JP5068413B2 - 界面活性光開始剤を用いるコーティングの製造方法 - Google Patents

界面活性光開始剤を用いるコーティングの製造方法 Download PDF

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Publication number
JP5068413B2
JP5068413B2 JP2002519570A JP2002519570A JP5068413B2 JP 5068413 B2 JP5068413 B2 JP 5068413B2 JP 2002519570 A JP2002519570 A JP 2002519570A JP 2002519570 A JP2002519570 A JP 2002519570A JP 5068413 B2 JP5068413 B2 JP 5068413B2
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JP
Japan
Prior art keywords
formula
group
photoinitiator
compound
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002519570A
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English (en)
Japanese (ja)
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JP2004506776A5 (enExample
JP2004506776A (ja
Inventor
ボーダン，ジゼル
ユング，トゥニヤ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2004506776A publication Critical patent/JP2004506776A/ja
Publication of JP2004506776A5 publication Critical patent/JP2004506776A5/ja
Application granted granted Critical
Publication of JP5068413B2 publication Critical patent/JP5068413B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002519570A 2000-08-14 2001-08-07 界面活性光開始剤を用いるコーティングの製造方法 Expired - Lifetime JP5068413B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810720.3 2000-08-14
EP00810720 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (3)

Publication Number Publication Date
JP2004506776A JP2004506776A (ja) 2004-03-04
JP2004506776A5 JP2004506776A5 (enExample) 2008-09-25
JP5068413B2 true JP5068413B2 (ja) 2012-11-07

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002519570A Expired - Lifetime JP5068413B2 (ja) 2000-08-14 2001-08-07 界面活性光開始剤を用いるコーティングの製造方法

Country Status (13)

Country Link
US (1) US7279200B2 (enExample)
EP (1) EP1311627B1 (enExample)
JP (1) JP5068413B2 (enExample)
KR (1) KR100818643B1 (enExample)
CN (1) CN1211439C (enExample)
AT (1) ATE360666T1 (enExample)
AU (1) AU2001293732A1 (enExample)
BR (1) BR0113233B1 (enExample)
CA (1) CA2417112A1 (enExample)
DE (1) DE60128105T8 (enExample)
MX (1) MXPA03001383A (enExample)
TW (1) TWI244495B (enExample)
WO (1) WO2002014439A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023203869A1 (ja) 2022-04-22 2023-10-26 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
US20030185990A1 (en) * 2000-09-25 2003-10-02 Klaus Bittner Method for pretreating and coating metal surfaces prior to forming, with a paint-like coating and use of substrates so coated
ATE402195T1 (de) 2002-02-04 2008-08-15 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
EP1481074B1 (en) 2002-03-06 2010-10-06 Basf Se Enzymatic process for preparing organosilicon group containing photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
CN100432122C (zh) * 2003-06-06 2008-11-12 西巴特殊化学品控股有限公司 新颖的表面活性聚硅氧烷光引发剂
AU2004321917B2 (en) * 2004-07-27 2011-08-25 Duluxgroup (Australia) Pty Ltd System for providing powder coated reconstituted cellulosic substrate
EP1803553B1 (en) * 2004-10-22 2012-08-01 Mitsubishi Rayon Co., Ltd. Matt acrylic resin film product for thermoforming, process for producing the same, and laminated product comprising the same
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
US20100022676A1 (en) * 2006-10-03 2010-01-28 Jonathan Rogers Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
WO2010126618A1 (en) * 2009-04-30 2010-11-04 Armstrong World Industries, Inc. Uvv curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
US10350823B2 (en) 2015-12-22 2019-07-16 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
CN213006569U (zh) 2017-06-21 2021-04-20 卡本有限公司 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备
EP4491688A4 (en) * 2022-03-07 2025-07-09 Lg Chemical Ltd COMPOUND

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991416A (en) 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DK0956280T3 (da) * 1997-01-30 2003-02-24 Ciba Sc Holding Ag Ikke-flygtige phenylglyoxylsyreestere
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023203869A1 (ja) 2022-04-22 2023-10-26 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Also Published As

Publication number Publication date
KR100818643B1 (ko) 2008-04-04
EP1311627A2 (en) 2003-05-21
CN1211439C (zh) 2005-07-20
WO2002014439A3 (en) 2002-06-13
US7279200B2 (en) 2007-10-09
AU2001293732A1 (en) 2002-02-25
EP1311627B1 (en) 2007-04-25
US20030213931A1 (en) 2003-11-20
CN1447844A (zh) 2003-10-08
BR0113233A (pt) 2003-06-24
BR0113233B1 (pt) 2013-10-01
WO2002014439A2 (en) 2002-02-21
CA2417112A1 (en) 2002-02-21
KR20030055249A (ko) 2003-07-02
JP2004506776A (ja) 2004-03-04
DE60128105D1 (de) 2007-06-06
ATE360666T1 (de) 2007-05-15
DE60128105T8 (de) 2008-04-30
TWI244495B (en) 2005-12-01
MXPA03001383A (es) 2003-06-06
DE60128105T2 (de) 2007-12-27

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