DE602005026179D1 - Vorrichtung zum reinigen von schaltungssubstraten - Google Patents
Vorrichtung zum reinigen von schaltungssubstratenInfo
- Publication number
- DE602005026179D1 DE602005026179D1 DE602005026179T DE602005026179T DE602005026179D1 DE 602005026179 D1 DE602005026179 D1 DE 602005026179D1 DE 602005026179 T DE602005026179 T DE 602005026179T DE 602005026179 T DE602005026179 T DE 602005026179T DE 602005026179 D1 DE602005026179 D1 DE 602005026179D1
- Authority
- DE
- Germany
- Prior art keywords
- cleaning
- wafer
- central region
- rotary brushes
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Vehicle Body Suspensions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2005/005552 WO2006111193A1 (en) | 2005-04-20 | 2005-04-20 | Apparatus for cleaning of circuit substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005026179D1 true DE602005026179D1 (de) | 2011-03-10 |
Family
ID=35198088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005026179T Active DE602005026179D1 (de) | 2005-04-20 | 2005-04-20 | Vorrichtung zum reinigen von schaltungssubstraten |
Country Status (8)
Country | Link |
---|---|
US (1) | US8752228B2 (de) |
EP (1) | EP1875490B1 (de) |
JP (1) | JP2008537346A (de) |
CN (1) | CN100576428C (de) |
AT (1) | ATE497255T1 (de) |
DE (1) | DE602005026179D1 (de) |
TW (1) | TW200735192A (de) |
WO (1) | WO2006111193A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602005026179D1 (de) | 2005-04-20 | 2011-03-10 | Freescale Semiconductor Inc | Vorrichtung zum reinigen von schaltungssubstraten |
CN102194653B (zh) * | 2010-03-11 | 2013-02-13 | 中芯国际集成电路制造(上海)有限公司 | 晶片清洗装置 |
US8340363B2 (en) | 2010-05-27 | 2012-12-25 | Palo Alto Research Center Incorporated | System and method for efficient interpretation of images in terms of objects and their parts |
JP5833959B2 (ja) * | 2011-09-28 | 2015-12-16 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP2014094341A (ja) * | 2012-11-08 | 2014-05-22 | Sony Corp | 清掃装置 |
US9857680B2 (en) * | 2014-01-14 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
CN104941959B (zh) * | 2014-03-27 | 2020-05-19 | 海德堡印刷机械股份公司 | 利用胶条去除硬化的墨、涂料或漆的方法 |
JP6554864B2 (ja) * | 2015-03-30 | 2019-08-07 | 大日本印刷株式会社 | ペリクル接着剤除去装置及びペリクル接着剤除去方法 |
CN106298440A (zh) * | 2015-05-15 | 2017-01-04 | 南京瀚宇彩欣科技有限责任公司 | 基板的清洁模块与方法 |
US11145521B2 (en) * | 2017-09-28 | 2021-10-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for cleaning a semiconductor substrate |
CN111854428A (zh) * | 2019-04-29 | 2020-10-30 | 伊利诺斯工具制品有限公司 | 带清洁装置及具有带清洁装置的烧结炉 |
US20230064958A1 (en) * | 2021-08-30 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company Ltd. | Method for wafer backside polishing |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5499374A (en) | 1978-01-23 | 1979-08-06 | Toshiba Corp | Wedge-pace type bulb |
US4744833A (en) | 1987-06-11 | 1988-05-17 | International Business Machines Corporation | Electrostatic removal of contaminants |
JPH0388330A (ja) | 1989-08-30 | 1991-04-12 | Nec Yamagata Ltd | ブラシスクラバー |
JPH03165902A (ja) | 1989-11-24 | 1991-07-17 | Kawasaki Steel Corp | 搬送ロールの付着塵埃除去方法 |
JPH0828334B2 (ja) | 1992-11-30 | 1996-03-21 | 株式会社半導体プロセス研究所 | 半導体装置の製造装置及びその使用方法 |
JPH06304537A (ja) | 1993-04-21 | 1994-11-01 | Amitec Corp | 除塵装置 |
JP2600587B2 (ja) * | 1993-10-05 | 1997-04-16 | 日本電気株式会社 | 半導体洗浄装置 |
US6230753B1 (en) | 1996-07-15 | 2001-05-15 | Lam Research Corporation | Wafer cleaning apparatus |
US5862560A (en) * | 1996-08-29 | 1999-01-26 | Ontrak Systems, Inc. | Roller with treading and system including the same |
US5884640A (en) | 1997-08-07 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for drying substrates |
US6059888A (en) * | 1997-11-14 | 2000-05-09 | Creative Design Corporation | Wafer cleaning system |
JP3343503B2 (ja) | 1997-12-12 | 2002-11-11 | 東京エレクトロン株式会社 | 洗浄装置 |
EP1064321A1 (de) | 1998-03-13 | 2001-01-03 | The Procter & Gamble Company | Abriebfester polymerschaum und daraus hergestellte fleckentferner |
JPH11347499A (ja) | 1998-06-05 | 1999-12-21 | Toshiba Corp | 洗浄器具及び半導体ウェーハ洗浄装置並びに半導体ウェーハの洗浄方法 |
JP2000077379A (ja) | 1998-09-03 | 2000-03-14 | Toshiba Mach Co Ltd | ブラシ洗浄装置 |
DE19904548C2 (de) | 1999-02-04 | 2001-07-05 | Steag Micro Tech Gmbh | Verfahren und Vorrichtung zum Reinigen von Substraten |
JP2000305402A (ja) | 1999-04-22 | 2000-11-02 | Kureha Ltd | 回転ローラ用クリーニング装置 |
JP4099292B2 (ja) | 1999-07-01 | 2008-06-11 | 芝浦メカトロニクス株式会社 | 基板のクリーニング装置 |
US6240588B1 (en) | 1999-12-03 | 2001-06-05 | Lam Research Corporation | Wafer scrubbing brush core |
JP2001358110A (ja) * | 2000-06-13 | 2001-12-26 | Hitachi Ltd | スクラブ洗浄装置およびそれを用いた半導体装置の製造方法 |
JP2002023143A (ja) | 2000-07-05 | 2002-01-23 | Seiko Epson Corp | 液晶装置用異物除去装置及びその方法 |
US6904637B2 (en) * | 2001-10-03 | 2005-06-14 | Applied Materials, Inc. | Scrubber with sonic nozzle |
JP2003163196A (ja) | 2001-11-28 | 2003-06-06 | Kaijo Corp | 半導体基板の基板洗浄装置及び洗浄方法 |
US6616516B1 (en) | 2001-12-13 | 2003-09-09 | Lam Research Corporation | Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates |
US7743449B2 (en) * | 2002-06-28 | 2010-06-29 | Lam Research Corporation | System and method for a combined contact and non-contact wafer cleaning module |
US7007333B1 (en) * | 2002-06-28 | 2006-03-07 | Lam Research Corporation | System and method for a combined contact and non-contact wafer cleaning module |
DE602005026179D1 (de) | 2005-04-20 | 2011-03-10 | Freescale Semiconductor Inc | Vorrichtung zum reinigen von schaltungssubstraten |
US7115023B1 (en) * | 2005-06-29 | 2006-10-03 | Lam Research Corporation | Process tape for cleaning or processing the edge of a semiconductor wafer |
-
2005
- 2005-04-20 DE DE602005026179T patent/DE602005026179D1/de active Active
- 2005-04-20 JP JP2008506932A patent/JP2008537346A/ja active Pending
- 2005-04-20 EP EP05741208A patent/EP1875490B1/de active Active
- 2005-04-20 CN CN200580050186A patent/CN100576428C/zh not_active Expired - Fee Related
- 2005-04-20 US US11/912,126 patent/US8752228B2/en not_active Expired - Fee Related
- 2005-04-20 WO PCT/EP2005/005552 patent/WO2006111193A1/en active Application Filing
- 2005-04-20 AT AT05741208T patent/ATE497255T1/de not_active IP Right Cessation
-
2006
- 2006-03-27 TW TW095110601A patent/TW200735192A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
EP1875490A1 (de) | 2008-01-09 |
EP1875490B1 (de) | 2011-01-26 |
JP2008537346A (ja) | 2008-09-11 |
US20080271274A1 (en) | 2008-11-06 |
ATE497255T1 (de) | 2011-02-15 |
US8752228B2 (en) | 2014-06-17 |
WO2006111193A1 (en) | 2006-10-26 |
TW200735192A (en) | 2007-09-16 |
CN100576428C (zh) | 2009-12-30 |
CN101203937A (zh) | 2008-06-18 |
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