CN201097111Y - Light cover box and light cover carrying box - Google Patents
Light cover box and light cover carrying box Download PDFInfo
- Publication number
- CN201097111Y CN201097111Y CNU2007201503874U2007201503874U CN200720150387U CN201097111Y CN 201097111 Y CN201097111 Y CN 201097111Y CN U2007201503874U2007201503874 U CNU2007201503874U2007201503874 U CN U2007201503874U2007201503874U CN 200720150387 U CN200720150387 U CN 200720150387U CN 201097111 Y CN201097111 Y CN 201097111Y
- Authority
- CN
- China
- Prior art keywords
- box
- photomask
- metal
- light shield
- macromolecule material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The photo mask box of the utility model is used for avoiding the particles in the environment to pollute the photo mask, and preventing the electrostatic discharge caused by charge accumulation. The photo mask box is composed of two cover bodies; the material of at least one cover body adopts high polymer material mixed metal, the metal can adopt a stainless steel wire, an electric conductive metal filament or metal particles.
Description
Technical field
The utility model relates to a kind of box for photomask, particularly can prevent the box for photomask that static discharge destroys.
Background technology
Modern age, the semiconductor development in science and technology was rapid, and wherein photolithography techniques (Optical Lithography) is played the part of important role, so long as about figure (pattern) definition, all need be dependent on photolithography techniques.
Photolithography techniques is that the circuit that will design manufactures the light shield (photo mask) with given shape light-permeable in semi-conductive application.Utilize the exposure principle, then light source is projected to silicon wafer (silicon wafer) the demonstration specific pattern that can expose by light shield.Because any dust granules (as particulate, dust or organism) that is attached on the light shield all can cause the quality badness of projection imaging, the light shield that is used to produce figure must keep absolute cleaning, therefore in general wafer fabrication process, the environment that dust free room (clean room) all is provided is to avoid airborne particle contamination.Yet present dust free room also can't reach absolute dustless state.Modern semiconductor fabrication process all utilizes resistant to pollution box for photomask (reticle pod) to carry out the preservation and the transportation of light shield, so that light shield remaining clean.
Known box for photomask is many to be constituted with macromolecule material, and this kind macromolecule material has the advantage that moulding is easy, cheap and can form the transparent body.The high macromolecule material of this kind insulation resistance easily because friction or dial from and the operating environment that produces static, especially dust free room need keep than low humidity, make the box for photomask of macromolecule material be very easy to produce and stored charge.The static on light shield surface attracts airborne contaminate particulate easily, also can cause the metal wire on the light shield static discharge (electrostatic discharge, ESD) effect to occur what is more.The immediate current that static discharge produced can cause spark (spark) or electric arc (arc), and in spark and electric arc generation, powerful electric current is accompanied by high temperature, causes the oxidation and the dissolving of metal wire, thereby has changed the pattern of light shield.
Having at present manyly at the method that static discharge solved, at first is to improve operating environment, makes to keep suitable humidity, operating personnel in the air and wear the clothing of tool ground connection effect or use the ion fan to eliminate static in the environment.But change operating environment have many unpredictable changes because of, have no idea to solve fully the injury of static to light shield.
Another kind method is the material that changes the box for photomask element, US6, and 513, No. 654 United States Patent (USP) proposes, and the light shield support member of tool grounding function is set, and when box for photomask contacted with the cooperation board, the light shield support member can be derived the electric charge on the light shield.Other US6,247, No. 599 United States Patent (USP) proposes, and sets up current-carrying plate on chassis, cover cap or the carrying handle of box for photomask, thereby reduces the accumulation of electric charge.Disengage electric charge when right above method must be dependent on conducting element ground connection, such method still can't solve the charge accumulation effects of box for photomask.
If the material change of box for photomask is become conductive material, the approach of electrostatic dissipation just can be provided.Yet the box for photomask material is changed into the conductive material of metal species, and also the machine interface that cooperates of change that must be related causes the soaring in a large number problems of cost.
Because above disappearance, box for photomask provided by the utility model is at prior art ameliorator in addition.
The utility model content
Based on the disappearance that solves above-mentioned prior art, box for photomask provided by the utility model, be utilize metal-doped in the material of macromolecule material as box for photomask, even if macromolecule material can produce electric charge because of friction, but near the metal material being positioned at can be derived with being about to electric charge, avoids electric charge accumulation and static discharge effect.
Fundamental purpose of the present utility model for a kind of box for photomask is provided, can reduce electric charge accumulation, and prevents that static is to injury that light shield caused.
A purpose more of the present utility model, for a kind of box for photomask is provided, its composition material has metal-doped in macromolecule material, this kind material has the advantage of macromolecule and metal concurrently, have with low cost, moulding easily, can form the effect of light-transmitting materials.
Another purpose of the present utility model for a kind of box for photomask is provided, has metal-dopedly in macromolecule material by its composition material, this kind material can continue to derive electric charge, and avoiding sparking produces high temperature injury to light shield.
Description of drawings
Fig. 1 is the box for photomask sectional view of the utility model one preferred embodiment;
Fig. 2 is the box for photomask sectional view of another preferred embodiment of the utility model;
Fig. 3 is the box for photomask sectional view of the another preferred embodiment of the utility model.
