DE69618437T2 - Verfahren und Vorrichtung zum Polieren von Werkstücken - Google Patents
Verfahren und Vorrichtung zum Polieren von WerkstückenInfo
- Publication number
- DE69618437T2 DE69618437T2 DE69618437T DE69618437T DE69618437T2 DE 69618437 T2 DE69618437 T2 DE 69618437T2 DE 69618437 T DE69618437 T DE 69618437T DE 69618437 T DE69618437 T DE 69618437T DE 69618437 T2 DE69618437 T2 DE 69618437T2
- Authority
- DE
- Germany
- Prior art keywords
- polishing workpieces
- workpieces
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405596 | 1996-02-16 | ||
JP17173596 | 1996-06-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69618437D1 DE69618437D1 (de) | 2002-02-14 |
DE69618437T2 true DE69618437T2 (de) | 2002-08-29 |
Family
ID=26394800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69618437T Expired - Lifetime DE69618437T2 (de) | 1996-02-16 | 1996-10-09 | Verfahren und Vorrichtung zum Polieren von Werkstücken |
Country Status (4)
Country | Link |
---|---|
US (2) | US5916412A (de) |
EP (2) | EP0790100B1 (de) |
KR (1) | KR100485002B1 (de) |
DE (1) | DE69618437T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10222956A1 (de) * | 2002-05-24 | 2003-12-11 | Fip Forschungsinstitut Fuer Pr | Feinschleifmaschine |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6024630A (en) | 1995-06-09 | 2000-02-15 | Applied Materials, Inc. | Fluid-pressure regulated wafer polishing head |
JP3724869B2 (ja) * | 1995-10-09 | 2005-12-07 | 株式会社荏原製作所 | ポリッシング装置および方法 |
US6139428A (en) * | 1996-12-17 | 2000-10-31 | Vsli Technology, Inc. | Conditioning ring for use in a chemical mechanical polishing machine |
JPH10230455A (ja) * | 1997-02-17 | 1998-09-02 | Nec Corp | 研磨装置 |
US6077385A (en) * | 1997-04-08 | 2000-06-20 | Ebara Corporation | Polishing apparatus |
US6196904B1 (en) | 1998-03-25 | 2001-03-06 | Ebara Corporation | Polishing apparatus |
US6106379A (en) * | 1998-05-12 | 2000-08-22 | Speedfam-Ipec Corporation | Semiconductor wafer carrier with automatic ring extension |
US5985094A (en) * | 1998-05-12 | 1999-11-16 | Speedfam-Ipec Corporation | Semiconductor wafer carrier |
US6436228B1 (en) | 1998-05-15 | 2002-08-20 | Applied Materials, Inc. | Substrate retainer |
US6251215B1 (en) | 1998-06-03 | 2001-06-26 | Applied Materials, Inc. | Carrier head with a multilayer retaining ring for chemical mechanical polishing |
US6102779A (en) * | 1998-06-17 | 2000-08-15 | Speedfam-Ipec, Inc. | Method and apparatus for improved semiconductor wafer polishing |
US5993293A (en) * | 1998-06-17 | 1999-11-30 | Speedram Corporation | Method and apparatus for improved semiconductor wafer polishing |
WO2000025981A1 (fr) * | 1998-10-30 | 2000-05-11 | Shin-Etsu Handotai Co., Ltd. | Plan non poli de maintien/travail et son procede de fabrication ; technique et dispositif de polissage |
US6220930B1 (en) * | 1998-11-03 | 2001-04-24 | United Microelectronics Corp. | Wafer polishing head |
US6283828B1 (en) | 1998-11-09 | 2001-09-04 | Tokyo Seimitsu Co., Ltd. | Wafer polishing apparatus |
US6524164B1 (en) * | 1999-09-14 | 2003-02-25 | Applied Materials, Inc. | Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
JP2001121411A (ja) | 1999-10-29 | 2001-05-08 | Applied Materials Inc | ウェハー研磨装置 |
US6517422B2 (en) * | 2000-03-07 | 2003-02-11 | Toshiba Ceramics Co., Ltd. | Polishing apparatus and method thereof |
JP2001298006A (ja) | 2000-04-17 | 2001-10-26 | Ebara Corp | 研磨装置 |
US6602114B1 (en) | 2000-05-19 | 2003-08-05 | Applied Materials Inc. | Multilayer retaining ring for chemical mechanical polishing |
US7497767B2 (en) * | 2000-09-08 | 2009-03-03 | Applied Materials, Inc. | Vibration damping during chemical mechanical polishing |
US6848980B2 (en) | 2001-10-10 | 2005-02-01 | Applied Materials, Inc. | Vibration damping in a carrier head |
US7255637B2 (en) | 2000-09-08 | 2007-08-14 | Applied Materials, Inc. | Carrier head vibration damping |
US6676497B1 (en) | 2000-09-08 | 2004-01-13 | Applied Materials Inc. | Vibration damping in a chemical mechanical polishing system |
US6447368B1 (en) | 2000-11-20 | 2002-09-10 | Speedfam-Ipec Corporation | Carriers with concentric balloons supporting a diaphragm |
US6468131B1 (en) | 2000-11-28 | 2002-10-22 | Speedfam-Ipec Corporation | Method to mathematically characterize a multizone carrier |
US6582277B2 (en) | 2001-05-01 | 2003-06-24 | Speedfam-Ipec Corporation | Method for controlling a process in a multi-zonal apparatus |
US7217175B2 (en) * | 2001-05-29 | 2007-05-15 | Ebara Corporation | Polishing apparatus and polishing method |
US8512580B2 (en) * | 2001-09-21 | 2013-08-20 | Lg Display Co., Ltd. | Method of fabricating thin liquid crystal display device |
US6835125B1 (en) | 2001-12-27 | 2004-12-28 | Applied Materials Inc. | Retainer with a wear surface for chemical mechanical polishing |
US6890249B1 (en) | 2001-12-27 | 2005-05-10 | Applied Materials, Inc. | Carrier head with edge load retaining ring |
US6872130B1 (en) | 2001-12-28 | 2005-03-29 | Applied Materials Inc. | Carrier head with non-contact retainer |
US6461965B1 (en) * | 2002-01-31 | 2002-10-08 | Texas Instruments Incorporated | Method for effecting a finishing operation on a semiconductor workpiece |
US6739958B2 (en) | 2002-03-19 | 2004-05-25 | Applied Materials Inc. | Carrier head with a vibration reduction feature for a chemical mechanical polishing system |
US6790123B2 (en) | 2002-05-16 | 2004-09-14 | Speedfam-Ipec Corporation | Method for processing a work piece in a multi-zonal processing apparatus |
TWM255104U (en) | 2003-02-05 | 2005-01-11 | Applied Materials Inc | Retaining ring with flange for chemical mechanical polishing |
JP3739752B2 (ja) * | 2003-02-07 | 2006-01-25 | 株式会社 ハリーズ | ランダム周期変速可能な小片移載装置 |
US6974371B2 (en) | 2003-04-30 | 2005-12-13 | Applied Materials, Inc. | Two part retaining ring |
JP2005034959A (ja) * | 2003-07-16 | 2005-02-10 | Ebara Corp | 研磨装置及びリテーナリング |
US7654888B2 (en) * | 2006-11-22 | 2010-02-02 | Applied Materials, Inc. | Carrier head with retaining ring and carrier ring |
US7575504B2 (en) * | 2006-11-22 | 2009-08-18 | Applied Materials, Inc. | Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly |
US7727055B2 (en) * | 2006-11-22 | 2010-06-01 | Applied Materials, Inc. | Flexible membrane for carrier head |
US7699688B2 (en) * | 2006-11-22 | 2010-04-20 | Applied Materials, Inc. | Carrier ring for carrier head |
US10052739B2 (en) * | 2011-09-12 | 2018-08-21 | Applied Materials, Inc. | Carrier head with composite plastic portions |
US10857649B2 (en) * | 2011-09-22 | 2020-12-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for performing a polishing process in semiconductor fabrication |
CN105290957A (zh) * | 2015-10-12 | 2016-02-03 | 京东方光科技有限公司 | 一种夹具、研磨方法及研磨设备 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5911423B2 (ja) * | 1974-04-10 | 1984-03-15 | 株式会社日立製作所 | ラツピング装置 |
JPS5727659A (en) * | 1980-07-18 | 1982-02-15 | Supiide Fuamu Kk | Lapping machine |
WO1989007508A1 (en) | 1988-02-17 | 1989-08-24 | Gruzinsky Politekhnichesky Institut Imeni V.I.Leni | Method and cassette for abrasive machining of the surface of parts |
US4954142A (en) * | 1989-03-07 | 1990-09-04 | International Business Machines Corporation | Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor |
US5205082A (en) * | 1991-12-20 | 1993-04-27 | Cybeq Systems, Inc. | Wafer polisher head having floating retainer ring |
US5635083A (en) * | 1993-08-06 | 1997-06-03 | Intel Corporation | Method and apparatus for chemical-mechanical polishing using pneumatic pressure applied to the backside of a substrate |
JP3158934B2 (ja) * | 1995-02-28 | 2001-04-23 | 三菱マテリアル株式会社 | ウェーハ研磨装置 |
US6024630A (en) * | 1995-06-09 | 2000-02-15 | Applied Materials, Inc. | Fluid-pressure regulated wafer polishing head |
US5795215A (en) | 1995-06-09 | 1998-08-18 | Applied Materials, Inc. | Method and apparatus for using a retaining ring to control the edge effect |
US5681215A (en) * | 1995-10-27 | 1997-10-28 | Applied Materials, Inc. | Carrier head design for a chemical mechanical polishing apparatus |
JP3072962B2 (ja) * | 1995-11-30 | 2000-08-07 | ロデール・ニッタ株式会社 | 研磨のための被加工物の保持具及びその製法 |
US5707492A (en) * | 1995-12-18 | 1998-01-13 | Motorola, Inc. | Metallized pad polishing process |
JPH09225819A (ja) * | 1996-02-21 | 1997-09-02 | Shin Etsu Handotai Co Ltd | 被加工物の保持機構 |
-
1996
- 1996-10-08 KR KR1019960044549A patent/KR100485002B1/ko not_active IP Right Cessation
- 1996-10-09 EP EP96116166A patent/EP0790100B1/de not_active Expired - Lifetime
- 1996-10-09 EP EP01115108A patent/EP1151824A1/de not_active Withdrawn
- 1996-10-09 US US08/728,069 patent/US5916412A/en not_active Expired - Lifetime
- 1996-10-09 DE DE69618437T patent/DE69618437T2/de not_active Expired - Lifetime
-
1999
- 1999-04-09 US US09/288,768 patent/US6350346B1/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10222956A1 (de) * | 2002-05-24 | 2003-12-11 | Fip Forschungsinstitut Fuer Pr | Feinschleifmaschine |
DE10222956B4 (de) * | 2002-05-24 | 2009-01-29 | FIP Forschungsinstitut für Produktionstechnik GmbH Braunschweig | Feinschleifmaschine |
Also Published As
Publication number | Publication date |
---|---|
US5916412A (en) | 1999-06-29 |
KR980005771A (ko) | 1998-03-30 |
EP0790100A1 (de) | 1997-08-20 |
KR100485002B1 (ko) | 2005-08-29 |
EP0790100B1 (de) | 2002-01-09 |
DE69618437D1 (de) | 2002-02-14 |
EP1151824A1 (de) | 2001-11-07 |
US6350346B1 (en) | 2002-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |