DE60144538D1 - Chemisches mechanisches polierstück mit mikrolöchern - Google Patents
Chemisches mechanisches polierstück mit mikrolöchernInfo
- Publication number
- DE60144538D1 DE60144538D1 DE60144538T DE60144538T DE60144538D1 DE 60144538 D1 DE60144538 D1 DE 60144538D1 DE 60144538 T DE60144538 T DE 60144538T DE 60144538 T DE60144538 T DE 60144538T DE 60144538 D1 DE60144538 D1 DE 60144538D1
- Authority
- DE
- Germany
- Prior art keywords
- micro
- chemical mechanical
- holes
- mechanical polish
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 1
- 238000007517 polishing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Steroid Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2001-0046796A KR100497205B1 (ko) | 2001-08-02 | 2001-08-02 | 마이크로홀이 형성된 화학적 기계적 연마패드 |
PCT/KR2001/001463 WO2003012846A1 (en) | 2001-08-02 | 2001-08-29 | Chemical mechanical polishing pad with micro-holes |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60144538D1 true DE60144538D1 (de) | 2011-06-09 |
Family
ID=19712816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60144538T Expired - Lifetime DE60144538D1 (de) | 2001-08-02 | 2001-08-29 | Chemisches mechanisches polierstück mit mikrolöchern |
Country Status (9)
Country | Link |
---|---|
US (2) | US20040048559A1 (de) |
EP (1) | EP1430520B1 (de) |
JP (1) | JP2004537424A (de) |
KR (1) | KR100497205B1 (de) |
CN (1) | CN1312739C (de) |
AT (1) | ATE507580T1 (de) |
DE (1) | DE60144538D1 (de) |
TW (1) | TW592888B (de) |
WO (1) | WO2003012846A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6794605B2 (en) * | 2001-08-02 | 2004-09-21 | Skc Co., Ltd | Method for fabricating chemical mechanical polshing pad using laser |
US6998166B2 (en) * | 2003-06-17 | 2006-02-14 | Cabot Microelectronics Corporation | Polishing pad with oriented pore structure |
TWI385050B (zh) * | 2005-02-18 | 2013-02-11 | Nexplanar Corp | 用於cmp之特製拋光墊及其製造方法及其用途 |
US7875091B2 (en) * | 2005-02-22 | 2011-01-25 | Saint-Gobain Abrasives, Inc. | Rapid tooling system and methods for manufacturing abrasive articles |
US7524345B2 (en) * | 2005-02-22 | 2009-04-28 | Saint-Gobain Abrasives, Inc. | Rapid tooling system and methods for manufacturing abrasive articles |
US7867302B2 (en) * | 2005-02-22 | 2011-01-11 | Saint-Gobain Abrasives, Inc. | Rapid tooling system and methods for manufacturing abrasive articles |
US20070010175A1 (en) * | 2005-07-07 | 2007-01-11 | San Fang Chemical Industry Co., Ltd. | Polishing pad and method of producing same |
US20070111644A1 (en) * | 2005-09-27 | 2007-05-17 | Spencer Preston | Thick perforated polishing pad and method for making same |
US7569268B2 (en) * | 2007-01-29 | 2009-08-04 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad |
KR101186531B1 (ko) * | 2009-03-24 | 2012-10-08 | 차윤종 | 폴리우레탄 다공질체의 제조방법과 그 제조방법에 따른 폴리우레탄 다공질체 및 폴리우레탄 다공질체를 구비한 연마패드 |
KR101177497B1 (ko) * | 2009-07-01 | 2012-08-27 | 서강대학교산학협력단 | 기공이 형성된 cmp 연마패드 및 기공의 형성방법 |
KR101044281B1 (ko) * | 2009-07-30 | 2011-06-28 | 서강대학교산학협력단 | 기공이 형성된 cmp 연마패드와 그의 제조방법 |
KR101044279B1 (ko) * | 2009-07-30 | 2011-06-28 | 서강대학교산학협력단 | Cmp 연마패드와 그의 제조방법 |
JP5484145B2 (ja) * | 2010-03-24 | 2014-05-07 | 東洋ゴム工業株式会社 | 研磨パッド |
WO2012071259A1 (en) * | 2010-11-23 | 2012-05-31 | Taiwan Green Point Enterprises Co., Ltd. | Method and structure of binding plastic and metal material together |
CN114589619B (zh) * | 2020-12-03 | 2023-04-25 | 中国科学院微电子研究所 | 半导体研磨垫及制备方法 |
TWI767689B (zh) * | 2021-05-05 | 2022-06-11 | 健行學校財團法人健行科技大學 | 微細孔拋光裝置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2668016B2 (ja) * | 1988-09-21 | 1997-10-27 | スピードファム株式会社 | ポリッシングパッド及びその製造方法 |
US5020283A (en) * | 1990-01-22 | 1991-06-04 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
MY114512A (en) * | 1992-08-19 | 2002-11-30 | Rodel Inc | Polymeric substrate with polymeric microelements |
