DE602004000805T2 - Polierpad mit einem Fenster hoher optischer Transmission - Google Patents

Polierpad mit einem Fenster hoher optischer Transmission Download PDF

Info

Publication number
DE602004000805T2
DE602004000805T2 DE602004000805T DE602004000805T DE602004000805T2 DE 602004000805 T2 DE602004000805 T2 DE 602004000805T2 DE 602004000805 T DE602004000805 T DE 602004000805T DE 602004000805 T DE602004000805 T DE 602004000805T DE 602004000805 T2 DE602004000805 T2 DE 602004000805T2
Authority
DE
Germany
Prior art keywords
diisocyanate
polishing pad
window
hexamethylene
curing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004000805T
Other languages
German (de)
English (en)
Other versions
DE602004000805D1 (de
Inventor
John V. H. Newark Roberts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials Holding Inc
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Rohm and Haas Electronic Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34465692&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602004000805(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc, Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of DE602004000805D1 publication Critical patent/DE602004000805D1/de
Application granted granted Critical
Publication of DE602004000805T2 publication Critical patent/DE602004000805T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
DE602004000805T 2003-11-25 2004-11-15 Polierpad mit einem Fenster hoher optischer Transmission Expired - Lifetime DE602004000805T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US722739 1991-06-27
US10/722,739 US6984163B2 (en) 2003-11-25 2003-11-25 Polishing pad with high optical transmission window

Publications (2)

Publication Number Publication Date
DE602004000805D1 DE602004000805D1 (de) 2006-06-08
DE602004000805T2 true DE602004000805T2 (de) 2006-11-30

Family

ID=34465692

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004000805T Expired - Lifetime DE602004000805T2 (de) 2003-11-25 2004-11-15 Polierpad mit einem Fenster hoher optischer Transmission

Country Status (7)

Country Link
US (1) US6984163B2 (https=)
EP (1) EP1535699B1 (https=)
JP (1) JP2005175464A (https=)
KR (1) KR101120647B1 (https=)
CN (1) CN100347826C (https=)
DE (1) DE602004000805T2 (https=)
TW (1) TWI324545B (https=)

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* Cited by examiner, † Cited by third party
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US9156125B2 (en) * 2012-04-11 2015-10-13 Cabot Microelectronics Corporation Polishing pad with light-stable light-transmitting region
US9186772B2 (en) 2013-03-07 2015-11-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith
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US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
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US9868185B2 (en) * 2015-11-03 2018-01-16 Cabot Microelectronics Corporation Polishing pad with foundation layer and window attached thereto
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US10293456B2 (en) * 2017-04-19 2019-05-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
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Also Published As

Publication number Publication date
DE602004000805D1 (de) 2006-06-08
JP2005175464A (ja) 2005-06-30
TW200531785A (en) 2005-10-01
EP1535699B1 (en) 2006-05-03
KR101120647B1 (ko) 2012-03-16
US20050113008A1 (en) 2005-05-26
US6984163B2 (en) 2006-01-10
EP1535699A1 (en) 2005-06-01
KR20050050582A (ko) 2005-05-31
TWI324545B (en) 2010-05-11
CN100347826C (zh) 2007-11-07
CN1622289A (zh) 2005-06-01

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