TWM331743U - Photomask pod, photomask transport pod and the supporter thereof - Google Patents

Photomask pod, photomask transport pod and the supporter thereof Download PDF

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Publication number
TWM331743U
TWM331743U TW096213177U TW96213177U TWM331743U TW M331743 U TWM331743 U TW M331743U TW 096213177 U TW096213177 U TW 096213177U TW 96213177 U TW96213177 U TW 96213177U TW M331743 U TWM331743 U TW M331743U
Authority
TW
Taiwan
Prior art keywords
cover
reticle
photomask
box
transfer case
Prior art date
Application number
TW096213177U
Other languages
Chinese (zh)
Inventor
Chien-Feng Wang
Original Assignee
Gudeng Prec Industral Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gudeng Prec Industral Co Ltd filed Critical Gudeng Prec Industral Co Ltd
Priority to TW096213177U priority Critical patent/TWM331743U/en
Priority to US12/110,276 priority patent/US20090038985A1/en
Publication of TWM331743U publication Critical patent/TWM331743U/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67396—Closed carriers characterised by the presence of antistatic elements

Description

M331743 八、新型說明： 【新型所屬之技術領域】 本創作係有關一種光罩盒以及光罩傳送盒，特別是指其中可防止靜電 放電破壞之光罩盒以及傳送盒。 【先前技術】 近代半導體科技發展迅速，其中光學微影技術(0ptical Lith〇graphy)扮演 重要的角色，只要是關於圖形(pattem)定義，皆需仰賴光學微影技術。 光學微影技術在半導體的應用上，是將設計好的線路製作成具有特定 形狀可透光之光罩(photo mask)。利用曝光原理，則光源通過光罩投影至石夕 晶圓(silicon wafer)可曝光顯示特定圖案。由於任何附著於光罩上的塵埃顆粒 (如微粒、粉塵或有機物)都會造成投影成像的品質劣化，用於產生圖形的光 罩必須保持絕對潔淨，因此在-般的晶圓製程中，都提供無塵室(deanr 的環境以避免空氣中的顆粒污染。然而，目前的無塵室也益法達到絕對無 塵狀態。現代的半導體餘皆抗污_鮮伽tidepGd)進行光罩祕 存與運輸，以使光罩保持潔淨。 習知的光罩盒多以高分子材質所構成，此種高分子材質具有成型容 易、價格低廉以及可形成透明體的優點。此種絕緣電阻高的高分子材質容 易因為磨誠_喊生靜電，尤其是無塵㈣作#環境需魏持較低濕 度’使n分子材質的光罩盒非常容減生與累積電荷。此外，在使用光罩 或是將光罩移進献移出光罩盒時，光罩表面也會_擦而產生靜電。光 罩表面的靜電容易吸引空氣中的污染微粒，更甚者還會造成光罩上的金屬 線出現靜電放_ectrostatic discharge，ES_ 電流會引起電花(spark)或電弧(arc)，在電花與電弧發生的同時，強大的電流 伴隨著高溫，導致金屬線的氧化與溶解，因而改變了光罩的圖案。 目前針對靜電放電所解決财法有許多，首先是改善作業環境，使空 5 M3 31743 .Μ轉適當聽度、作業人員穿著具接地效應的衣物或使_子扇消除 • ㈣巾的靜電。但疋改變作業環境的具有許多無法綱的變因，沒有辦、去 - 完全解決靜電對光罩的傷害。 彳 • #種方法疋改變光罩盒組成元件的材質，美國專利號US6,513,654提 出，設置具接地功能的光罩支撐件，在光罩盒與配合機台接觸時，光罩支 撐件可將光罩上的電荷導出。另外美國專利號US6,247,5"提出，在光草盒 •的底盤、罩蓋或提把上概導電板，藉此減少電荷的累積。然以上方法均 • 須仰賴導電耕接地時釋出電荷，歧當靜電藉由導電元件釋出時，仍會 • 產生電流，還是會造成放電使得光罩受到損傷。 有蓉於以上缺失，本創作所提供之鮮支撐件或_件，乃針對先前 技術加以改良者。 【新型内容】 基於解決上述先前技術之缺失，本創作所提供之光罩盒，係將與光罩 直接接觸之支撐件或限制件作材質上的改變，利用靜電消散材質做為該支 撐件或限制件之材料，即便靜電消散材質會因為磨擦而產生電荷，但位於 Φ 附近的金屬材料會隨即將電荷導出，避免電荷累積以及靜電放電效應。 本創作之主要目的在於提供一種具有靜電消散材質的光罩支撐件，可 減少電荷累積，並且防止靜電對光罩所造成的傷害。 V 本創作之另一目的在於提供一種具有靜電消散材質的光罩支撐件，此 種材料可持續導出電荷，避免瞬間放電對光罩產生高溫傷害。 本創作之又一目的在於提供一種具有靜電消散材質的光罩限制件，可 減少電荷累積，並且防止靜電對光罩所造成的傷害。 本創作之再一目的在於提供一種具有靜電消散材質的光罩限制件，此 種材料可持續導出電荷，避免瞬間放電對光罩產生高溫傷害。 本創作提供一種光罩盒以及光罩傳送盒，其特徵在於針對與光罩直接 6M331743 VIII. New description: [New technical field] This creation relates to a mask case and a reticle transfer case, in particular to a mask case and a transfer case in which electrostatic discharge damage can be prevented. [Prior Art] Modern semiconductor technology has developed rapidly, and optical lithography (0ptical Lith〇graphy) plays an important role. As long as it is about the definition of graphic, it depends on optical lithography. In the application of semiconductors, optical lithography is to make a designed circuit into a photomask with a specific shape that can transmit light. Using the principle of exposure, the light source is projected through a reticle to a silicon wafer to expose a particular pattern. Since any dust particles (such as particles, dust, or organic matter) attached to the reticle will cause deterioration in the quality of the projection image, the reticle used to produce the pattern must be absolutely clean, so it is provided in the general wafer process. Clean room (deanr's environment to avoid particle pollution in the air. However, the current clean room is also easy to achieve absolute dust-free state. Modern semiconductors are anti-fouling _ fresh tidepGd) for mask storage and transportation To keep the mask clean. Conventional photomasks are mostly made of a polymer material, and the polymer material has the advantages of easy molding, low cost, and transparency. Such a high-density polymer material is easy to use because of the enthusiasm of the grinding, especially the dust-free (four), the environment needs to maintain a lower humidity, so that the mask of the n-molecular material is very reduced and accumulated. In addition, when the reticle is used or the reticle is moved into the reticle, the surface of the reticle is also rubbed to generate static electricity. The static electricity on the surface of the reticle is easy to attract the polluting particles in the air, and even more so, the static electricity discharge of the metal wire on the reticle occurs. The ES_ current causes spark or arc (arc). At the same time as the arc occurs, a strong current is accompanied by a high temperature, which causes oxidation and dissolution of the metal wires, thus changing the pattern of the reticle. At present, there are many financial solutions for electrostatic discharge. The first is to improve the working environment, to make the appropriate sound, to wear the clothes with grounding effect, or to eliminate the static electricity of the (4) towel. However, there are many unreasonable causes of changing the working environment, and there is no need to do or go - completely solve the damage of static electricity to the mask.彳•#方法方法疋Change the material of the components of the reticle box. US Pat. No. 6,513,654 proposes to provide a reticle support with a grounding function. When the reticle box is in contact with the mating machine, the reticle support can be The charge on the mask is derived. In addition, U.S. Patent No. 6,247,5" proposes to electrically conductive the plate on the chassis, cover or handle of the straw box, thereby reducing the accumulation of electric charge. However, all of the above methods must rely on the conductive ground to release the charge. When the static electricity is released by the conductive element, it will still generate current or cause the discharge to damage the mask. In addition to the above missing, the fresh support or _ pieces provided by this creation are aimed at improving the prior art. [New content] Based on the solution to the above-mentioned prior art, the photomask box provided by the present invention changes the material of the support member or the restriction member which is in direct contact with the reticle, and uses the static dissipative material as the support member or The material of the limiting member, even if the static dissipative material generates electric charge due to friction, the metal material located near Φ will be discharged immediately, avoiding charge accumulation and electrostatic discharge effect. The main purpose of this creation is to provide a reticle support with a static dissipative material that reduces charge buildup and prevents static damage to the reticle. V Another object of this creation is to provide a reticle support with a static dissipative material that can continue to conduct charge to prevent high temperature damage to the reticle due to transient discharge. Another object of the present invention is to provide a reticle restriction member having a static dissipative material, which can reduce charge accumulation and prevent damage caused by static electricity to the reticle. A further object of the present invention is to provide a reticle restriction member having a static dissipative material which can continuously derive a charge to prevent high temperature damage to the reticle by instantaneous discharge. The present invention provides a photomask case and a reticle transfer case, which are characterized in that they are directed to the reticle directly.

Claims (1)

M331743 九、申請專利範圍： 1· 一種光罩盒，該光罩盒包括： 一第一蓋體；以及 :第二蓋體’與第-蓋體組合形成—内部空間，可容置至少 部空間之表面上对複數個切件切Γ之具有本體錄體面對該内 消散材。 牙件或限制件，該支樓件或限制件材質為靜電 2.==卿帛丨_軸衫，料婦麵刪轉為㈣4〜 3·==咖第1項所述之光罩盒，其中該些支雜限制件係為不同材 4. =Γ圍第1項所述之光罩盒，其中嫩雜限制件係為相同材 5. ^請=娜丨概之紐，其巾剔研勒物 汉有一導輸’該描㈣設_導電板上與解電板電性連接。 6.2申請專利範圍第i項所述之光罩盒，其中該第—蓋體或第二蓋體為金屬材 7. 如申請專利範圍第i項所述之光罩盒，其中該支撐件之結構包括： -平面基底連接-第-斜面且該第—斜面再第二斜面以形成一整 、、、。構’且於該整體結構之兩湖邊區域即設二個第—開口，其中每一該 一開口中配置一上固定元件及一下固定元件。 X 8. 如申睛專利範圍第丨項所述之光罩盒’其中該支撐件結構之特徵包括： -座體，細紐個支觀祕賊光轉处上蓋㈣各角落之位 置；以及 一弯曲彈性元件，其-f曲之端部結合於該座體上，另一f曲之端部則 呈彈性懸浮狀態於該複數個支樓點之間，且進一步包括一頂持面及一扣壓面； M331743 其中，當該鮮傳送盒之蓋合—光科，該彎曲元 該扣壓面與該光罩接觸並固定之。 之忒頂持面及 9· 一種光罩傳送盒，該光罩傳送盒包括·· 一頂蓋；以及 •巷厘 興頂盍組合形成一内部空間，可容置至少一 該内部空間之表面上設有複數個支撐件，該支撐件材質為靜座面對 10.如申凊專利範圍第9項所述之光單傳送盒，其中該靜 / 104〜約10ηΩ。 放材貝電阻值為約 如申請專利範圍第9項所述之光罩傳送盒，其中另包含複數 該本體面對該内部空間之表面上。 、制件，设於 12. 如申請專利範圍第η項所述之光罩傳送盒，其中該 不同材質所構成。 一件及限制件係為 13. 如申請專利範圍第u項所述之光罩傳送盒，其中該 相同材質所構成。 又牙件及限制件係為 A面如上申9機之峨拉，㈣恤糊部空門之声 面上:有-轉板，該支撐件係設於料電板上與料電板電 仏表 巧:秦丨軸順軸峨盒，其__她篆I金 16· —種光罩盒，該光罩盒包括： 一第一蓋體； 一第二蓋體’與第-蓋體組合形成—内部空間，可容置 該第一以及第二蓋體至少其中之一具有一本體； 先罩，且 複數個限制件，設置於該本體面對内部空間之表面上；以及 複數個支撐件，設置於該本體面對内部空間之 消散材； ，、何負為靜電 其中該複數個關件與該複數個切件係使料成份射㈣型方法結 15M331743 IX. Patent application scope: 1. A photomask box, the photomask box comprising: a first cover body; and a second cover body formed in combination with the first cover body to form an inner space for accommodating at least a space On the surface of the plurality of cut pieces, the body recording body faces the inner dissipating material. The tooth piece or the limiting piece, the material of the branch piece or the limiting piece is static electricity 2.==Qing 帛丨 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The splicing box of the first item is the same as that of the material of the first item. Lehman has a derivative transmission. The drawing (four) is set on the conductive plate and electrically connected to the de-energized plate. 6.2. The reticle case of claim i, wherein the first cover or the second cover is a metal material. 7. The photomask case of claim i, wherein the structure of the support member The method comprises: - a planar substrate connection - a first bevel and the first bevel and a second bevel to form a whole, . There are two first openings in the two lakeside regions of the overall structure, wherein each of the openings is provided with an upper fixing member and a lower fixing member. X 8. The photomask case as described in the scope of claim </ RTI> wherein the structure of the support member comprises: - a seat body, a position of each of the corners of the top cover of the thief light switch; and a position; The curved elastic member has an end portion of the -f curved portion coupled to the base body, and an end portion of the other curved portion is elastically suspended between the plurality of branch points, and further includes a top holding surface and a buckle M331743 wherein, when the fresh transfer box is covered, the bending element is in contact with the photomask and fixed. a dome-receiving surface and a reticle transfer case, the reticle transfer case includes a top cover; and a combination of a top cover and an outer cover to form an inner space for accommodating at least one surface of the inner space A plurality of support members are provided, and the support member is made of a static seat facing 10. The optical single transfer case according to claim 9 of the claim, wherein the static/104 is about 10 ηΩ. A reticle transfer case according to the ninth aspect of the invention, which further comprises a plurality of the body facing the surface of the internal space. The article is provided in 12. The reticle transfer case as described in claim n, wherein the different materials are formed. The one piece and the restraining piece are 13. The reticle transfer case as described in claim u, wherein the same material is used. The teeth and the restraining parts are the A side of the above-mentioned 9 machine pull, (4) the sound surface of the empty door of the shirt: there is a transfer board, the support is set on the power board and the electric board electric meter Qiao: Qin Hao axis shaft box, its __ her 篆 I gold 16 · a reticle box, the reticle box includes: a first cover; a second cover 'combined with the first cover An internal space, at least one of the first and second covers having a body; a first cover, and a plurality of limiting members disposed on a surface of the body facing the internal space; and a plurality of support members, a dissipative material disposed on the body facing the inner space; , and what is negatively electrostatic, wherein the plurality of the plurality of the cutting members and the plurality of the cutting members are caused by the material composition (four) type method 15
TW096213177U 2007-08-10 2007-08-10 Photomask pod, photomask transport pod and the supporter thereof TWM331743U (en)

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TW096213177U TWM331743U (en) 2007-08-10 2007-08-10 Photomask pod, photomask transport pod and the supporter thereof
US12/110,276 US20090038985A1 (en) 2007-08-10 2008-04-25 Photomask pod, photomask transport pod and supporter thereof

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TW096213177U TWM331743U (en) 2007-08-10 2007-08-10 Photomask pod, photomask transport pod and the supporter thereof

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