DE60117107T2 - Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung - Google Patents

Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung Download PDF

Info

Publication number
DE60117107T2
DE60117107T2 DE60117107T DE60117107T DE60117107T2 DE 60117107 T2 DE60117107 T2 DE 60117107T2 DE 60117107 T DE60117107 T DE 60117107T DE 60117107 T DE60117107 T DE 60117107T DE 60117107 T2 DE60117107 T2 DE 60117107T2
Authority
DE
Germany
Prior art keywords
wavelength
purge gas
gas
measuring means
interferometric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60117107T
Other languages
German (de)
English (en)
Other versions
DE60117107D1 (de
Inventor
Wouter Onno Pril
Philip Dennis Carlisle Henshaw
Engelbertus Antonius Franciscus Van De Pasch
Marcel Hendrikus Maria Beems
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60117107D1 publication Critical patent/DE60117107D1/de
Application granted granted Critical
Publication of DE60117107T2 publication Critical patent/DE60117107T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE60117107T 2000-07-14 2001-07-06 Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung Expired - Lifetime DE60117107T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP00306022 2000-07-14
EP00306022 2000-07-14
US29743201P 2001-06-13 2001-06-13
US297432P 2001-06-13

Publications (2)

Publication Number Publication Date
DE60117107D1 DE60117107D1 (de) 2006-04-20
DE60117107T2 true DE60117107T2 (de) 2006-10-05

Family

ID=26073240

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60117107T Expired - Lifetime DE60117107T2 (de) 2000-07-14 2001-07-06 Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung

Country Status (3)

Country Link
JP (1) JP4330291B2 (ko)
KR (1) KR100713193B1 (ko)
DE (1) DE60117107T2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI304157B (en) * 2002-11-27 2008-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG115613A1 (en) * 2003-02-12 2005-10-28 Asml Netherlands Bv Lithographic apparatus comprising a gas flushing system
WO2011016255A1 (ja) * 2009-08-07 2011-02-10 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
NL2008954A (en) * 2011-07-08 2013-01-09 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2013075878A1 (en) * 2011-11-22 2013-05-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2018470A (en) 2016-04-04 2017-10-12 Asml Netherlands Bv Patterning device cooling apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5559584A (en) 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JPH0982626A (ja) * 1995-09-12 1997-03-28 Nikon Corp 投影露光装置
JPH10340850A (ja) 1997-06-05 1998-12-22 Nikon Corp 露光装置

Also Published As

Publication number Publication date
KR100713193B1 (ko) 2007-05-02
DE60117107D1 (de) 2006-04-20
JP4330291B2 (ja) 2009-09-16
KR20020006591A (ko) 2002-01-23
JP2002110538A (ja) 2002-04-12

Similar Documents

Publication Publication Date Title
DE60218802T2 (de) Verfahren zur Herstellung einer Vorrichtung
DE60314484T2 (de) Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung
DE60223102T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1122608B1 (de) Projektionsbelichtungsanlage mit reflektivem Retikel
DE60302897T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60308161T2 (de) Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
DE602005001870T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung mit vorwärtsgekoppelter Fokussteuerung.
DE60120282T2 (de) Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit hergestellter Artikel
DE102006052015B4 (de) Positionsmessvorrichtung und Positionsabweichungsmessverfahren
DE60127050T2 (de) Lithographischer Projektionsapparat
DE602005003082T2 (de) Verfahren zur Herstellung einer Vorrichtung
DE602005001011T2 (de) Methode zur Bestimmung der Aberration eines Projektionssystems eines Lithographieapparats
DE60128975T2 (de) Mikrolithographischer Projektionsapparat
DE60120825T2 (de) Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung, sowie durch dieses Verfahren hergestellte Vorrichtung
DE60130348T2 (de) Lithographischer Apparat und Verfahren zur Herstellung einer integrierten Schaltungsanordnung
DE102016209616A1 (de) Verfahren und Vorrichtung zur Vorhersage des mit einer Maske bei Durchführung eines Lithographieprozesses erzielten Abbildungsergebnisses
DE602006000372T2 (de) Lithografisches Projektionsgerät und Verfahren zur Herstellung einer Vorrichtung
DE10360414A1 (de) EUV-Projektionsobjektiv sowie Verfahren zu dessen Herstellung
DE60117107T2 (de) Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikel, dabei erzeugter Artikel und Gaszusammensetzung
DE60218412T2 (de) Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und Computerprogramm dafür
DE60218414T2 (de) Verfahren zur Herstellung eines Artikels, dabei hergestellter Artikel und lithographischer Apparat dafür
EP3371656A1 (de) Verfahren und vorrichtung zur charakterisierung eines durch wenigstens einen lithographieschritt strukturierten wafers
DE102015209173A1 (de) Verfahren zum herstellen eines objektivs für eine lithographieanlage sowie messvorrichtung
DE60221318T2 (de) Lithographischer Apparat mit Spülgassystem
DE60127212T2 (de) Lithographischer Projektionsapparat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition