DE602005012128D1 - Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material - Google Patents

Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material

Info

Publication number
DE602005012128D1
DE602005012128D1 DE602005012128T DE602005012128T DE602005012128D1 DE 602005012128 D1 DE602005012128 D1 DE 602005012128D1 DE 602005012128 T DE602005012128 T DE 602005012128T DE 602005012128 T DE602005012128 T DE 602005012128T DE 602005012128 D1 DE602005012128 D1 DE 602005012128D1
Authority
DE
Germany
Prior art keywords
film
polyelectrolyte
photosensitive
photoreaction
undergo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005012128T
Other languages
English (en)
Inventor
Joachim Stumpe
Leonid Goldenberg
Olga Kulikovska
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP04020997A external-priority patent/EP1632520A1/de
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of DE602005012128D1 publication Critical patent/DE602005012128D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04—Acids, Metal salts or ammonium salts thereof
    • C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/23—Azo-compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
DE602005012128T 2004-09-03 2005-08-30 Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material Active DE602005012128D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04020997A EP1632520A1 (de) 2004-09-03 2004-09-03 Filmbildendes Material und Herstellung von Oberflächenrelief- und optisch anisotropen Strukturen durch Bestrahlen eines Films des fimbildenden Materials
EP04029262 2004-12-09
PCT/EP2005/009346 WO2006024500A1 (en) 2004-09-03 2005-08-30 Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material

Publications (1)

Publication Number Publication Date
DE602005012128D1 true DE602005012128D1 (de) 2009-02-12

Family

ID=35159871

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005012128T Active DE602005012128D1 (de) 2004-09-03 2005-08-30 Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material

Country Status (9)

Country Link
US (1) US8026021B2 (de)
EP (1) EP1794236B1 (de)
JP (1) JP2008511702A (de)
KR (1) KR20070102983A (de)
AT (1) ATE419308T1 (de)
DE (1) DE602005012128D1 (de)
ES (1) ES2318529T3 (de)
TW (1) TW200619235A (de)
WO (1) WO2006024500A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200624479A (en) * 2004-12-09 2006-07-16 Fraunhofer Ges Forschung Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material
EP1720163A1 (de) * 2005-05-05 2006-11-08 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Filmformende lichtempfindliche Materialien für die von Licht eingeführte Erzeugung optischer Anisotropie
CN100386388C (zh) * 2006-03-21 2008-05-07 宁波大学 茜素黄稀土铬染料制备方法
KR100764403B1 (ko) * 2006-05-11 2007-10-05 삼성전기주식회사 아조벤젠기 폴리머를 이용한 미세 패터닝 방법을 이용한 질화물계 반도체 발광소자의 제조방법
KR100735470B1 (ko) * 2006-05-19 2007-07-03 삼성전기주식회사 질화물계 반도체 발광소자의 제조방법
DE102006062457A1 (de) * 2006-12-28 2008-07-03 Bayer Innovation Gmbh Optische Speichermedien und Verfahren zu deren Herstellung
DE102008059756A1 (de) * 2008-12-01 2010-06-10 Tesa Se Verfahren zum Markieren oder Beschriften eines Werkstücks
JP4740403B2 (ja) * 2009-07-16 2011-08-03 Ｊｘ日鉱日石エネルギー株式会社 回折格子及びそれを用いた有機ｅｌ素子、並びにそれらの製造方法
US8450028B2 (en) * 2011-03-29 2013-05-28 Sabic Innovative Plastics Ip B.V. Holographic storage method
WO2016020630A2 (en) 2014-08-08 2016-02-11 Milan Momcilo Popovich Waveguide laser illuminator incorporating a despeckler
JP6101784B2 (ja) * 2013-03-06 2017-03-22 Ｊｘエネルギー株式会社 凹凸構造を有する部材の製造方法及びそれにより製造された凹凸構造を有する部材
US10179952B2 (en) * 2013-03-08 2019-01-15 Rutgers, The State University Of New Jersey Patterned thin films by thermally induced mass displacement
CN103204460B (zh) * 2013-03-21 2016-03-02 北京工业大学 基于激光干涉诱导交联反应的金属微纳结构的制备方法
WO2016042283A1 (en) 2014-09-19 2016-03-24 Milan Momcilo Popovich Method and apparatus for generating input images for holographic waveguide displays
WO2016113534A1 (en) 2015-01-12 2016-07-21 Milan Momcilo Popovich Environmentally isolated waveguide display
CN104914493A (zh) * 2015-06-02 2015-09-16 苏州大学 一种全息制作平面闪耀光栅的方法
JP6598269B2 (ja) 2015-10-05 2019-10-30 ディジレンズ インコーポレイテッド 導波管ディスプレイ
TWI821234B (zh) 2018-01-09 2023-11-11 美商康寧公司 具光改變特徵之塗覆製品及用於製造彼等之方法
US20200264378A1 (en) 2019-02-15 2020-08-20 Digilens Inc. Methods and Apparatuses for Providing a Holographic Waveguide Display Using Integrated Gratings
WO2021041949A1 (en) 2019-08-29 2021-03-04 Digilens Inc. Evacuating bragg gratings and methods of manufacturing
US20220011478A1 (en) 2020-07-09 2022-01-13 Corning Incorporated Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2787614A (en) * 1953-10-01 1957-04-02 Bayer Ag Yellow substantive azo dyestuffs and process of making the same
JPS58143340A (ja) * 1982-02-22 1983-08-25 Toshiba Corp ホトレジスト組成物
JPH03211531A (ja) * 1990-01-17 1991-09-17 Sumitomo Electric Ind Ltd 非線形高分子材料
JP3509106B2 (ja) * 1996-11-13 2004-03-22 セイコーエプソン株式会社 カチオン性水溶性樹脂を含んでなるインク組成物
JP2002071959A (ja) * 2000-08-31 2002-03-12 Hitachi Chem Co Ltd ホログラフィーによる光制御素子作製方法および光制御素子
JP3695398B2 (ja) 2002-01-30 2005-09-14 富士ゼロックス株式会社 光学式エンコーダ及びエンコーダ用スケール
EP2069026B1 (de) 2006-09-19 2013-01-23 Hypro, LLC Sprühkopf mit abdeckungen

Also Published As

Publication number Publication date
ATE419308T1 (de) 2009-01-15
KR20070102983A (ko) 2007-10-22
ES2318529T3 (es) 2009-05-01
US8026021B2 (en) 2011-09-27
EP1794236B1 (de) 2008-12-31
TW200619235A (en) 2006-06-16
WO2006024500A1 (en) 2006-03-09
US20090001632A1 (en) 2009-01-01
JP2008511702A (ja) 2008-04-17
EP1794236A1 (de) 2007-06-13

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