DE602004009841D1 - Diffusionsplatte und Verfahren zu deren Herstellung - Google Patents
Diffusionsplatte und Verfahren zu deren HerstellungInfo
- Publication number
- DE602004009841D1 DE602004009841D1 DE602004009841T DE602004009841T DE602004009841D1 DE 602004009841 D1 DE602004009841 D1 DE 602004009841D1 DE 602004009841 T DE602004009841 T DE 602004009841T DE 602004009841 T DE602004009841 T DE 602004009841T DE 602004009841 D1 DE602004009841 D1 DE 602004009841D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- diffusion plate
- diffusion
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US44005303P | 2003-01-15 | 2003-01-15 | |
US440053P | 2003-01-15 | ||
US10/688,923 US7002747B2 (en) | 2003-01-15 | 2003-10-21 | Diffuser plate and method of making same |
US688923 | 2003-10-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602004009841D1 true DE602004009841D1 (de) | 2007-12-20 |
DE602004009841T2 DE602004009841T2 (de) | 2008-02-21 |
Family
ID=32600287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004009841T Expired - Fee Related DE602004009841T2 (de) | 2003-01-15 | 2004-01-13 | Diffusionsplatte und Verfahren zu deren Herstellung |
Country Status (8)
Country | Link |
---|---|
US (2) | US7002747B2 (de) |
EP (1) | EP1439426B1 (de) |
JP (1) | JP4131704B2 (de) |
KR (1) | KR100586344B1 (de) |
CN (1) | CN1278142C (de) |
DE (1) | DE602004009841T2 (de) |
SG (2) | SG143070A1 (de) |
TW (1) | TWI287693B (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7837361B2 (en) * | 2000-07-14 | 2010-11-23 | Ledalite Architectural Products | Light control devices implemented with diffusers having controllable diffusion characteristics |
US6867846B2 (en) * | 2003-01-15 | 2005-03-15 | Asml Holding Nv | Tailored reflecting diffractor for EUV lithographic system aberration measurement |
US7027164B2 (en) * | 2003-01-15 | 2006-04-11 | Asml Holding N.V. | Speckle reduction method and system for EUV interferometry |
US7268891B2 (en) * | 2003-01-15 | 2007-09-11 | Asml Holding N.V. | Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
US7081956B1 (en) * | 2003-12-04 | 2006-07-25 | Advanced Micro Devices, Inc. | Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system |
US20050259269A1 (en) * | 2004-05-19 | 2005-11-24 | Asml Holding N.V. | Shearing interferometer with dynamic pupil fill |
US20050275841A1 (en) * | 2004-06-09 | 2005-12-15 | Asml Netherlands B.V. | Alignment marker and lithographic apparatus and device manufacturing method using the same |
JP4518078B2 (ja) | 2004-09-22 | 2010-08-04 | 株式会社ニコン | 照明装置、露光装置及びマイクロデバイスの製造方法 |
JP2006332586A (ja) * | 2005-04-25 | 2006-12-07 | Canon Inc | 測定装置、露光装置及び方法、並びに、デバイス製造方法 |
KR100735530B1 (ko) * | 2006-02-02 | 2007-07-04 | 삼성전자주식회사 | 단차를 가진 반사층을 포함하는 반사형 포토마스크 및 그 제조방법 |
JP5179565B2 (ja) * | 2007-04-10 | 2013-04-10 | レダライト アーキテクチュラル プロダクツ,インコーポレイテッド | 上方及び下方範囲においてバットウイング光度分布を呈する調光装置 |
NL1036305A1 (nl) * | 2007-12-21 | 2009-06-23 | Asml Netherlands Bv | Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system. |
US7821900B2 (en) * | 2008-05-15 | 2010-10-26 | Northrop Grumman Systems Corporation | Diffractive optical element and method of designing the same |
US9097982B2 (en) | 2008-05-30 | 2015-08-04 | Asml Netherlands B.V. | Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter |
CN101907781B (zh) * | 2010-07-13 | 2012-04-18 | 杭州电子科技大学 | 一种具有光束会聚功能的光学平板制作方法 |
WO2013113537A2 (en) * | 2012-01-30 | 2013-08-08 | Asml Netherlands B.V. | Optical element, lithographic apparatus incorporating such an element, method of manufacturing an optical element |
CN104111120B (zh) * | 2014-07-25 | 2017-05-31 | 中国科学院上海光学精密机械研究所 | 基于朗奇剪切干涉仪的相位提取方法 |
DE102014221313A1 (de) | 2014-10-21 | 2016-04-21 | Carl Zeiss Smt Gmbh | Beleuchtung für die EUV-Projektionslithografie |
JP2021500603A (ja) * | 2017-10-19 | 2021-01-07 | サイマー リミテッド ライアビリティ カンパニー | 単一リソグラフィ露光パスで複数の空間像を形成すること |
CN108709160A (zh) * | 2018-06-15 | 2018-10-26 | 浙江彩丞照明科技有限公司 | 一种可对光线进行漫反射的眩光抑制板 |
US20200379336A1 (en) * | 2019-06-03 | 2020-12-03 | Kla Corporation | Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspection Systems |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2269055B (en) * | 1992-07-09 | 1996-06-05 | Flat Antenna Co Ltd | Phase correcting zone plate |
JP3078163B2 (ja) * | 1993-10-15 | 2000-08-21 | キヤノン株式会社 | リソグラフィ用反射型マスクおよび縮小投影露光装置 |
EP0712012A1 (de) * | 1994-11-09 | 1996-05-15 | International Business Machines Corporation | Authentizitätslabel und Authentizitätsmuster mit Beugungsstruktur und Methode zu deren Herstellung |
US5958629A (en) * | 1997-12-22 | 1999-09-28 | Intel Corporation | Using thin films as etch stop in EUV mask fabrication process |
US6072631A (en) * | 1998-07-09 | 2000-06-06 | 3M Innovative Properties Company | Diffractive homogenizer with compensation for spatial coherence |
JP2000266914A (ja) | 1999-03-12 | 2000-09-29 | Toppan Printing Co Ltd | 光拡散体およびそれを用いた表示装置 |
US6163405A (en) * | 1999-04-15 | 2000-12-19 | Industrial Technology Research Institute | Structure of a reflection-type light diffuser in a LCD |
DE19958201A1 (de) * | 1999-12-02 | 2001-06-21 | Infineon Technologies Ag | Lithographieverfahren und Maske zu dessen Durchführung |
GB9928483D0 (en) | 1999-12-03 | 2000-02-02 | Renishaw Plc | Opto-electronic scale reading apparatus |
US6410193B1 (en) * | 1999-12-30 | 2002-06-25 | Intel Corporation | Method and apparatus for a reflective mask that is inspected at a first wavelength and exposed during semiconductor manufacturing at a second wavelength |
EP1197803B1 (de) | 2000-10-10 | 2012-02-01 | ASML Netherlands B.V. | Lithographischer Apparat |
US6392792B1 (en) * | 2000-12-05 | 2002-05-21 | The Regents Of The University Of California | Method of fabricating reflection-mode EUV diffraction elements |
US6656643B2 (en) | 2001-02-20 | 2003-12-02 | Chartered Semiconductor Manufacturing Ltd. | Method of extreme ultraviolet mask engineering |
US7027226B2 (en) * | 2001-09-17 | 2006-04-11 | Euv Llc | Diffractive optical element for extreme ultraviolet wavefront control |
-
2003
- 2003-10-21 US US10/688,923 patent/US7002747B2/en not_active Expired - Lifetime
-
2004
- 2004-01-12 SG SG200602856-7A patent/SG143070A1/en unknown
- 2004-01-12 SG SG200400112A patent/SG107676A1/en unknown
- 2004-01-13 DE DE602004009841T patent/DE602004009841T2/de not_active Expired - Fee Related
- 2004-01-13 TW TW093100808A patent/TWI287693B/zh not_active IP Right Cessation
- 2004-01-13 EP EP04000512A patent/EP1439426B1/de not_active Expired - Fee Related
- 2004-01-14 KR KR1020040002562A patent/KR100586344B1/ko not_active IP Right Cessation
- 2004-01-15 CN CNB2004100019076A patent/CN1278142C/zh not_active Expired - Fee Related
- 2004-01-15 JP JP2004008392A patent/JP4131704B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-19 US US11/183,847 patent/US7164534B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1519590A (zh) | 2004-08-11 |
CN1278142C (zh) | 2006-10-04 |
US7002747B2 (en) | 2006-02-21 |
JP4131704B2 (ja) | 2008-08-13 |
TWI287693B (en) | 2007-10-01 |
US20040136075A1 (en) | 2004-07-15 |
DE602004009841T2 (de) | 2008-02-21 |
US20050248743A1 (en) | 2005-11-10 |
SG143070A1 (en) | 2008-06-27 |
EP1439426B1 (de) | 2007-11-07 |
SG107676A1 (en) | 2004-12-29 |
KR100586344B1 (ko) | 2006-06-08 |
EP1439426A3 (de) | 2005-02-16 |
US7164534B2 (en) | 2007-01-16 |
TW200417814A (en) | 2004-09-16 |
EP1439426A2 (de) | 2004-07-21 |
KR20040066017A (ko) | 2004-07-23 |
JP2004221599A (ja) | 2004-08-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |