DE60133433D1 - Interferometrische Messung einer Trägerplattenposition - Google Patents

Interferometrische Messung einer Trägerplattenposition

Info

Publication number
DE60133433D1
DE60133433D1 DE60133433T DE60133433T DE60133433D1 DE 60133433 D1 DE60133433 D1 DE 60133433D1 DE 60133433 T DE60133433 T DE 60133433T DE 60133433 T DE60133433 T DE 60133433T DE 60133433 D1 DE60133433 D1 DE 60133433D1
Authority
DE
Germany
Prior art keywords
carrier plate
plate position
interferometric measurement
interferometric
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60133433T
Other languages
English (en)
Other versions
DE60133433T2 (de
Inventor
Kazunori Iwamoto
Toshiya Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60133433D1 publication Critical patent/DE60133433D1/de
Publication of DE60133433T2 publication Critical patent/DE60133433T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE60133433T 2000-06-01 2001-05-31 Interferometrische Messung einer Trägerplattenposition Expired - Lifetime DE60133433T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000164879 2000-06-01
JP2000164879A JP3728180B2 (ja) 2000-06-01 2000-06-01 干渉計搭載ステージ

Publications (2)

Publication Number Publication Date
DE60133433D1 true DE60133433D1 (de) 2008-05-15
DE60133433T2 DE60133433T2 (de) 2009-04-16

Family

ID=18668439

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60133433T Expired - Lifetime DE60133433T2 (de) 2000-06-01 2001-05-31 Interferometrische Messung einer Trägerplattenposition

Country Status (4)

Country Link
US (1) US6867849B2 (de)
EP (1) EP1160629B1 (de)
JP (1) JP3728180B2 (de)
DE (1) DE60133433T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP4280543B2 (ja) * 2002-05-08 2009-06-17 キヤノン株式会社 移動体機構および露光装置
EP1396757A3 (de) 2002-09-06 2008-12-17 ASML Holding N.V. System zur Fokusmessung eines Retikels und Verfahren unter Verwendung von verschiedenen interferometrischen Strahlen
US6934005B2 (en) 2002-09-06 2005-08-23 Asml Holding N.V. Reticle focus measurement method using multiple interferometric beams
JP2004273926A (ja) * 2003-03-11 2004-09-30 Canon Inc 露光装置
SG147288A1 (en) * 2003-04-29 2008-11-28 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and angular encoder
US7283200B2 (en) * 2003-07-17 2007-10-16 Nikon Corporation System and method for measuring displacement of a stage
JP2006211873A (ja) 2005-01-31 2006-08-10 Canon Inc 移動体制御装置及び移動体制御方法
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
US20090288003A1 (en) * 2006-05-31 2009-11-19 Marinkovic Sinisa V Cost effective system and method for monitoring machinery units
JP2008147411A (ja) 2006-12-08 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
CN102117016A (zh) * 2010-01-04 2011-07-06 上海微电子装备有限公司 一种扫描光刻机掩模台位置测量装置
CN103376665A (zh) * 2012-04-20 2013-10-30 上海微电子装备有限公司 一种掩模台水平向测量装置及方法
CN103383271B (zh) * 2012-05-04 2016-09-28 上海微电子装备有限公司 双硅片台交换系统的交换位置测量装置及其测量方法
US20200011652A1 (en) * 2018-07-03 2020-01-09 Applied Materials, Inc. Interferometry system and methods for substrate processing
US11566887B1 (en) * 2021-09-03 2023-01-31 Kla Corporation Differential height measurement using interstitial mirror plate

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5168512A (en) 1990-03-13 1992-12-01 Canon Kabushiki Kaisha Method of manufacture of semiconductor devices
JP3336436B2 (ja) * 1991-04-02 2002-10-21 株式会社ニコン リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
JPH04351905A (ja) * 1991-05-30 1992-12-07 Fujitsu Ltd レーザ測長装置を備えたｘｙステージ
JPH05126522A (ja) * 1991-11-01 1993-05-21 Nikon Corp 測長装置
US5369488A (en) * 1991-12-10 1994-11-29 Olympus Optical Co., Ltd. High precision location measuring device wherein a position detector and an interferometer are fixed to a movable holder
JPH05217837A (ja) * 1992-02-04 1993-08-27 Toshiba Corp Ｘｙ移動テーブル
US6134981A (en) * 1999-12-03 2000-10-24 Nikon Research Corporation Of America Precision scanning apparatus and method with fixed and movable guide members
US5586059A (en) * 1995-06-07 1996-12-17 Advanced Micro Devices, Inc. Automated data management system for analysis and control of photolithography stepper performance
JPH09275072A (ja) * 1996-04-05 1997-10-21 Nikon Corp 移動鏡の真直度誤差補正方法及びステージ装置
US6049372A (en) * 1996-06-25 2000-04-11 Nikon Corporation Exposure apparatus
JPH1074692A (ja) * 1996-06-25 1998-03-17 Nikon Corp 露光装置
JP3531894B2 (ja) 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
JP3283767B2 (ja) 1996-10-02 2002-05-20 キヤノン株式会社 露光装置およびデバイス製造方法
US5724136A (en) * 1996-10-15 1998-03-03 Zygo Corporation Interferometric apparatus for measuring motions of a stage relative to fixed reflectors
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage
US5862054A (en) * 1997-02-20 1999-01-19 Taiwan Semiconductor Manufacturing Company, Ltd. Process monitoring system for real time statistical process control
JPH10284416A (ja) * 1997-04-10 1998-10-23 Nikon Corp 走査型露光装置及び方法
JPH11132762A (ja) * 1997-10-30 1999-05-21 Nikon Corp 走査型露光装置の長尺鏡の平面度差の測定方法
US6130490A (en) * 1999-04-06 2000-10-10 Nikon Corporation X-Y stage with movable magnet plate
JP2000331909A (ja) * 1999-05-19 2000-11-30 Nikon Corp 走査型露光装置
JP2001209188A (ja) * 2000-01-27 2001-08-03 Nikon Corp 走査型露光装置および走査露光方法並びにマスク

Also Published As

Publication number Publication date
EP1160629A3 (de) 2005-05-04
DE60133433T2 (de) 2009-04-16
US20020008877A1 (en) 2002-01-24
EP1160629B1 (de) 2008-04-02
EP1160629A2 (de) 2001-12-05
JP2001345254A (ja) 2001-12-14
US6867849B2 (en) 2005-03-15
JP3728180B2 (ja) 2005-12-21

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Legal Events

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