US5329734A (en) * | 1993-04-30 | 1994-07-19 | Motorola, Inc. | Polishing pads used to chemical-mechanical polish a semiconductor substrate |
JP3042593B2 (ja) * | 1995-10-25 | 2000-05-15 | 日本電気株式会社 | 研磨パッド |
JPH10329007A (ja) * | 1997-05-28 | 1998-12-15 | Sony Corp | 化学的機械研磨装置 |
JPH1199468A (ja) * | 1997-09-29 | 1999-04-13 | Toshiba Corp | 研磨パッド及びそれを用いた研磨装置 |
JP2907209B1 (ja) * | 1998-05-29 | 1999-06-21 | 日本電気株式会社 | ウェハ研磨装置用裏面パッド |
KR20000025003A (ko) * | 1998-10-07 | 2000-05-06 | 윤종용 | 반도체 기판의 화학 기계적 연마에 사용되는 연마 패드 |
JP2001071256A (ja) * | 1999-08-31 | 2001-03-21 | Shinozaki Seisakusho:Kk | 研磨パッドの溝形成方法及び装置並びに研磨パッド |
-
2001
- 2001-08-02 KR KR10-2001-0046796A patent/KR100497205B1/ko active IP Right Grant
- 2001-08-29 JP JP2003517928A patent/JP2004537424A/ja active Pending
- 2001-08-29 US US10/110,801 patent/US20040048559A1/en not_active Abandoned
- 2001-08-29 CN CNB018236804A patent/CN1312739C/zh not_active Expired - Lifetime
- 2001-08-29 AT AT01965709T patent/ATE507580T1/de not_active IP Right Cessation
- 2001-08-29 DE DE60144538T patent/DE60144538D1/de not_active Expired - Lifetime
- 2001-08-29 WO PCT/KR2001/001463 patent/WO2003012846A1/en active Application Filing
- 2001-08-29 EP EP01965709A patent/EP1430520B1/de not_active Expired - Lifetime
- 2001-10-15 TW TW090125417A patent/TW592888B/zh not_active IP Right Cessation
-
2007
- 2007-01-08 US US11/651,197 patent/US20070173187A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20040048559A1 (en) | 2004-03-11 |
KR100497205B1 (ko) | 2005-06-23 |
EP1430520B1 (de) | 2011-04-27 |
JP2004537424A (ja) | 2004-12-16 |
KR20030012655A (ko) | 2003-02-12 |
CN1312739C (zh) | 2007-04-25 |
ATE507580T1 (de) | 2011-05-15 |
WO2003012846A1 (en) | 2003-02-13 |
CN1559082A (zh) | 2004-12-29 |
EP1430520A1 (de) | 2004-06-23 |
US20070173187A1 (en) | 2007-07-26 |
EP1430520A4 (de) | 2008-04-09 |
TW592888B (en) | 2004-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60144538D1 (de) | Chemisches mechanisches polierstück mit mikrolöchern | |
ATE506695T1 (de) | Chemisch-mechanisches polierstück mit wellenförmigen rillen | |
USD518648S1 (en) | Surface pattern for embossed films | |
DE60232469D1 (de) | Leitender Polierkörper zum elektrochemisch-mechanischen Polieren | |
MY131030A (en) | Polishing pad with oriented pore structure | |
TW200510124A (en) | Polishing pad for electrochemical-mechanical polishing | |
DE60304505D1 (de) | Polierartikel zum elektrochemisch-mechanischen Polieren von Substraten | |
ATE510040T1 (de) | Oberflächenbehandelte stahlplatte und herstellungsverfahren dafür | |
JP2004523323A5 (de) | ||
DE60219070D1 (de) | Plasma- fluorinierungsbehandlung von pörösem material | |
ATE289895T1 (de) | Polierkissen mit rillenmuster und deren anwendungsverfahren | |
TW200736654A (en) | Optical laminated body | |
CA99969S (en) | Brush | |
CA102163S (en) | Corner sanding sponge | |
MY136807A (en) | Method of using a soft subpad for chemical mechanical polishing | |
HK1048971A1 (en) | Tableware, process for surface treatment thereof, substrate having hard decorative coating film, process for producing the substrate, and cutlery | |
TW200508791A (en) | Master mold for duplicating fine structure and production method thereof | |
WO2002089905A3 (de) | Kissen, insbesondere für den einsatz im rahmen von therapeutischen massnahmen | |
CA108331S (en) | Nonwoven material | |
EP1452508A4 (de) | Verfahren zur herstellung einer siliciumcarbid-sinterspannvorrichtung zur verwendung bei der halbleiterfertigung und danach erhaltene siliciumcarbid-sinterspannvorrichtung | |
DE59906460D1 (de) | Polykristalline diamantschicht mit (100)-textur | |
DE60134997D1 (de) | Hydrophile oberfläche mit temporären schutzverkleidungen | |
IT1316918B1 (it) | Procedimento di finitura superficiale di manufatti in gresporcellanato ed attrezzatura relativa. | |
MY137331A (en) | Chemical mechanical polishing pad with micro-holes | |
CA98343S (en) | Needle holder |