DE602004027988D1 - Verfahren zur herstellung von transparenten titanoxidbeschichtungen mit rutilstruktur - Google Patents

Verfahren zur herstellung von transparenten titanoxidbeschichtungen mit rutilstruktur

Info

Publication number
DE602004027988D1
DE602004027988D1 DE602004027988T DE602004027988T DE602004027988D1 DE 602004027988 D1 DE602004027988 D1 DE 602004027988D1 DE 602004027988 T DE602004027988 T DE 602004027988T DE 602004027988 T DE602004027988 T DE 602004027988T DE 602004027988 D1 DE602004027988 D1 DE 602004027988D1
Authority
DE
Germany
Prior art keywords
coating
titanium oxide
oxide coatings
rutil
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004027988T
Other languages
English (en)
Inventor
Arnd Ritz
Michael Vergoehl
Berno Hunsche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Original Assignee
Philips Intellectual Property and Standards GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Intellectual Property and Standards GmbH filed Critical Philips Intellectual Property and Standards GmbH
Publication of DE602004027988D1 publication Critical patent/DE602004027988D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Surface Treatment Of Glass (AREA)
DE602004027988T 2003-01-28 2004-01-21 Verfahren zur herstellung von transparenten titanoxidbeschichtungen mit rutilstruktur Expired - Lifetime DE602004027988D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03100169 2003-01-28
PCT/IB2004/000133 WO2004067464A1 (en) 2003-01-28 2004-01-21 Method of producing transparent titanium oxide coatings having a rutile structure

Publications (1)

Publication Number Publication Date
DE602004027988D1 true DE602004027988D1 (de) 2010-08-19

Family

ID=32798982

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004027988T Expired - Lifetime DE602004027988D1 (de) 2003-01-28 2004-01-21 Verfahren zur herstellung von transparenten titanoxidbeschichtungen mit rutilstruktur

Country Status (8)

Country Link
US (1) US20060257669A1 (de)
EP (1) EP1590306B1 (de)
JP (1) JP4713462B2 (de)
CN (1) CN100431995C (de)
AT (1) ATE473202T1 (de)
DE (1) DE602004027988D1 (de)
TW (1) TWI372140B (de)
WO (1) WO2004067464A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI352071B (en) 2003-01-28 2011-11-11 Koninkl Philips Electronics Nv Transparent titanium oxide-aluminum and/or aluminu
JP2008505841A (ja) 2004-07-12 2008-02-28 日本板硝子株式会社 低保守コーティング
DE102004052169A1 (de) * 2004-10-27 2006-05-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Oberflächenveredeltes Objekt, Verfahren zu dessen Herstellung sowie Verwendung des Objektes
WO2007124291A2 (en) 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
WO2008072612A1 (ja) * 2006-12-11 2008-06-19 Horiba, Ltd. イオン電極用応答ガラス膜の製造方法、イオン電極用応答ガラス膜及びイオン電極
US8847888B2 (en) * 2007-12-18 2014-09-30 Microsoft Corporation Optical mouse with limited wavelength optics
WO2012012563A2 (en) * 2010-07-20 2012-01-26 Deposition Sciences, Inc. Improved ir coatings and methods
JP5830238B2 (ja) * 2010-11-17 2015-12-09 古河電気工業株式会社 酸化物薄膜の製造方法
CN103029378B (zh) * 2012-09-14 2014-09-17 泉耀新材料科技（苏州）有限公司 一种低折射率二氧化钛减反射增透光照明灯具镀膜玻璃
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
TW202300959A (zh) * 2021-03-11 2023-01-01 美商應用材料股份有限公司 藉由物理氣相沉積所沉積的氧化鈦光學裝置薄膜
WO2023064122A1 (en) * 2021-10-13 2023-04-20 Applied Materials, Inc. Rutile phase deposition with preferred crystal orientations

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650815A (en) * 1969-10-06 1972-03-21 Westinghouse Electric Corp Chemical vapor deposition of dielectric thin films of rutile
US4048347A (en) * 1975-08-11 1977-09-13 Gte Sylvania Incorporated Method of coating lamp envelope with heat reflecting filter
JPS57181503A (en) * 1981-04-30 1982-11-09 Nippon Soken Inc Heat ray reflecting film
JPS58137809A (ja) * 1982-02-10 1983-08-16 Fujitsu Ltd 高安定誘電体多層膜光学フイルタ
JPS5958753A (ja) * 1982-09-28 1984-04-04 株式会社東芝 白熱電球
ES2077562T3 (es) * 1987-07-22 1995-12-01 Philips Electronics Nv Filtro de interferencia optico.
JPH0773042B2 (ja) * 1989-11-24 1995-08-02 東芝ライテック株式会社 管 球
JP3397824B2 (ja) * 1993-01-22 2003-04-21 日本板硝子株式会社 熱線反射膜及び熱線反射体
US5362552A (en) * 1993-09-23 1994-11-08 Austin R Russel Visible-spectrum anti-reflection coating including electrically-conductive metal oxide layers
DE19644752A1 (de) * 1996-10-28 1998-04-30 Leybold Systems Gmbh Interferenzschichtensystem
CN1118587C (zh) * 2000-12-07 2003-08-20 杉杉集团有限公司 金红石疏水薄膜的强化直流磁控溅射制备方法
JP2002348145A (ja) * 2001-05-24 2002-12-04 Nippon Sheet Glass Co Ltd 近赤外線遮断ガラス
CN1141178C (zh) * 2001-10-31 2004-03-10 清华大学 二氧化钛光催化空气净化薄膜及其制备方法

Also Published As

Publication number Publication date
US20060257669A1 (en) 2006-11-16
JP2006519926A (ja) 2006-08-31
JP4713462B2 (ja) 2011-06-29
EP1590306B1 (de) 2010-07-07
TWI372140B (en) 2012-09-11
EP1590306A1 (de) 2005-11-02
ATE473202T1 (de) 2010-07-15
CN1741971A (zh) 2006-03-01
WO2004067464A1 (en) 2004-08-12
CN100431995C (zh) 2008-11-12
TW200502186A (en) 2005-01-16

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