DE602005009011D1 - Verfahren zur herstellung vonhexaalkylborazin - Google Patents

Verfahren zur herstellung vonhexaalkylborazin

Info

Publication number
DE602005009011D1
DE602005009011D1 DE602005009011T DE602005009011T DE602005009011D1 DE 602005009011 D1 DE602005009011 D1 DE 602005009011D1 DE 602005009011 T DE602005009011 T DE 602005009011T DE 602005009011 T DE602005009011 T DE 602005009011T DE 602005009011 D1 DE602005009011 D1 DE 602005009011D1
Authority
DE
Germany
Prior art keywords
hexaalkylborazine
preparing
preparing hexaalkylborazine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005009011T
Other languages
English (en)
Inventor
Norio Miyaura
Yasunori Yamamoto
Yasutaka Nakatani
Tetsuya Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Publication of DE602005009011D1 publication Critical patent/DE602005009011D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
    • C07F5/02—Boron compounds
    • C07F5/05—Cyclic compounds having at least one ring containing boron but no carbon in the ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
    • C07F5/02—Boron compounds
DE602005009011T 2004-11-08 2005-10-28 Verfahren zur herstellung vonhexaalkylborazin Active DE602005009011D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004323830A JP4785028B2 (ja) 2004-11-08 2004-11-08 ヘキサアルキルボラジンの製造方法
PCT/JP2005/020255 WO2006049229A1 (en) 2004-11-08 2005-10-28 Method for producing hexaalkylborazine

Publications (1)

Publication Number Publication Date
DE602005009011D1 true DE602005009011D1 (de) 2008-09-25

Family

ID=35431958

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005009011T Active DE602005009011D1 (de) 2004-11-08 2005-10-28 Verfahren zur herstellung vonhexaalkylborazin

Country Status (8)

Country Link
US (1) US7662998B2 (de)
EP (1) EP1809641B1 (de)
JP (1) JP4785028B2 (de)
KR (1) KR100908281B1 (de)
CN (1) CN101084230B (de)
DE (1) DE602005009011D1 (de)
TW (1) TWI352083B (de)
WO (1) WO2006049229A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4722504B2 (ja) * 2005-02-03 2011-07-13 株式会社日本触媒 Ｎ−アルキルボラジンおよびその製造方法
JP4904105B2 (ja) * 2006-07-20 2012-03-28 株式会社日本触媒 ヘキサアルキルボラジンの製造方法
JP4795152B2 (ja) * 2006-07-25 2011-10-19 株式会社日本触媒 ボラジン化合物を用いた還元剤および還元方法
JP2008044878A (ja) * 2006-08-14 2008-02-28 Nippon Shokubai Co Ltd Ｎ−アルキルボラジンの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3767248B2 (ja) 1999-06-01 2006-04-19 三菱電機株式会社 半導体装置
JP3778045B2 (ja) 2001-10-09 2006-05-24 三菱電機株式会社 低誘電率材料の製造方法および低誘電率材料、並びにこの低誘電率材料を用いた絶縁膜および半導体装置
JP3778164B2 (ja) 2002-12-06 2006-05-24 三菱電機株式会社 低誘電率膜の形成方法

Also Published As

Publication number Publication date
JP4785028B2 (ja) 2011-10-05
US7662998B2 (en) 2010-02-16
JP2006131569A (ja) 2006-05-25
EP1809641B1 (de) 2008-08-13
CN101084230A (zh) 2007-12-05
KR100908281B1 (ko) 2009-07-17
EP1809641A1 (de) 2007-07-25
TW200616980A (en) 2006-06-01
KR20070091108A (ko) 2007-09-07
TWI352083B (en) 2011-11-11
CN101084230B (zh) 2010-12-15
WO2006049229A1 (en) 2006-05-11
US20080188682A1 (en) 2008-08-07

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