AU2002218763A1 - Smif container including an electrostatic dissipative reticle support structure - Google Patents

Smif container including an electrostatic dissipative reticle support structure

Info

Publication number
AU2002218763A1
AU2002218763A1 AU2002218763A AU1876302A AU2002218763A1 AU 2002218763 A1 AU2002218763 A1 AU 2002218763A1 AU 2002218763 A AU2002218763 A AU 2002218763A AU 1876302 A AU1876302 A AU 1876302A AU 2002218763 A1 AU2002218763 A1 AU 2002218763A1
Authority
AU
Australia
Prior art keywords
support structure
container including
electrostatic dissipative
reticle support
smif container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218763A
Inventor
William P. Pennybacker
Mark V. Smith
Robert P. Wartenbergh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asyst Technologies Inc
Original Assignee
ASYST TECHNOLOGIES
Asyst Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASYST TECHNOLOGIES, Asyst Technologies Inc filed Critical ASYST TECHNOLOGIES
Publication of AU2002218763A1 publication Critical patent/AU2002218763A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67373—Closed carriers characterised by locking systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67396—Closed carriers characterised by the presence of antistatic elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AU2002218763A 2000-07-10 2001-07-10 Smif container including an electrostatic dissipative reticle support structure Abandoned AU2002218763A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21717700P 2000-07-10 2000-07-10
US60/217177 2000-07-10
PCT/US2001/021684 WO2002004311A1 (en) 2000-07-10 2001-07-10 Smif container including an electrostatic dissipative reticle support structure

Publications (1)

Publication Number Publication Date
AU2002218763A1 true AU2002218763A1 (en) 2002-01-21

Family

ID=22809966

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218763A Abandoned AU2002218763A1 (en) 2000-07-10 2001-07-10 Smif container including an electrostatic dissipative reticle support structure

Country Status (5)

