DE60124674D1 - Heizelement für einen cvd-apparat - Google Patents
Heizelement für einen cvd-apparatInfo
- Publication number
- DE60124674D1 DE60124674D1 DE60124674T DE60124674T DE60124674D1 DE 60124674 D1 DE60124674 D1 DE 60124674D1 DE 60124674 T DE60124674 T DE 60124674T DE 60124674 T DE60124674 T DE 60124674T DE 60124674 D1 DE60124674 D1 DE 60124674D1
- Authority
- DE
- Germany
- Prior art keywords
- heating element
- space
- processing container
- connection part
- part area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000280375 | 2000-09-14 | ||
JP2000280375 | 2000-09-14 | ||
JP2001085326 | 2001-03-23 | ||
JP2001085326 | 2001-03-23 | ||
PCT/JP2001/007795 WO2002025712A1 (fr) | 2000-09-14 | 2001-09-07 | Dispositif de depot chimique en phase vapeur (cvd) a element chauffant |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60124674D1 true DE60124674D1 (de) | 2007-01-04 |
DE60124674T2 DE60124674T2 (de) | 2007-09-13 |
Family
ID=26600026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60124674T Expired - Lifetime DE60124674T2 (de) | 2000-09-14 | 2001-09-07 | Heizelement für einen cvd-apparat |
Country Status (6)
Country | Link |
---|---|
US (1) | US6593548B2 (de) |
EP (1) | EP1258914B1 (de) |
JP (1) | JP3780364B2 (de) |
AT (1) | ATE346378T1 (de) |
DE (1) | DE60124674T2 (de) |
WO (1) | WO2002025712A1 (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI245329B (en) * | 2001-11-14 | 2005-12-11 | Anelva Corp | Heating element CVD device and heating element CVD method using the same |
US20040045813A1 (en) * | 2002-09-03 | 2004-03-11 | Seiichiro Kanno | Wafer processing apparatus, wafer stage, and wafer processing method |
JP3787816B2 (ja) * | 2002-10-04 | 2006-06-21 | キヤノンアネルバ株式会社 | 発熱体cvd装置 |
US7300890B1 (en) * | 2003-07-17 | 2007-11-27 | Midwest Research Institute | Method and apparatus for forming conformal SiNx films |
TW200533780A (en) * | 2004-03-10 | 2005-10-16 | Ulvac Inc | Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor |
US8083853B2 (en) | 2004-05-12 | 2011-12-27 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser hole design |
US7125758B2 (en) | 2004-04-20 | 2006-10-24 | Applied Materials, Inc. | Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors |
US20050233092A1 (en) * | 2004-04-20 | 2005-10-20 | Applied Materials, Inc. | Method of controlling the uniformity of PECVD-deposited thin films |
US8328939B2 (en) | 2004-05-12 | 2012-12-11 | Applied Materials, Inc. | Diffuser plate with slit valve compensation |
US8074599B2 (en) | 2004-05-12 | 2011-12-13 | Applied Materials, Inc. | Plasma uniformity control by gas diffuser curvature |
US7429410B2 (en) | 2004-09-20 | 2008-09-30 | Applied Materials, Inc. | Diffuser gravity support |
JP4561308B2 (ja) * | 2004-10-21 | 2010-10-13 | 日立電線株式会社 | 発熱体cvd装置 |
KR100688836B1 (ko) * | 2005-05-11 | 2007-03-02 | 삼성에스디아이 주식회사 | 촉매 화학기상증착장치 |
KR100688838B1 (ko) * | 2005-05-13 | 2007-03-02 | 삼성에스디아이 주식회사 | 촉매 화학기상증착장치 및 촉매 화학기상증착방법 |
US7727590B2 (en) * | 2006-05-18 | 2010-06-01 | California Institute Of Technology | Robust filament assembly for a hot-wire chemical vapor deposition system |
US9157152B2 (en) * | 2007-03-29 | 2015-10-13 | Tokyo Electron Limited | Vapor deposition system |
JP4413947B2 (ja) * | 2007-06-21 | 2010-02-10 | 株式会社東芝 | 半導体装置の製造方法 |
US20080317973A1 (en) * | 2007-06-22 | 2008-12-25 | White John M | Diffuser support |
EP2186921A1 (de) * | 2008-11-13 | 2010-05-19 | Echerkon Technologies Ltd. | Heizdrahtanordnung zur Hitzdraht-Gasphasenabscheidung |
DE102009023471B4 (de) * | 2009-06-02 | 2012-08-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Beschichtungsanlage und -verfahren |
DE102009023472B4 (de) | 2009-06-02 | 2014-10-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Beschichtungsanlage und Beschichtungsverfahren |
EP2580368B1 (de) * | 2010-06-11 | 2015-11-18 | Tokyo Electron Limited | Vorrichtung zur steuerung einer chemischen dampfablagerung |
US8709537B2 (en) * | 2010-10-22 | 2014-04-29 | Applied Materials, Inc. | Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
TWI551711B (zh) * | 2010-11-24 | 2016-10-01 | 愛發科股份有限公司 | 薄膜形成裝置及薄膜形成裝置之清潔方法 |
US8662941B2 (en) | 2011-05-12 | 2014-03-04 | Applied Materials, Inc. | Wire holder and terminal connector for hot wire chemical vapor deposition chamber |
US20120312326A1 (en) * | 2011-06-10 | 2012-12-13 | Applied Materials, Inc. | Methods for cleaning a surface of a substrate using a hot wire chemical vapor deposition (hwcvd) chamber |
US9416450B2 (en) * | 2012-10-24 | 2016-08-16 | Applied Materials, Inc. | Showerhead designs of a hot wire chemical vapor deposition (HWCVD) chamber |
US9673042B2 (en) | 2015-09-01 | 2017-06-06 | Applied Materials, Inc. | Methods and apparatus for in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4223048A (en) * | 1978-08-07 | 1980-09-16 | Pacific Western Systems | Plasma enhanced chemical vapor processing of semiconductive wafers |
US5755886A (en) * | 1986-12-19 | 1998-05-26 | Applied Materials, Inc. | Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing |
JPH01162769A (ja) | 1987-12-18 | 1989-06-27 | Fujitsu Ltd | アモルファスシリコンの形成方法 |
US5124179A (en) * | 1990-09-13 | 1992-06-23 | Diamonex, Incorporated | Interrupted method for producing multilayered polycrystalline diamond films |
EP0506391B1 (de) * | 1991-03-26 | 2002-02-27 | Ngk Insulators, Ltd. | Verwendung eines Korrosion beständiger Substratshalter aus Aluminiumnitrid |
JP3215591B2 (ja) | 1995-02-10 | 2001-10-09 | 東京エレクトロン株式会社 | ガス処理装置 |
JPH08115882A (ja) | 1994-10-19 | 1996-05-07 | Fuji Electric Co Ltd | 非晶質半導体薄膜の成膜方法 |
JP3453214B2 (ja) * | 1995-03-15 | 2003-10-06 | 科学技術振興事業団 | 触媒cvd法による薄膜トランジスタの製造方法および薄膜トランジスタ |
JP2765622B2 (ja) * | 1995-08-23 | 1998-06-18 | 日本電気株式会社 | 選択シリコンエピタキシャル膜の成長方法 |
JP3737221B2 (ja) * | 1996-09-06 | 2006-01-18 | 英樹 松村 | 薄膜作成方法及び薄膜作成装置 |
US6040010A (en) * | 1996-09-10 | 2000-03-21 | Micron Technology, Inc. | Catalytic breakdown of reactant gases in chemical vapor deposition |
JP3132489B2 (ja) * | 1998-11-05 | 2001-02-05 | 日本電気株式会社 | 化学的気相成長装置及び薄膜成膜方法 |
JP2000303182A (ja) * | 1999-04-16 | 2000-10-31 | Anelva Corp | 化学蒸着装置 |
-
2001
- 2001-09-07 EP EP01963526A patent/EP1258914B1/de not_active Expired - Lifetime
- 2001-09-07 WO PCT/JP2001/007795 patent/WO2002025712A1/ja active IP Right Grant
- 2001-09-07 US US10/130,207 patent/US6593548B2/en not_active Expired - Lifetime
- 2001-09-07 AT AT01963526T patent/ATE346378T1/de not_active IP Right Cessation
- 2001-09-07 DE DE60124674T patent/DE60124674T2/de not_active Expired - Lifetime
- 2001-09-07 JP JP2002529825A patent/JP3780364B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1258914A1 (de) | 2002-11-20 |
US6593548B2 (en) | 2003-07-15 |
JP3780364B2 (ja) | 2006-05-31 |
US20020189545A1 (en) | 2002-12-19 |
JPWO2002025712A1 (ja) | 2004-01-29 |
EP1258914B1 (de) | 2006-11-22 |
DE60124674T2 (de) | 2007-09-13 |
EP1258914A4 (de) | 2004-10-27 |
WO2002025712A1 (fr) | 2002-03-28 |
ATE346378T1 (de) | 2006-12-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |