DE60134179D1 - Smif-behälter mit elektrostatische ladungen ableitender stützkonstruktion für retikül - Google Patents

Smif-behälter mit elektrostatische ladungen ableitender stützkonstruktion für retikül

Info

Publication number
DE60134179D1
DE60134179D1 DE60134179T DE60134179T DE60134179D1 DE 60134179 D1 DE60134179 D1 DE 60134179D1 DE 60134179 T DE60134179 T DE 60134179T DE 60134179 T DE60134179 T DE 60134179T DE 60134179 D1 DE60134179 D1 DE 60134179D1
Authority
DE
Germany
Prior art keywords
reticial
waste
support structure
electrostatic charges
leading support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60134179T
Other languages
English (en)
Inventor
Mark V Smith
Robert P Wartenbergh
William P Pennybacker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Entegris Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc filed Critical Entegris Inc
Application granted granted Critical
Publication of DE60134179D1 publication Critical patent/DE60134179D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67373—Closed carriers characterised by locking systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67396—Closed carriers characterised by the presence of antistatic elements
DE60134179T 2000-07-10 2001-07-10 Smif-behälter mit elektrostatische ladungen ableitender stützkonstruktion für retikül Expired - Lifetime DE60134179D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21717700P 2000-07-10 2000-07-10
PCT/US2001/021684 WO2002004311A1 (en) 2000-07-10 2001-07-10 Smif container including an electrostatic dissipative reticle support structure

Publications (1)

Publication Number Publication Date
DE60134179D1 true DE60134179D1 (de) 2008-07-03

Family

ID=22809966

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60134179T Expired - Lifetime DE60134179D1 (de) 2000-07-10 2001-07-10 Smif-behälter mit elektrostatische ladungen ableitender stützkonstruktion für retikül

Country Status (5)

Country Link
US (1) US6513654B2 (de)
EP (1) EP1412262B1 (de)
AU (1) AU2002218763A1 (de)
DE (1) DE60134179D1 (de)
WO (1) WO2002004311A1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
US6781205B1 (en) * 2002-10-11 2004-08-24 Ion Systems, Inc. Electrostatic charge measurement on semiconductor wafers
JP2005123292A (ja) * 2003-10-15 2005-05-12 Canon Inc 収納装置、当該収納装置を用いた露光方法
EP1531363A1 (de) * 2003-10-27 2005-05-18 ASML Netherlands B.V. Retikelhalter
KR100609115B1 (ko) * 2003-10-27 2006-08-09 에이에스엠엘 네델란즈 비.브이. 레티클 홀더 및 레티클의 조립체
US7236233B2 (en) * 2003-10-27 2007-06-26 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
US7316325B2 (en) * 2003-11-07 2008-01-08 Entegris, Inc. Substrate container
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
CN100428408C (zh) * 2003-12-30 2008-10-22 中芯国际集成电路制造(上海)有限公司 光掩模的静电放电保护的方法和结构
CN100344210C (zh) * 2004-05-11 2007-10-17 家登精密工业股份有限公司 光罩传送盒的防静电装置
TW200606084A (en) * 2004-08-10 2006-02-16 Power Geode Technology Co Ltd Storage box for FOSB (front opening shipping box)
US7380668B2 (en) * 2004-10-07 2008-06-03 Fab Integrated Technology, Inc. Reticle carrier
US7528936B2 (en) * 2005-02-27 2009-05-05 Entegris, Inc. Substrate container with pressure equalization
US7607543B2 (en) * 2005-02-27 2009-10-27 Entegris, Inc. Reticle pod with isolation system
JP5123851B2 (ja) * 2005-07-08 2013-01-23 クロッシング オートメーション インコーポレイテッド 加工物を格納するための加工物容器
US20070076292A1 (en) * 2005-09-27 2007-04-05 Taiwan Semiconductor Manufacturing Company, Ltd. Fully electric field shielding reticle pod
US7537114B2 (en) * 2006-01-25 2009-05-26 International Business Machines Corporation System and method for storing and transporting photomasks in fluid
US20080060974A1 (en) * 2006-02-21 2008-03-13 Taiwan Semiconductor Manufacturing Company, Ltd. Mask carrier treatment to prevent haze and ESD damage
WO2007147120A2 (en) * 2006-06-16 2007-12-21 Entegris, Inc. Reticle pod with visually differentiable orientation indicator
US7581372B2 (en) * 2006-08-17 2009-09-01 Microtome Precision, Inc. High cleanliness article transport system
TWI317339B (en) * 2006-12-22 2009-11-21 Ind Tech Res Inst A latch mechanism of clean container
CN101219720B (zh) * 2007-01-10 2010-11-03 财团法人工业技术研究院 具弹性定位结构的洁净容器
TWM328438U (en) * 2007-06-08 2008-03-11 Gudeng Prec Industral Co Ltd Reticle pod and reticle transport pod
TWM331743U (en) * 2007-08-10 2008-05-01 Gudeng Prec Industral Co Ltd Photomask pod, photomask transport pod and the supporter thereof
TWM329035U (en) * 2007-08-10 2008-03-21 Gudeng Prec Industral Co Ltd Container and the liner thereof
TWM331511U (en) * 2007-08-10 2008-05-01 Gudeng Prec Industral Co Ltd Container
WO2013186929A1 (ja) * 2012-06-15 2013-12-19 株式会社ニコン マスク保護装置、露光装置、及びデバイス製造方法
TWI623810B (zh) * 2017-01-26 2018-05-11 家登精密工業股份有限公司 光罩盒
JP7261000B2 (ja) * 2018-12-03 2023-04-19 キヤノン株式会社 容器、処理装置、異物除去方法、および物品の製造方法
TWI680086B (zh) * 2019-02-25 2019-12-21 家登精密工業股份有限公司 光罩盒及其固持件
US11442370B2 (en) * 2019-10-16 2022-09-13 Gudeng Precision Industrial Co., Ltd Reticle retaining system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615006A (en) * 1969-06-26 1971-10-26 Ibm Storage container
US4776462A (en) * 1985-09-27 1988-10-11 Canon Kabushiki Kaisha Container for a sheet-like article
US4739882A (en) * 1986-02-13 1988-04-26 Asyst Technologies Container having disposable liners
US4995430A (en) * 1989-05-19 1991-02-26 Asyst Technologies, Inc. Sealable transportable container having improved latch mechanism
US5469963A (en) 1992-04-08 1995-11-28 Asyst Technologies, Inc. Sealable transportable container having improved liner
JPH0752661B2 (ja) * 1992-12-01 1995-06-05 山一電機株式会社 Ｉｃキャリア
JP3143337B2 (ja) * 1994-10-12 2001-03-07 信越ポリマー株式会社 ペリクル収納容器
JPH08236605A (ja) * 1995-02-28 1996-09-13 Komatsu Electron Metals Co Ltd 半導体ウェハ収納ケース
US6216873B1 (en) * 1999-03-19 2001-04-17 Asyst Technologies, Inc. SMIF container including a reticle support structure

Also Published As

Publication number Publication date
EP1412262A4 (de) 2007-01-03
US20020066692A1 (en) 2002-06-06
WO2002004311A1 (en) 2002-01-17
EP1412262B1 (de) 2008-05-21
EP1412262A1 (de) 2004-04-28
AU2002218763A1 (en) 2002-01-21
US6513654B2 (en) 2003-02-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ENTEGRIS, INC., BILLERICA, MASS., US