Country Link
US (1) US6513654B2 (en)
EP (1) EP1412262B1 (en)
AU (1) AU2002218763A1 (en)
DE (1) DE60134179D1 (en)
WO (1) WO2002004311A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60219844T2 (en) * 2001-03-01 2008-01-17 Asml Netherlands B.V. Process for taking over a lithographic mask
US7304720B2 (en) * 2002-02-22 2007-12-04 Asml Holding N.V. System for using a two part cover for protecting a reticle
US6781205B1 (en) * 2002-10-11 2004-08-24 Ion Systems, Inc. Electrostatic charge measurement on semiconductor wafers
JP2005123292A (en) * 2003-10-15 2005-05-12 Canon Inc Storage device and exposure method using it
US7236233B2 (en) * 2003-10-27 2007-06-26 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
EP1531363A1 (en) * 2003-10-27 2005-05-18 ASML Netherlands B.V. Reticle holder
KR100609115B1 (en) * 2003-10-27 2006-08-09 에이에스엠엘 네델란즈 비.브이. Assembly of a reticle holder and a reticle
US7316325B2 (en) * 2003-11-07 2008-01-08 Entegris, Inc. Substrate container
US6862817B1 (en) 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
CN100428408C (en) * 2003-12-30 2008-10-22 中芯国际集成电路制造(上海)有限公司 Electrostatic discharge protection method and structure for photomask
CN100344210C (en) * 2004-05-11 2007-10-17 家登精密工业股份有限公司 Antistatic device of box of carrying optical mask
TW200606084A (en) * 2004-08-10 2006-02-16 Power Geode Technology Co Ltd Storage box for FOSB (front opening shipping box)
US7380668B2 (en) * 2004-10-07 2008-06-03 Fab Integrated Technology, Inc. Reticle carrier
US7528936B2 (en) * 2005-02-27 2009-05-05 Entegris, Inc. Substrate container with pressure equalization
US7607543B2 (en) 2005-02-27 2009-10-27 Entegris, Inc. Reticle pod with isolation system
CN102130033B (en) * 2005-07-08 2014-05-14 交叉自动控制公司 Workpiece support structures and apparatus for accessing same
US20070076292A1 (en) * 2005-09-27 2007-04-05 Taiwan Semiconductor Manufacturing Company, Ltd. Fully electric field shielding reticle pod
US7537114B2 (en) * 2006-01-25 2009-05-26 International Business Machines Corporation System and method for storing and transporting photomasks in fluid
US20080060974A1 (en) * 2006-02-21 2008-03-13 Taiwan Semiconductor Manufacturing Company, Ltd. Mask carrier treatment to prevent haze and ESD damage
WO2007147120A2 (en) * 2006-06-16 2007-12-21 Entegris, Inc. Reticle pod with visually differentiable orientation indicator
US7581372B2 (en) * 2006-08-17 2009-09-01 Microtome Precision, Inc. High cleanliness article transport system
TWI317339B (en) * 2006-12-22 2009-11-21 Ind Tech Res Inst A latch mechanism of clean container
CN101219720B (en) * 2007-01-10 2010-11-03 财团法人工业技术研究院 Clean container with elastic positioning structure
TWM328438U (en) * 2007-06-08 2008-03-11 Gudeng Prec Industral Co Ltd Reticle pod and reticle transport pod
TWM331511U (en) * 2007-08-10 2008-05-01 Gudeng Prec Industral Co Ltd Container
TWM331743U (en) * 2007-08-10 2008-05-01 Gudeng Prec Industral Co Ltd Photomask pod, photomask transport pod and the supporter thereof
TWM329035U (en) * 2007-08-10 2008-03-21 Gudeng Prec Industral Co Ltd Container and the liner thereof
US9715175B2 (en) * 2012-06-15 2017-07-25 Nikon Corporation Mask protection device, exposure apparatus, and method for manufacturing device
TWI623810B (en) * 2017-01-26 2018-05-11 家登精密工業股份有限公司 Reticle pod
JP7261000B2 (en) * 2018-12-03 2023-04-19 キヤノン株式会社 CONTAINER, PROCESSING APPARATUS, CONTENT REMOVAL METHOD, AND PRODUCT MANUFACTURING METHOD
TWI680086B (en) * 2019-02-25 2019-12-21 家登精密工業股份有限公司 Reticle pod and retainer thereof
TWI728722B (en) * 2019-10-16 2021-05-21 家登精密工業股份有限公司 Reticle retaining system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615006A (en) * 1969-06-26 1971-10-26 Ibm Storage container
US4776462A (en) * 1985-09-27 1988-10-11 Canon Kabushiki Kaisha Container for a sheet-like article
US4739882A (en) * 1986-02-13 1988-04-26 Asyst Technologies Container having disposable liners
US4995430A (en) * 1989-05-19 1991-02-26 Asyst Technologies, Inc. Sealable transportable container having improved latch mechanism
US5469963A (en) 1992-04-08 1995-11-28 Asyst Technologies, Inc. Sealable transportable container having improved liner
JPH0752661B2 (en) * 1992-12-01 1995-06-05 山一電機株式会社 IC carrier
JP3143337B2 (en) * 1994-10-12 2001-03-07 信越ポリマー株式会社 Pellicle storage container
JPH08236605A (en) * 1995-02-28 1996-09-13 Komatsu Electron Metals Co Ltd Semiconductor wafer case
US6216873B1 (en) * 1999-03-19 2001-04-17 Asyst Technologies, Inc. SMIF container including a reticle support structure

Also Published As

Publication number Publication date
US20020066692A1 (en) 2002-06-06
WO2002004311A1 (en) 2002-01-17
DE60134179D1 (en) 2008-07-03
EP1412262A1 (en) 2004-04-28
US6513654B2 (en) 2003-02-04
EP1412262B1 (en) 2008-05-21
EP1412262A4 (en) 2007-01-03

Similar Documents

Publication Publication Date Title
AU2002218763A1 (en) Smif container including an electrostatic dissipative reticle support structure
AU3886500A (en) Smif container including a reticle support structure
AU2002213123A1 (en) Reticle storage system
AU2002222123A1 (en) Electrostatic device
EP1211725A4 (en) Electrostatic chuck
DE60038175D1 (en) plasma etching
AU2001234972A1 (en) Semiconductor structure
AU2002354596A1 (en) Trasformerless static voltage inverter for battery systems
AU2002245172A1 (en) An electrostatic dust-filtering device
GB2358714B (en) Reticle
DE59900683D1 (en) plasma etching
AU2001262855A1 (en) Support structure
AU2001262033A1 (en) Supporting structure for a respiratory air container or other objects
AU3476900A (en) Extreme-uv lithography condenser
AU1959700A (en) Air handler framework
AU6070500A (en) Wafer container
AU2002215866A1 (en) Static concentrator
GB2372631B (en) Semiconductor-on-insulator structure
GB0118796D0 (en) Copolyester film
AU2002316345A1 (en) Structurally integrated accessible floor system
AU6538500A (en) Electro-static dissipative zirconia
GB9928062D0 (en) Film fabrication
EP1287982A4 (en) Moistureproof multilayered film
AU6316700A (en) Optical lithography
AU4822401A (en) Antistatic network floor