DE60142825D1 - Nichtflüchtige halbleiterspeicheranordnung - Google Patents

Nichtflüchtige halbleiterspeicheranordnung

Info

Publication number
DE60142825D1
DE60142825D1 DE60142825T DE60142825T DE60142825D1 DE 60142825 D1 DE60142825 D1 DE 60142825D1 DE 60142825 T DE60142825 T DE 60142825T DE 60142825 T DE60142825 T DE 60142825T DE 60142825 D1 DE60142825 D1 DE 60142825D1
Authority
DE
Germany
Prior art keywords
floating gate
separated
insulating layer
channel region
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142825T
Other languages
English (en)
Inventor
Franciscus P Widdershoven
Jurriaan Schmitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
NXP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NXP BV filed Critical NXP BV
Application granted granted Critical
Publication of DE60142825D1 publication Critical patent/DE60142825D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B43/00—EEPROM devices comprising charge-trapping gate insulators
    • H10B43/30—EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region
DE60142825T 2000-07-12 2001-06-29 Nichtflüchtige halbleiterspeicheranordnung Expired - Lifetime DE60142825D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00202493 2000-07-12
PCT/EP2001/007452 WO2002005353A1 (en) 2000-07-12 2001-06-29 Semiconductor non-volatile memory device

Publications (1)

Publication Number Publication Date
DE60142825D1 true DE60142825D1 (de) 2010-09-30

Family

ID=8171795

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60142825T Expired - Lifetime DE60142825D1 (de) 2000-07-12 2001-06-29 Nichtflüchtige halbleiterspeicheranordnung

Country Status (8)

Country Link
US (1) US6472706B2 (de)
EP (1) EP1228534B1 (de)
JP (1) JP2004503113A (de)
KR (1) KR100851206B1 (de)
AT (1) ATE478437T1 (de)
DE (1) DE60142825D1 (de)
TW (1) TW503528B (de)
WO (1) WO2002005353A1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4923321B2 (ja) * 2000-09-12 2012-04-25 ソニー株式会社 不揮発性半導体記憶装置の動作方法
ATE389937T1 (de) * 2000-12-15 2008-04-15 Halo Lsi Design & Device Tech Schnelles programmier- und programmierverifikationsverfahren
TW476144B (en) * 2001-02-02 2002-02-11 Macronix Int Co Ltd Non-volatile memory
US6925007B2 (en) * 2001-10-31 2005-08-02 Sandisk Corporation Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
US6897522B2 (en) * 2001-10-31 2005-05-24 Sandisk Corporation Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
EP1376676A3 (de) * 2002-06-24 2008-08-20 Interuniversitair Microelektronica Centrum Vzw Multibit-Festwertspeicherbauelement und Verfahren
US6917544B2 (en) 2002-07-10 2005-07-12 Saifun Semiconductors Ltd. Multiple use memory chip
US6773988B1 (en) * 2002-09-13 2004-08-10 Advanced Micro Devices, Inc. Memory wordline spacer
US7136304B2 (en) 2002-10-29 2006-11-14 Saifun Semiconductor Ltd Method, system and circuit for programming a non-volatile memory array
US6770933B2 (en) * 2002-12-11 2004-08-03 Texas Instruments Incorporated Single poly eeprom with improved coupling ratio
US7178004B2 (en) 2003-01-31 2007-02-13 Yan Polansky Memory array programming circuit and a method for using the circuit
KR100528466B1 (ko) * 2003-02-12 2005-11-15 삼성전자주식회사 비휘발성 소노스 메모리 소자 및 그 제조방법
JP4629982B2 (ja) * 2004-02-13 2011-02-09 ルネサスエレクトロニクス株式会社 不揮発性記憶素子およびその製造方法
JP4546117B2 (ja) * 2004-03-10 2010-09-15 ルネサスエレクトロニクス株式会社 不揮発性半導体記憶装置
US7119396B2 (en) * 2004-10-08 2006-10-10 Silicon Storage Technology, Inc. NROM device
US7638850B2 (en) * 2004-10-14 2009-12-29 Saifun Semiconductors Ltd. Non-volatile memory structure and method of fabrication
US8053812B2 (en) 2005-03-17 2011-11-08 Spansion Israel Ltd Contact in planar NROM technology
EP1746645A3 (de) 2005-07-18 2009-01-21 Saifun Semiconductors Ltd. Speicherzellenanordnung mit sub-minimalem Wortleitungsabstand und Verfahren zu deren Herstellung
US7668017B2 (en) 2005-08-17 2010-02-23 Saifun Semiconductors Ltd. Method of erasing non-volatile memory cells
CN100452356C (zh) * 2005-08-19 2009-01-14 力晶半导体股份有限公司 非挥发性存储器及其制造方法与操作方法
US7808818B2 (en) 2006-01-12 2010-10-05 Saifun Semiconductors Ltd. Secondary injection for NROM
US7902589B2 (en) * 2006-02-17 2011-03-08 Macronix International Co., Ltd. Dual gate multi-bit semiconductor memory array
US8253452B2 (en) 2006-02-21 2012-08-28 Spansion Israel Ltd Circuit and method for powering up an integrated circuit and an integrated circuit utilizing same
US7692961B2 (en) 2006-02-21 2010-04-06 Saifun Semiconductors Ltd. Method, circuit and device for disturb-control of programming nonvolatile memory cells by hot-hole injection (HHI) and by channel hot-electron (CHE) injection
US7760554B2 (en) 2006-02-21 2010-07-20 Saifun Semiconductors Ltd. NROM non-volatile memory and mode of operation
US7701779B2 (en) 2006-04-27 2010-04-20 Sajfun Semiconductors Ltd. Method for programming a reference cell
JP4659677B2 (ja) * 2006-05-23 2011-03-30 Ｏｋｉセミコンダクタ株式会社 半導体装置及びその製造方法
KR101531885B1 (ko) * 2009-05-12 2015-06-29 주식회사 동부하이텍 반도체 소자의 제조 방법
TWI473253B (zh) * 2010-04-07 2015-02-11 Macronix Int Co Ltd 具有連續電荷儲存介電堆疊的非揮發記憶陣列
US9406896B2 (en) * 2014-01-10 2016-08-02 Palo Alto Research Center Incorporated Pre-fabricated substrate for printed electronic devices
KR101552921B1 (ko) * 2014-09-29 2015-09-15 매그나칩 반도체 유한회사 비휘발성 메모리 소자 및 그 제조 방법
US10937879B2 (en) 2017-11-30 2021-03-02 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device and manufacturing method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940006094B1 (ko) 1989-08-17 1994-07-06 삼성전자 주식회사 불휘발성 반도체 기억장치 및 그 제조방법
US5583810A (en) * 1991-01-31 1996-12-10 Interuniversitair Micro-Elektronica Centrum Vzw Method for programming a semiconductor memory device
US5293328A (en) 1992-01-15 1994-03-08 National Semiconductor Corporation Electrically reprogrammable EPROM cell with merged transistor and optiumum area
US5910912A (en) 1992-10-30 1999-06-08 International Business Machines Corporation Flash EEPROM with dual-sidewall gate
US5408115A (en) * 1994-04-04 1995-04-18 Motorola Inc. Self-aligned, split-gate EEPROM device
KR0150048B1 (ko) 1994-12-23 1998-10-01 김주용 플래쉬 이이피롬 셀 및 그 제조방법
DE19612676C2 (de) * 1996-03-29 2002-06-06 Infineon Technologies Ag Anordnung von Halbleiter-Speicherzellen mit zwei Floating-Gates in einem Zellenfeld und Verfahren zum Betrieb einer nichtflüchtigen Halbleiter-Speicherzelle
US6768165B1 (en) * 1997-08-01 2004-07-27 Saifun Semiconductors Ltd. Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping
DE69832019T2 (de) 1997-09-09 2006-07-20 Interuniversitair Micro-Electronica Centrum Vzw Verfahren zur Löschung und Programmierung eines Speichers in Kleinspannungs-Anwendungen und Anwendungen mit geringer Leistung
US6133098A (en) * 1999-05-17 2000-10-17 Halo Lsi Design & Device Technology, Inc. Process for making and programming and operating a dual-bit multi-level ballistic flash memory

Also Published As

Publication number Publication date
EP1228534A1 (de) 2002-08-07
US6472706B2 (en) 2002-10-29
ATE478437T1 (de) 2010-09-15
EP1228534B1 (de) 2010-08-18
WO2002005353A1 (en) 2002-01-17
KR20020033792A (ko) 2002-05-07
JP2004503113A (ja) 2004-01-29
US20020005545A1 (en) 2002-01-17
TW503528B (en) 2002-09-21
KR100851206B1 (ko) 2008-08-07

Similar Documents

Publication Publication Date Title
DE60142825D1 (de) Nichtflüchtige halbleiterspeicheranordnung
US9082656B2 (en) NAND flash with non-trapping switch transistors
TWI318786B (en) Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
TW200629574A (en) Non-volatile memory cells, memory arrays including the same and methods of operating cells and arrays
TW200701236A (en) Non-volatile memory cells, memory arrays including the same and methods of operating cells and arrays
WO2003041176A3 (en) A scalable flash eeprom memory cell with floating gate spacer wrapped by control gate, and method of manufacturing the same
TW200503255A (en) Non-volatile memory device
TW343391B (en) Nonvolatile semiconductor memory and methods for manufacturing and using the same
TW338193B (en) Non-volatile semiconductor memory
KR970067903A (ko) 불휘발성 메모리소자, 그 제조방법 및 구동방법
TW200721463A (en) Memory device with improved performance and method of manufacturing such a memory device
WO2002015278A3 (en) Multigate semiconductor device and method of fabrication
EP1777751A3 (de) Nichtflüchtige integrierte Mehrzustands-Speichersysteme, die dielektrische Speicherelemente verwenden
TW200419788A (en) Flash memory having local SONOS structure using notched gate and manufacturing method thereof
TW200707763A (en) Non-volatile memory semiconductor device having an oxide-nitride-oxide (ONO) top dielectric layer
MY135374A (en) Semiconductor storage
TW200721511A (en) Double gate non-volatile memory device and method of manufacturing such a memory device
TW200741980A (en) Semiconductor device having non-volatile memory and method of fabricating the same
TW200721510A (en) Finfet-based non-volatile memory device and method of manufacturing such a memory device
GB2437447A (en) Memory device having trapezoidal bitlines and method of fabricating same
DE60333452D1 (de) Speicherzellen mit schwebenden gates mit erhötem kopplungsverhältnis
ATE168215T1 (de) Elektrisch aenderbare einzel-transistor- halbleiterfestwertspeicheranordnung
TW200642044A (en) High K stack for non-volatile memory
WO2004077498A3 (en) Method of manufacturing a non-volatile memory cell with a lateral select gate
EP1310994A4 (de) Nichtflüchtiger speicherbaustein und verfahren zu seiner herstellung