KR100818643B1 - 실록산 광개시제를 사용하는 피막의 제조방법 - Google Patents

실록산 광개시제를 사용하는 피막의 제조방법 Download PDF

Info

Publication number
KR100818643B1
KR100818643B1 KR1020037002201A KR20037002201A KR100818643B1 KR 100818643 B1 KR100818643 B1 KR 100818643B1 KR 1020037002201 A KR1020037002201 A KR 1020037002201A KR 20037002201 A KR20037002201 A KR 20037002201A KR 100818643 B1 KR100818643 B1 KR 100818643B1
Authority
KR
South Korea
Prior art keywords
alkyl
formula
phenyl
radical
unsubstituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020037002201A
Other languages
English (en)
Korean (ko)
Other versions
KR20030055249A (ko
Inventor
기젤레 보뎅
툰야 융
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
Publication of KR20030055249A publication Critical patent/KR20030055249A/ko
Application granted granted Critical
Publication of KR100818643B1 publication Critical patent/KR100818643B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020037002201A 2000-08-14 2001-08-07 실록산 광개시제를 사용하는 피막의 제조방법 Expired - Fee Related KR100818643B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
EP00810720.3 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (2)

Publication Number Publication Date
KR20030055249A KR20030055249A (ko) 2003-07-02
KR100818643B1 true KR100818643B1 (ko) 2008-04-04

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020037002201A Expired - Fee Related KR100818643B1 (ko) 2000-08-14 2001-08-07 실록산 광개시제를 사용하는 피막의 제조방법

Country Status (13)

Country Link
US (1) US7279200B2 (enExample)
EP (1) EP1311627B1 (enExample)
JP (1) JP5068413B2 (enExample)
KR (1) KR100818643B1 (enExample)
CN (1) CN1211439C (enExample)
AT (1) ATE360666T1 (enExample)
AU (1) AU2001293732A1 (enExample)
BR (1) BR0113233B1 (enExample)
CA (1) CA2417112A1 (enExample)
DE (1) DE60128105T8 (enExample)
MX (1) MXPA03001383A (enExample)
TW (1) TWI244495B (enExample)
WO (1) WO2002014439A2 (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
EP1325089A2 (de) * 2000-09-25 2003-07-09 Chemetall GmbH Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
KR100898877B1 (ko) * 2002-02-04 2009-05-25 시바 홀딩 인크 고도로 플루오르화된 단량체 내의 플루오르화 광개시제
DE60322345D1 (en) 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
WO2003074718A1 (en) * 2002-03-06 2003-09-12 Ciba Specialty Chemicals Holding Inc. Enzymatic process for preparing organosilicon group containing photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
US20070026509A1 (en) * 2003-06-06 2007-02-01 Jonathan Rogers Novel surface-active polysiloxane photoinitiators
AU2004321917B2 (en) * 2004-07-27 2011-08-25 Duluxgroup (Australia) Pty Ltd System for providing powder coated reconstituted cellulosic substrate
US20080038544A1 (en) * 2004-10-22 2008-02-14 Mitsubishi Rayon Co., Ltd. Matt Acrylic Resin Filmy Product For Thermoforming, Process For Production Thereof, and Laminates Comprising the Product
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
WO2010126618A1 (en) * 2009-04-30 2010-11-04 Armstrong World Industries, Inc. Uvv curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
WO2017112653A1 (en) * 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
WO2018237038A1 (en) 2017-06-21 2018-12-27 Carbon, Inc. Method of additive manufacturing
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备
EP4491688A4 (en) * 2022-03-07 2025-07-09 Lg Chemical Ltd COMPOUND
JP7722248B2 (ja) 2022-04-22 2025-08-13 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998033761A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998033761A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GB 1534320 PROCESS AND COMPOSITIONS FOR PHOTOPOLYMERISATION *
WO 9833761 NON-VOLATILE PHENYLGLYOXALIC ESTERS

Also Published As

Publication number Publication date
ATE360666T1 (de) 2007-05-15
US20030213931A1 (en) 2003-11-20
CN1211439C (zh) 2005-07-20
AU2001293732A1 (en) 2002-02-25
JP5068413B2 (ja) 2012-11-07
EP1311627A2 (en) 2003-05-21
DE60128105T8 (de) 2008-04-30
US7279200B2 (en) 2007-10-09
BR0113233A (pt) 2003-06-24
TWI244495B (en) 2005-12-01
EP1311627B1 (en) 2007-04-25
JP2004506776A (ja) 2004-03-04
WO2002014439A3 (en) 2002-06-13
CA2417112A1 (en) 2002-02-21
BR0113233B1 (pt) 2013-10-01
CN1447844A (zh) 2003-10-08
KR20030055249A (ko) 2003-07-02
DE60128105D1 (de) 2007-06-06
DE60128105T2 (de) 2007-12-27
MXPA03001383A (es) 2003-06-06
WO2002014439A2 (en) 2002-02-21

Similar Documents

Publication Publication Date Title
KR100818643B1 (ko) 실록산 광개시제를 사용하는 피막의 제조방법
EP1072326B1 (de) Oberflächenaktive Photoinitiatoren
US6906113B2 (en) Surface-active photoinitiators
US20040033317A1 (en) Surface-active photoinitators
US7001644B2 (en) Surface-active photoinitiators
US20040058087A1 (en) Surface-active photoinitiators
JP4222945B2 (ja) 界面活性シロキサン光開始剤
US20050119435A1 (en) Surface-active photoinitiators
KR100681160B1 (ko) 표면활성 광개시제

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R15-X000 Change to inventor requested

St.27 status event code: A-3-3-R10-R15-oth-X000

R16-X000 Change to inventor recorded

St.27 status event code: A-3-3-R10-R16-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20130321

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20140318

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20170327

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20170327