The main element description of symbols
100 box for photomask, 110 first lids
120 second lids, 200 box for photomask
210 first lids, 220 second lids
300 box for photomask, 310 top covers
320 pedestals, 330 light shields
340 current-carrying plates
Embodiment
Because the utility model is for disclosing a kind of box for photomask, some primary elements that wherein used and combination to each other disclose in background technology in detail, and therefore complete description is no longer done in explanation hereinafter.Simultaneously, for box for photomask primary structure principle, person that the person of ordinary skill in the field can not understand easily also repeats no more.And the accompanying drawing hereinafter to be contrasted be to be expressed the structural representation relevant with the utility model feature, does not also need according to the complete drafting of physical size, entire chat earlier bright.
With reference to Fig. 1, according to the utility model one preferred embodiment, provide box for photomask 100, this box for photomask 100 can be that light shield conserving case or light shield transmit box, this box for photomask 100 has comprised first lid 110 and second lid 120; The material that wherein forms first lid 110 is that macromolecule material mixes up metal, and this metal can be stainless steel wire, conductive tinsel or metal particle.
With reference to Fig. 2, according to another preferred embodiment of the utility model, for box for photomask 200 is provided, this box for photomask 200 can be that light shield conserving case or light shield transmit box, and this box for photomask 200 has comprised first lid 210 and second lid 220; The material that wherein forms second lid 220 is that macromolecule material mixes up metal, and this metal can be stainless steel wire, conductive tinsel or metal particle.
With reference to Fig. 3, according to the another preferred embodiment of the utility model, for box for photomask 300 is provided, this box for photomask 300 can be that light shield conserving case or light shield transmit box, this box for photomask 300 has comprised pedestal 320 and top cover 310, pedestal 320 is that metal, stainless steel or macromolecular material are formed, and pedestal 320 is combined into an inner space with top cover 310, can ccontaining at least one light shield 330; Top cover 310 or pedestal 320 one of them individual formation material are the macromolecule material doping metals, and this metal can be stainless steel wire, conductive tinsel or metal particle; Current-carrying plate 340 is set in addition, and this current-carrying plate 340 is a metal material, is positioned at pedestal 320 in opposite directions in the upper surface of top cover 310, and presents electrical communicating state with top cover 310.
The formed material of the doping metals of macromolecule material described in the previous embodiment, its surface impedance scope is preferable to be about every square centimeter 10
3-10
9Ohm/sq.
In sum, its composition material of box for photomask of the present utility model has metal-doped in macromolecule material, and this kind material has the advantage of macromolecule and metal concurrently, can continue to derive electric charge, avoids sparking light shield is produced high temperature injury.That the utility model also can reach is with low cost, moulding easily, can form the effect of light-transmitting materials.
More than, the utility model has been known by embodiment and relevant drawings thereof and has been stated clearly.Yet, the person of ordinary skill in the field is when understanding, each embodiment of the present utility model only is exemplary at this but not is restricted, just, do not breaking away within the utility model connotation and the scope variation example of above-mentioned described and each element and revise example and be the utility model and contain.Therefore, the utility model is defined by claim.
Claims (9)
1. box for photomask comprises:
First lid; And
Second lid is combined to form the inner space with first lid, can ccontaining at least one light shield, and the material that it is characterized in that wherein forming this first or second lid is the macromolecule material doping metals.
2. box for photomask according to claim 1 is characterized in that this metal is to mix this macromolecule material with the tinsel form.
3. box for photomask according to claim 1 is characterized in that this metal is to mix this macromolecule material with the metal particle form.
4. box for photomask according to claim 1 is characterized in that this metal is a stainless steel.
5. box for photomask according to claim 1 is characterized in that the surface impedance of this macromolecule material doping metals is about 10
3-10
9Ohm/sq.
6. a light shield transmits box; Comprise:
Pedestal; And
Top cover forms the inner space with this base combination, and this inner space can ccontaining at least one light shield, it is characterized in that the material of this top cover wherein or pedestal is the macromolecule material doping metals.
7. light shield according to claim 6 transmits box, it is characterized in that also comprising current-carrying plate, is located at this pedestal in opposite directions in the presumptive area of this top cover upper surface.
8. light shield according to claim 7 transmits box, it is characterized in that this top cover and this current-carrying plate electrically connect.
9. light shield according to claim 6 transmits box, it is characterized in that metal is to mix this macromolecule material with the tinsel form.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201503874U2007201503874U CN201097111Y (en) | 2007-06-28 | 2007-06-28 | Light cover box and light cover carrying box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201503874U2007201503874U CN201097111Y (en) | 2007-06-28 | 2007-06-28 | Light cover box and light cover carrying box |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201097111Y true CN201097111Y (en) | 2008-08-06 |
Family
ID=39924163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007201503874U2007201503874U Expired - Lifetime CN201097111Y (en) | 2007-06-28 | 2007-06-28 | Light cover box and light cover carrying box |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201097111Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108288597A (en) * | 2017-01-10 | 2018-07-17 | 台湾积体电路制造股份有限公司 | Case and particle detection technique |
-
2007
- 2007-06-28 CN CNU2007201503874U2007201503874U patent/CN201097111Y/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108288597A (en) * | 2017-01-10 | 2018-07-17 | 台湾积体电路制造股份有限公司 | Case and particle detection technique |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20080806 |
|
| CX01 | Expiry of patent term |