ATE419308T1 - Filmbildendes material und herstellung von oberflächenreliefstrukturen und optisch anisotropen strukturen durch bestrahlung eines films aus dem material - Google Patents

Filmbildendes material und herstellung von oberflächenreliefstrukturen und optisch anisotropen strukturen durch bestrahlung eines films aus dem material

Info

Publication number
ATE419308T1
ATE419308T1 AT05784051T AT05784051T ATE419308T1 AT E419308 T1 ATE419308 T1 AT E419308T1 AT 05784051 T AT05784051 T AT 05784051T AT 05784051 T AT05784051 T AT 05784051T AT E419308 T1 ATE419308 T1 AT E419308T1
Authority
AT
Austria
Prior art keywords
film
structures
polyelectrolyte
surface relief
irradiation
Prior art date
Application number
AT05784051T
Other languages
English (en)
Inventor
Joachim Stumpe
Leonid Goldenberg
Olga Kulikovska
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP04020997A external-priority patent/EP1632520A1/de
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Application granted granted Critical
Publication of ATE419308T1 publication Critical patent/ATE419308T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04—Acids, Metal salts or ammonium salts thereof
    • C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/23—Azo-compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT05784051T 2004-09-03 2005-08-30 Filmbildendes material und herstellung von oberflächenreliefstrukturen und optisch anisotropen strukturen durch bestrahlung eines films aus dem material ATE419308T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04020997A EP1632520A1 (de) 2004-09-03 2004-09-03 Filmbildendes Material und Herstellung von Oberflächenrelief- und optisch anisotropen Strukturen durch Bestrahlen eines Films des fimbildenden Materials
EP04029262 2004-12-09

Publications (1)

Publication Number Publication Date
ATE419308T1 true ATE419308T1 (de) 2009-01-15

Family

ID=35159871

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05784051T ATE419308T1 (de) 2004-09-03 2005-08-30 Filmbildendes material und herstellung von oberflächenreliefstrukturen und optisch anisotropen strukturen durch bestrahlung eines films aus dem material

Country Status (9)

Country Link
US (1) US8026021B2 (de)
EP (1) EP1794236B1 (de)
JP (1) JP2008511702A (de)
KR (1) KR20070102983A (de)
AT (1) ATE419308T1 (de)
DE (1) DE602005012128D1 (de)
ES (1) ES2318529T3 (de)
TW (1) TW200619235A (de)
WO (1) WO2006024500A1 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200624479A (en) * 2004-12-09 2006-07-16 Fraunhofer Ges Forschung Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material
EP1720163A1 (de) * 2005-05-05 2006-11-08 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Filmformende lichtempfindliche Materialien für die von Licht eingeführte Erzeugung optischer Anisotropie
CN100386388C (zh) * 2006-03-21 2008-05-07 宁波大学 茜素黄稀土铬染料制备方法
KR100764403B1 (ko) * 2006-05-11 2007-10-05 삼성전기주식회사 아조벤젠기 폴리머를 이용한 미세 패터닝 방법을 이용한 질화물계 반도체 발광소자의 제조방법
KR100735470B1 (ko) * 2006-05-19 2007-07-03 삼성전기주식회사 질화물계 반도체 발광소자의 제조방법
DE102006062457A1 (de) * 2006-12-28 2008-07-03 Bayer Innovation Gmbh Optische Speichermedien und Verfahren zu deren Herstellung
DE102008059756A1 (de) * 2008-12-01 2010-06-10 Tesa Se Verfahren zum Markieren oder Beschriften eines Werkstücks
CN102472847B (zh) * 2009-07-16 2014-03-12 吉坤日矿日石能源株式会社 衍射光栅、使用该衍射光栅的有机el元件及其制造方法
US8450028B2 (en) * 2011-03-29 2013-05-28 Sabic Innovative Plastics Ip B.V. Holographic storage method
WO2016020630A2 (en) 2014-08-08 2016-02-11 Milan Momcilo Popovich Waveguide laser illuminator incorporating a despeckler
CN103562802B (zh) 2012-04-25 2016-08-17 罗克韦尔柯林斯公司 全息广角显示器
US9933684B2 (en) 2012-11-16 2018-04-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration
JP6101784B2 (ja) * 2013-03-06 2017-03-22 Ｊｘエネルギー株式会社 凹凸構造を有する部材の製造方法及びそれにより製造された凹凸構造を有する部材
US10179952B2 (en) * 2013-03-08 2019-01-15 Rutgers, The State University Of New Jersey Patterned thin films by thermally induced mass displacement
CN103204460B (zh) * 2013-03-21 2016-03-02 北京工业大学 基于激光干涉诱导交联反应的金属微纳结构的制备方法
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US10241330B2 (en) 2014-09-19 2019-03-26 Digilens, Inc. Method and apparatus for generating input images for holographic waveguide displays
WO2016113534A1 (en) 2015-01-12 2016-07-21 Milan Momcilo Popovich Environmentally isolated waveguide display
US9632226B2 (en) 2015-02-12 2017-04-25 Digilens Inc. Waveguide grating device
CN104914493A (zh) * 2015-06-02 2015-09-16 苏州大学 一种全息制作平面闪耀光栅的方法
CN113759555B (zh) 2015-10-05 2024-09-20 迪吉伦斯公司 波导显示器
US11513350B2 (en) 2016-12-02 2022-11-29 Digilens Inc. Waveguide device with uniform output illumination
WO2018129398A1 (en) 2017-01-05 2018-07-12 Digilens, Inc. Wearable heads up displays
CN114721242B (zh) 2018-01-08 2025-08-15 迪吉伦斯公司 用于制造光学波导的方法
CN111566571B (zh) 2018-01-08 2022-05-13 迪吉伦斯公司 波导单元格中全息光栅高吞吐量记录的系统和方法
TWI821234B (zh) 2018-01-09 2023-11-11 美商康寧公司 具光改變特徵之塗覆製品及用於製造彼等之方法
WO2020149956A1 (en) 2019-01-14 2020-07-23 Digilens Inc. Holographic waveguide display with light control layer
US20200247017A1 (en) 2019-02-05 2020-08-06 Digilens Inc. Methods for Compensating for Optical Surface Nonuniformity
US20220283377A1 (en) 2019-02-15 2022-09-08 Digilens Inc. Wide Angle Waveguide Display
KR102866596B1 (ko) 2019-02-15 2025-09-29 디지렌즈 인코포레이티드. 일체형 격자를 이용하여 홀로그래픽 도파관 디스플레이를 제공하기 위한 방법 및 장치
KR20220016990A (ko) 2019-06-07 2022-02-10 디지렌즈 인코포레이티드. 투과 및 반사 격자를 통합하는 도파관 및 관련 제조 방법
WO2021041949A1 (en) 2019-08-29 2021-03-04 Digilens Inc. Evacuating bragg gratings and methods of manufacturing
US12386101B2 (en) 2020-07-09 2025-08-12 Corning Incorporated Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same
KR20230153459A (ko) 2021-03-05 2023-11-06 디지렌즈 인코포레이티드. 진공 주기적 구조체 및 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2787614A (en) * 1953-10-01 1957-04-02 Bayer Ag Yellow substantive azo dyestuffs and process of making the same
JPS58143340A (ja) * 1982-02-22 1983-08-25 Toshiba Corp ホトレジスト組成物
JPH03211531A (ja) * 1990-01-17 1991-09-17 Sumitomo Electric Ind Ltd 非線形高分子材料
EP0874028B1 (de) * 1996-11-13 2003-06-11 Seiko Epson Corporation Tintezusammensetzung enthaltend ein wasserlösliches harz
JP2002071959A (ja) * 2000-08-31 2002-03-12 Hitachi Chem Co Ltd ホログラフィーによる光制御素子作製方法および光制御素子
JP3695398B2 (ja) 2002-01-30 2005-09-14 富士ゼロックス株式会社 光学式エンコーダ及びエンコーダ用スケール
WO2008036298A2 (en) 2006-09-19 2008-03-27 Hypro, Llc Spray head with covers

Also Published As

Publication number Publication date
ES2318529T3 (es) 2009-05-01
JP2008511702A (ja) 2008-04-17
EP1794236A1 (de) 2007-06-13
KR20070102983A (ko) 2007-10-22
DE602005012128D1 (de) 2009-02-12
EP1794236B1 (de) 2008-12-31
WO2006024500A1 (en) 2006-03-09
US8026021B2 (en) 2011-09-27
US20090001632A1 (en) 2009-01-01
TW200619235A (en) 2006-06-16

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