US20090194197A1 - Gas filling apparatus and gas filling port thereof - Google Patents
Gas filling apparatus and gas filling port thereof Download PDFInfo
- Publication number
- US20090194197A1 US20090194197A1 US12/270,880 US27088008A US2009194197A1 US 20090194197 A1 US20090194197 A1 US 20090194197A1 US 27088008 A US27088008 A US 27088008A US 2009194197 A1 US2009194197 A1 US 2009194197A1
- Authority
- US
- United States
- Prior art keywords
- gas filling
- gas
- foundation
- filling port
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A gas filling apparatus for connecting a gas feeding device to introduce a gas into a storage apparatus for storing a semiconductor element or a reticle comprises a base and at least one gas filling port, in which the gas filling port comprises a foundation, an elastic element and a fixing element for fixing the elastic element.
Description
- 1. Technical Field
- The present invention relates to a gas filling apparatus and a gas filling port thereof. More particularly, the present invention relates to a gas filling apparatus serves to fill the gas into a storage apparatus for storing a semiconductor element or a reticle and a gas filling port of the gas filling apparatus.
- 2. Description of Related Art
- As for the rapidly developing semiconductor technology in modern times, optical lithography plays an important role and wherever pattern definition is conducted, optical lithography is requisite. The application of optical lithography in associate with semiconductors is to use a designed circuit pattern to produce a light-transparent reticle having a predetermined shape. Basing on the principle of exposure, after a light beam passes through the reticle to project on a silicon wafer, the circuit pattern formed on the reticle can be exposed onto the silicon wafer. Since any dust (such as particles, powders or an organic matter) can adversely affect the quality of such projected pattern, the reticle used to produce the pattern and the silicon wafers or other semiconductor elements to be projected with the pattern thereon, are required with absolute cleanness. Thus, clean rooms are typically employed in general wafer processes for preventing particles in the air from defiling reticles and wafers. However, absolute dustless environment is inaccessible even in the existing clean rooms.
- Hence, the storage apparatuses that facilitate protecting semiconductor elements or reticles from defilement are implemented in current semiconductor processes for the purpose of storage and transportation so as to ensure cleanness of the semiconductor elements and reticles. When accommodated in such storage apparatuses for being transferred and conveyed between stations during semiconductor processes, the semiconductor elements and reticles can be isolated from the atmosphere so as to be secured from defilement caused by impurities that induces deterioration. Further, in advanced semiconductor factories, the cleanliness of the storage apparatuses is required to meet the Standard Mechanical Interface (SMIF), namely superior to
Class 1. One solution for achieving the required cleanliness is to fill gas into the storage apparatuses. In the existing technology, an external gas filling apparatus is connected with the storage apparatus so as to allow gas to be filled into the storage apparatus through the gas filling apparatus. - In all conventional methods or means used for the aforementioned gas-filling purpose, an airtight element, typically an “o-ring seal”, is required at the gas filling port, where a gas is filled into the storage apparatus. Such element can be learned from U.S. Pat. Nos. 5,879,458, 6,042,651, 6,221,163, and 6,368,411. In those prior art devices, the o-ring seal is directly and unfixedly inlaid into the gas filling port to prevent the gas to be filled from leaking out. However, conventional gas filling port configured so is subject to the life limit of the o-ring seal. In other words, once the o-ring seal becomes incompetent due to attrition, the overall efficiency of the gas filling port declines, or worse, the entire gas filling port becomes invalid, resulting in increased costs. Though such o-ring seal may be the selection for achieving airtight combination between the gas filling port and the storage apparatus due to its flexibility when it is simply inlaid at the gas filling port without any fixing means as in the prior art devices, it can be improperly consumed, thereby causing unnecessary costs.
- Seeing that, the present invention provides a gas filling apparatus to improve the current technology.
- For solve the above-mentioned technical problem, the present invention provides a gas filling apparatus, which is composed of a base and a gas filling port. Therein, the gas filling port includes a foundation, an elastic element and a fixing element. The foundation is formed with a through hole for allowing a gas to pass through. The elastic element is deposited on the foundation for airtight purpose. The fixing element is settled on the foundation for fixing the elastic element.
- Therefore, the main objective of the present invention is to provide a gas filling port that having a replaceable elastic element so that an incompetent old elastic element can be replaced independently without rendering the entire gas filling port discarded, thereby saving cost.
- Another objective of the present invention is to provide a gas filling port that having a fixing element for fixing an elastic element on the gas filling port so as to enhance the utility convenience of the gas filling port.
- Still another objective of the present invention is to provide a gas filling port with an elastic element that having an arched contacting portion so as to further close contacting surfaces of the gas filling port and a gas feeding device, thereby the risk of gas leakage is reduced.
- Yet another objective of the present invention is to provide a gas filling port with an elastic element that having a plane contacting portion so as to further close contacting surfaces of the gas filling port and a gas feeding device, thereby the risk of gas leakage is reduced.
- The invention as well as a preferred mode of use, further objectives and advantages thereof, will best be understood by reference to the following detailed description of an illustrative embodiment when read in conjunction with the accompanying drawings, wherein:
-
FIG. 1 is a sectional view of a gas filling apparatus of the present invention; -
FIGS. 2A and 2B are views of showing different embodiment of an elastic element of the present invention; -
FIGS. 3A through 3F illustrate alternative arrangements of a fixing element of the present invention; -
FIGS. 4A and 4B depict a fastening portion of a foundation of the present invention; and -
FIG. 5A throughFIG. 5C represent an adjuster of the present invention. - While the present invention discloses a gas filling apparatus having a gas filling port, it is to be stated first of all that the detailed manufacturing or processing procedures relating to the mentioned reticles, semiconductor elements, storage apparatuses and gas filling apparatuses relay on known technology and need not be discussed at length herein. Meantime, while the accompanying drawings are provided for purpose of illustration, it is to be understood that the components and structures therein need not to be made in scale.
- The disclosed gas filling apparatus of the present invention is to be connected with a gas feeding device (not shown in the drawings) for introducing a gas into a storage apparatus for storing a semiconductor element or a reticle. The storage apparatus comprises at least one gas entrance whereby the gas can enter the storage apparatus.
- Please refer to
FIG. 1 shows the gas filling apparatus of the present invention. The gas filling apparatus includes at least onebase 1 and at least onegas filling port 2, in which thebase 1 is provided for receiving astorage apparatus 5 while thegas filling port 2 is for being connected with agas inlet port 51 of thestorage apparatus 5 for filling a gas into thestorage apparatus 5. Therein, thegas filling port 2, being where the technical feature of the present invention relies upon, is settled on thebase 1 and positionally corresponding to thegas inlet port 51 of thestorage apparatus 5. Thegas filling port 2 comprises afoundation 21, anelastic element 22 and afixing element 23. Thefoundation 21 is formed with athrough hole 24 that allowed the gas to pass through. Theelastic element 22 is designed to be in contact with thegas entrance 51 of thestorage apparatus 5 for maintaining an airtight state so that when the gas is introduced into thestorage apparatus 5 through thegas filling port 2, theelastic element 22 is capable of preventing the gas from leaking out. Thefixing element 23 serves to fix theelastic element 22 in position. Meantime, since theelastic element 22 is not inlaid in thefoundation 21, theelastic element 22 can be easily removed by disassembling thefixing element 23 and then be replaced with a spareelastic element 22, so as to achieve the convenient usage. Besides, aflange 27 may be formed on thefoundation 21 for further fixing theelastic element 22 in position. In this embodiment, the semiconductor element such as FOUP (Front Opening Unified Pod), FOSB (Front Opening Shipping Pod) or any kind of wafer pod. - Now referring to
FIGS. 2A and 2B , theelastic element 22 is typically an o-ring seal, which is a circular element. A contactingportion 221 of theelastic element 22 is used for contacting thegas entrance 51 of thestorage apparatus 5 that may be formed as an arched surface (as shown inFIG. 2A ) or a plane surface (as shown inFIG. 2B ), in which the plane surface provides a relatively broad contacting area and therefore contributes to superior airtight efficiency. - Please see
FIGS. 3A through 3F show the alternative arrangements of the fixingelement 23. The fixingelement 23 is settled on thefoundation 21 by any available means for fixing theelastic element 22, such as hooking means or screwing means. InFIG. 3A , the fixingelement 23 fixes theelastic element 22 that having the arched contacting portion on thefoundation 21 by hooking means. InFIG. 3B , the fixingelement 23 fixes theelastic element 22 that having the plane contacting portion on thefoundation 21 by hooking means.FIG. 3C shows the fixingelement 23 and thefoundation 21 that to be combined by hooking means are now disassembled. InFIG. 3D , the fixingelement 23 fixes theelastic element 22 with the arched contacting portion on thefoundation 21 by screwing means.FIG. 3E shows the fixingelement 23 fixing theelastic element 22 with the plane portion on thefoundation 21 by screwing means.FIG. 3F shows the fixingelement 23 and thefoundation 21 that is combined by screwing means are now disassembled. Various arrangements of the fixingelement 23 may be implemented as needed. - Then, in
FIG. 4A , to position thegas filling port 2 on thebase 1, thefoundation 21 of the gas filling portmay be further equipped with afastening portion 25 so thatfastening element 251 formed on thefastening portion 25 can engage thefoundation 21 with thebase 1. Therein, each saidfastening element 251 may further have afastening head 252, as shown inFIG. 4B , and anelastic device 253 may be additionally settled on thegas filling port 2 wrapped around thefastening head 252 of thefastening element 251 and thefoundation 21 for allowing thegas filling port 2 to be adjusted with respect to thebase 1 so that when thebase 1 or thestorage apparatus 5 is slanted or oblique, thegas filling port 2 can be posed accordingly so as to prevent the gas leakage. - For better achieving the objectives of the present invention, an
adjuster 26 may be additionally provided for allowing adaptability of an interval between thebase 1 and thefoundation 21, as shown inFIGS. 5A and 5B . Furthermore, at least oneaperture 261 may be formed on theadjuster 26 for combining theadjuster 26 with thefoundation 21 or thebase 1. Furthermore, at least oneaperture 261 may be formed on theadjuster 26 for reducing a weight of theadjuster 26 as shown inFIG. 5C . - Although the particular embodiments of the invention have been described in detail for purposes of illustration, it will be understood by one of ordinary skill in the art that numerous variations will be possible to the disclosed embodiments without going outside the scope of the invention as disclosed in the claims.
Claims (20)
1. A gas filling apparatus for being connected with a gas filling device so as to introduce a gas into a storage apparatus for storing a semiconductor element or a reticle, wherein the storage apparatus comprises at least one gas entrance and the gas filling apparatus comprises:
at least one base for receiving the storage apparatus; and
at least one gas filling port, which is settled on the base and positionally corresponding to the gas inlet port of the storage apparatus, and comprises:
a foundation, having a through hole for allowing the gas to pass through;
an elastic element, deposited on the foundation and positionally corresponding to a contacting portion of the gas inlet port for airtight; and
a fixing element, settled on the foundation for fixing the elastic element.
2. The gas filling apparatus of claim 1 , wherein the foundation of the gas filling port further comprises a fixing element that is combined with the base by at least one fastening element.
3. The gas filling apparatus of claim 2 , wherein the fixing element has a fastening head and the gas filling port further comprises an elastic device settled between the fastening head of the fixing element and the foundation so as to allow the gas filling port to be elastically adjusted with respect to the base.
4. The gas filling apparatus of claim 1 , wherein a contacting portion on the elastic element of the gas filling port for contacting the gas entrance of the storage apparatus is formed as an arched surface.
5. The gas filling apparatus of claim 1 , wherein a contacting portion on the elastic element of the gas filling port for contacting the gas inlet port of the storage apparatus is formed as a plane surface.
6. The gas filling apparatus of claim 1 , wherein the fixing element of the gas filling port engages with the foundation by a hooking means.
7. The gas filling apparatus of claim 1 , wherein the fixing element of the gas filling port engages with the foundation by a screwing means.
8. The gas filling apparatus of claim 1 , wherein the foundation of the gas filling port further comprises an adjuster for adjusting an gap between the base and the foundation.
9. The gas filling apparatus of claim 8 , wherein the adjuster is formed with at least one hole for combining the foundation and the base.
10. The gas filling apparatus of claim 8 , wherein the adjuster is formed with at least one hole for reducing a weight of the adjuster.
11. A gas filling port, settled on a base of a gas filling apparatus, wherein the gas filling apparatus serves to introduce a gas into a storage apparatus that is placed on the base and is for storing a semiconductor element or a reticle, in which the storage apparatus has at least one gas entrance, and comprising:
a foundation, having a through hole for allowing the gas to pass through;
an elastic element, deposited on the foundation and positionally corresponding to a contacting portion of the gas entrance for airtight; and
a fixing element, settled on the foundation for fixing the elastic element.
12. The gas filling port of claim 11 , wherein the foundation of the gas filling port further comprises a fastening portion that is combined with the base by at least one fixing element.
13. The gas filling port of claim 12 , wherein the fixing element has a fastening head and the gas filling port further comprises an elastic device settled between the fastening head of the fastening element and the foundation so as to allow the gas filling port to be elastically adjusted with respect to the base.
14. The gas filling port of claim 11 , wherein a contacting portion on the elastic element for contacting the gas entrance of the storage apparatus is formed as an arched surface.
15. The gas filling port of claim 11 , wherein a contacting portion on the elastic element for contacting the gas inlet port of the storage apparatus is formed as a plane surface.
16. The gas filling port of claim 11 , wherein the fixing element engages with the foundation by a hooking means.
17. The gas filling port of claim 11 , wherein the fixing element engages with the foundation by a screwing means.
18. The gas filling port of claim 11 , wherein the foundation further comprises an adjuster.
19. The gas filling port of claim 18 , wherein the adjuster is formed with at least one hole for combining the foundation and the base.
20. The gas filling port of claim 18 , wherein the adjuster is formed with at least one hole for reducing a weight of the adjuster.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW097202085U TWM336219U (en) | 2008-01-31 | 2008-01-31 | Gas filling apparatus and gas filling port thereof |
TW097202085 | 2008-01-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20090194197A1 true US20090194197A1 (en) | 2009-08-06 |
Family
ID=40930493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/270,880 Abandoned US20090194197A1 (en) | 2008-01-31 | 2008-11-14 | Gas filling apparatus and gas filling port thereof |
Country Status (2)
Country | Link |
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US (1) | US20090194197A1 (en) |
TW (1) | TWM336219U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090165888A1 (en) * | 2007-12-27 | 2009-07-02 | Wang Sheng-Hung | Gas filling apparatus |
CN111916379A (en) * | 2019-05-09 | 2020-11-10 | 吕保仪 | Inflation system |
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-
2008
- 2008-01-31 TW TW097202085U patent/TWM336219U/en not_active IP Right Cessation
- 2008-11-14 US US12/270,880 patent/US20090194197A1/en not_active Abandoned
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090165888A1 (en) * | 2007-12-27 | 2009-07-02 | Wang Sheng-Hung | Gas filling apparatus |
US8286672B2 (en) * | 2007-12-27 | 2012-10-16 | Gudeng Precision Industrial Co., Ltd. | Gas filling apparatus |
CN111916379A (en) * | 2019-05-09 | 2020-11-10 | 吕保仪 | Inflation system |
Also Published As
Publication number | Publication date |
---|---|
TWM336219U (en) | 2008-07-11 |
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Owner name: GUDENG PRECISION INDUSTRAL CO, LTD, TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAN, YUNG-SHUN;CHEN, YU-MING;REEL/FRAME:021833/0041 Effective date: 20080923 |
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STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |