DE602004026705D1 - Streumesser und verfahren zur beobachtung einer oberfläche - Google Patents

Streumesser und verfahren zur beobachtung einer oberfläche

Info

Publication number
DE602004026705D1
DE602004026705D1 DE602004026705T DE602004026705T DE602004026705D1 DE 602004026705 D1 DE602004026705 D1 DE 602004026705D1 DE 602004026705 T DE602004026705 T DE 602004026705T DE 602004026705 T DE602004026705 T DE 602004026705T DE 602004026705 D1 DE602004026705 D1 DE 602004026705D1
Authority
DE
Germany
Prior art keywords
sample
screen
light beam
incident light
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004026705T
Other languages
English (en)
Inventor
Sipke Wadman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE602004026705D1 publication Critical patent/DE602004026705D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474—Details of optical heads therefor, e.g. using optical fibres
DE602004026705T 2003-02-28 2004-02-18 Streumesser und verfahren zur beobachtung einer oberfläche Expired - Lifetime DE602004026705D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03100512 2003-02-28
PCT/IB2004/050123 WO2004077032A1 (en) 2003-02-28 2004-02-18 A scatterometer and a method for observing a surface

Publications (1)

Publication Number Publication Date
DE602004026705D1 true DE602004026705D1 (de) 2010-06-02

Family

ID=32921622

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004026705T Expired - Lifetime DE602004026705D1 (de) 2003-02-28 2004-02-18 Streumesser und verfahren zur beobachtung einer oberfläche

Country Status (7)

Country Link
US (1) US7349096B2 (de)
EP (1) EP1611430B1 (de)
JP (1) JP4639179B2 (de)
CN (1) CN100567960C (de)
AT (1) ATE465402T1 (de)
DE (1) DE602004026705D1 (de)
WO (1) WO2004077032A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007020554A1 (en) * 2005-08-15 2007-02-22 Koninklijke Philips Electronics, N.V. Dual beam set-up for scatterometer
CN101346620A (zh) * 2005-12-23 2009-01-14 皇家飞利浦电子股份有限公司 光学测量设备
JP5204093B2 (ja) * 2006-04-18 2013-06-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 光学測定装置
CN101427125B (zh) 2006-04-18 2011-09-14 皇家飞利浦电子股份有限公司 光学测量设备
BRPI0718200A8 (pt) 2006-10-05 2017-12-05 Koninklijke Philips Electronics Nv Aparelho para observar a aparência da superfície de uma amostra, e, método para observar a aparência da superfície de uma amostra
EP2252208B1 (de) * 2008-03-18 2014-05-14 Koninklijke Philips N.V. Vorrichtung zur hautabbildung und system zur hautanalyse
FI125320B (en) * 2012-01-05 2015-08-31 Helmee Imaging Oy ORGANIZATION AND SIMILAR METHOD FOR OPTICAL MEASUREMENTS
JP2014044157A (ja) * 2012-08-28 2014-03-13 Ricoh Co Ltd 光学センサ及び画像形成装置
US11314074B2 (en) 2018-03-12 2022-04-26 The University Of North Carolina At Chapel Hill Light disc microscopy for fluorescence microscopes
WO2019178093A1 (en) * 2018-03-12 2019-09-19 The University Of North Carolina At Chapel Hill Mirror image microscopy for increased collection

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3111274A (en) * 1963-11-19 Cover for photoflash gun attachment
GB470755A (en) * 1937-01-25 1937-08-23 Alchanan Cohen Improvements in lighting accessories for photographic purposes and the like
US4344709A (en) * 1980-05-08 1982-08-17 Scm Corporation Method and apparatus for photogoniometric analysis of surfaces
JPS5979841A (ja) * 1982-10-29 1984-05-09 Shimadzu Corp 絶対反射率測定装置
SU1117496A1 (ru) * 1983-05-20 1984-10-07 Предприятие П/Я Г-4671 Способ измерени коэффициентов рассе ни объектов
DE3731171A1 (de) * 1987-09-17 1989-03-30 Gerd Prof Selbach Schartigkeitsmessgeraet
US5241369A (en) * 1990-10-01 1993-08-31 Mcneil John R Two-dimensional optical scatterometer apparatus and process
JPH0676929U (ja) * 1993-03-31 1994-10-28 カシオ計算機株式会社 高分子分散型液晶表示素子の製造装置
US5745234A (en) * 1995-07-31 1998-04-28 The United States Of America As Represented By The Secretary Of The Navy Variable angle reflectometer employing an integrating sphere and a light concentrator
US5912741A (en) * 1997-10-10 1999-06-15 Northrop Grumman Corporation Imaging scatterometer
US6424413B1 (en) 1998-06-12 2002-07-23 Gretagmacbeth Llc Multi-channel integrating sphere
US5943127A (en) * 1998-11-09 1999-08-24 General Electric Company Coined line analyzer
JP4763134B2 (ja) * 1998-12-21 2011-08-31 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ スキャッタメータ
DE19920184C2 (de) 1999-05-03 2001-06-07 Optosens Optische Spektroskopi Verfahren für die gleichzeitige Erfassung von diffuser und specularer Reflexion von Proben, insbesondere undurchsichtiger Proben, sowie Reflektanz-Meßsonde

Also Published As

Publication number Publication date
JP2006519379A (ja) 2006-08-24
WO2004077032A1 (en) 2004-09-10
EP1611430A1 (de) 2006-01-04
CN1754094A (zh) 2006-03-29
ATE465402T1 (de) 2010-05-15
US7349096B2 (en) 2008-03-25
JP4639179B2 (ja) 2011-02-23
EP1611430B1 (de) 2010-04-21
US20060146343A1 (en) 2006-07-06
CN100567960C (zh) 2009-12-09

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