DE60128105T8 - Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren - Google Patents

Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren Download PDF

Info

Publication number
DE60128105T8
DE60128105T8 DE60128105T DE60128105T DE60128105T8 DE 60128105 T8 DE60128105 T8 DE 60128105T8 DE 60128105 T DE60128105 T DE 60128105T DE 60128105 T DE60128105 T DE 60128105T DE 60128105 T8 DE60128105 T8 DE 60128105T8
Authority
DE
Germany
Prior art keywords
photoinitiators
collecting
formulation
preparing coatings
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE60128105T
Other languages
German (de)
English (en)
Other versions
DE60128105D1 (de
DE60128105T2 (de
Inventor
Gisèle BAUDIN
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE60128105D1 publication Critical patent/DE60128105D1/de
Application granted granted Critical
Publication of DE60128105T2 publication Critical patent/DE60128105T2/de
Publication of DE60128105T8 publication Critical patent/DE60128105T8/de
Active legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE60128105T 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren Active DE60128105T8 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
EP00810720 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (3)

Publication Number Publication Date
DE60128105D1 DE60128105D1 (de) 2007-06-06
DE60128105T2 DE60128105T2 (de) 2007-12-27
DE60128105T8 true DE60128105T8 (de) 2008-04-30

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60128105T Active DE60128105T8 (de) 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren

Country Status (13)

Country Link
US (1) US7279200B2 (enExample)
EP (1) EP1311627B1 (enExample)
JP (1) JP5068413B2 (enExample)
KR (1) KR100818643B1 (enExample)
CN (1) CN1211439C (enExample)
AT (1) ATE360666T1 (enExample)
AU (1) AU2001293732A1 (enExample)
BR (1) BR0113233B1 (enExample)
CA (1) CA2417112A1 (enExample)
DE (1) DE60128105T8 (enExample)
MX (1) MXPA03001383A (enExample)
TW (1) TWI244495B (enExample)
WO (1) WO2002014439A2 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
EP1325089A2 (de) * 2000-09-25 2003-07-09 Chemetall GmbH Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
KR100898877B1 (ko) * 2002-02-04 2009-05-25 시바 홀딩 인크 고도로 플루오르화된 단량체 내의 플루오르화 광개시제
DE60322345D1 (en) 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
WO2003074718A1 (en) * 2002-03-06 2003-09-12 Ciba Specialty Chemicals Holding Inc. Enzymatic process for preparing organosilicon group containing photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
US20070026509A1 (en) * 2003-06-06 2007-02-01 Jonathan Rogers Novel surface-active polysiloxane photoinitiators
AU2004321917B2 (en) * 2004-07-27 2011-08-25 Duluxgroup (Australia) Pty Ltd System for providing powder coated reconstituted cellulosic substrate
US20080038544A1 (en) * 2004-10-22 2008-02-14 Mitsubishi Rayon Co., Ltd. Matt Acrylic Resin Filmy Product For Thermoforming, Process For Production Thereof, and Laminates Comprising the Product
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
WO2010126618A1 (en) * 2009-04-30 2010-11-04 Armstrong World Industries, Inc. Uvv curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
WO2017112653A1 (en) * 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
WO2018237038A1 (en) 2017-06-21 2018-12-27 Carbon, Inc. Method of additive manufacturing
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备
EP4491688A4 (en) * 2022-03-07 2025-07-09 Lg Chemical Ltd COMPOUND
JP7722248B2 (ja) 2022-04-22 2025-08-13 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
AU718619B2 (en) * 1997-01-30 2000-04-20 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
ATE360666T1 (de) 2007-05-15
US20030213931A1 (en) 2003-11-20
CN1211439C (zh) 2005-07-20
AU2001293732A1 (en) 2002-02-25
JP5068413B2 (ja) 2012-11-07
EP1311627A2 (en) 2003-05-21
US7279200B2 (en) 2007-10-09
BR0113233A (pt) 2003-06-24
TWI244495B (en) 2005-12-01
EP1311627B1 (en) 2007-04-25
JP2004506776A (ja) 2004-03-04
WO2002014439A3 (en) 2002-06-13
CA2417112A1 (en) 2002-02-21
BR0113233B1 (pt) 2013-10-01
CN1447844A (zh) 2003-10-08
KR20030055249A (ko) 2003-07-02
DE60128105D1 (de) 2007-06-06
DE60128105T2 (de) 2007-12-27
MXPA03001383A (es) 2003-06-06
WO2002014439A2 (en) 2002-02-21
KR100818643B1 (ko) 2008-04-04

Similar Documents

Publication Publication Date Title
DE60128105T8 (de) Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren
KR100538684B1 (ko) 나노구조 성형체 및 층 그리고 그것의 제조방법
EP0365027B1 (de) Verfahren zur Herstellung von Materialien mit einem strukturierten Überzug
DE50305348D1 (de) Verfahren zur Herstellung von ablösbaren schmutz- und wasserabweisenden flächigen Beschichtungen
JP6138936B2 (ja) 人工爪の除去方法、人工爪組成物、人工爪、人工爪の形成方法、及び、ネイルアートキット
DE602004021919D1 (de) Verfahren zur herstellung von nanostrukturierten oberflächenbeschichtung, deren beschichtungen und gegenständen enthaltend die beschichtung
ATE284780T1 (de) Verfahren zur herstellung einer augenglaslinse aus kunststoff
ATE471533T1 (de) Verfahren zur herstellung einer schablone
WO2003010603A1 (en) Positive type radiosensitive composition and method for forming pattern
SE7905526L (sv) Sett att astadkomma en yta med reducerad glans samt komposition for genomforande av settet
MXPA05011847A (es) Revestimientos fotocurados y estabilizados.
DE69906374D1 (de) Verfahren zur herstellung eines dekorierten substrats
ATE394453T1 (de) Verfahren zum schutz eines bodenbelag- oder auskleidungsmaterials vor befleckenden substanzen
BR9607693A (pt) Fórmula, processo e aparelho para encapsulação
MY126083A (en) Process film for use in producing cermaic green sheet and method for producing the film
BR0115471A (pt) Fotoiniciadores fluorados em resinas de cura dupla
ATE39941T1 (de) Haertbare organopolysiloxanmassen.
ATE276287T1 (de) Siliko-acrylzusammensetzungen, verfahren zur herstellung sowie verwendung als thermisch oder durch stahlung härtbare beschichtungen
JP2005517055A5 (enExample)
DE50005852D1 (de) Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen
DE60112363D1 (de) Herstellung eines dekorierten Substrats unter Verwendung einer thermisch vernetzbaren Beschichtungszusammensetzung
DE59800916D1 (de) Verfahren zur Herstellung von Organosiloxanmassen mit (Methyl)styrolgruppen durch Härtung mit UV-Strahlung
DE50308076D1 (de) Verfahren zur herstellung hochtransparenter kunststoffe fur optische materialien
ATE346290T1 (de) Verfahren zur herstellung einer integrierten sensormatrixanordung
ATE238261T1 (de) Verfahren zur herstellung von orthoestern

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC