレイ形状の計測方法および計測装置
JP4062606B2 (ja) * 2003-01-20 2008-03-19 フジノン株式会社 低可干渉測定／高可干渉測定共用干渉計装置およびその測定方法
JP4914040B2 (ja) * 2005-07-28 2012-04-11 キヤノン株式会社 干渉測定装置
JP2007225392A (ja) * 2006-02-22 2007-09-06 Spectratech Inc 光干渉装置

Also Published As

Publication number Publication date
US7554671B2 (en) 2009-06-30
EP1748276A1 (de) 2007-01-31
US20070024863A1 (en) 2007-02-01
JP4804058B2 (ja) 2011-10-26
JP2007033318A (ja) 2007-02-08
EP1748276B1 (de) 2008-08-27

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Legal Events

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