DE60036621D1 - Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten - Google Patents

Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten

Info

Publication number
DE60036621D1
DE60036621D1 DE60036621T DE60036621T DE60036621D1 DE 60036621 D1 DE60036621 D1 DE 60036621D1 DE 60036621 T DE60036621 T DE 60036621T DE 60036621 T DE60036621 T DE 60036621T DE 60036621 D1 DE60036621 D1 DE 60036621D1
Authority
DE
Germany
Prior art keywords
signal
improved
polarizer
thickness
modifications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60036621T
Other languages
English (en)
Other versions
DE60036621T2 (de
Inventor
Shao Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Inverness Medical Biostar Inc
Original Assignee
Asahi Kasei Corp
Inverness Medical Biostar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp, Inverness Medical Biostar Inc filed Critical Asahi Kasei Corp
Publication of DE60036621D1 publication Critical patent/DE60036621D1/de
Application granted granted Critical
Publication of DE60036621T2 publication Critical patent/DE60036621T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
DE60036621T 1999-08-06 2000-08-03 Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten Expired - Lifetime DE60036621T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14768299P 1999-08-06 1999-08-06
US147682P 1999-08-06
PCT/US2000/021437 WO2001011310A1 (en) 1999-08-06 2000-08-03 Instruments for analyzing binding assays based on attenuation of light by thin films

Publications (2)

Publication Number Publication Date
DE60036621D1 true DE60036621D1 (de) 2007-11-15
DE60036621T2 DE60036621T2 (de) 2008-06-26

Family

ID=22522484

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60036621T Expired - Lifetime DE60036621T2 (de) 1999-08-06 2000-08-03 Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten

Country Status (11)

Country Link
US (1) US6483585B1 (de)
EP (1) EP1200799B1 (de)
JP (2) JP3645523B2 (de)
KR (1) KR20020060155A (de)
CN (2) CN100504291C (de)
AT (1) ATE374923T1 (de)
AU (1) AU6623000A (de)
DE (1) DE60036621T2 (de)
HK (1) HK1043827A1 (de)
TW (1) TW464761B (de)
WO (1) WO2001011310A1 (de)

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US9060200B1 (en) 2004-08-11 2015-06-16 Visible World, Inc. System and method for digital program insertion in cable systems
JP4694179B2 (ja) * 2004-11-18 2011-06-08 株式会社トプコン 表面検査装置
US7342661B2 (en) * 2004-12-03 2008-03-11 Therma-Wave, Inc. Method for noise improvement in ellipsometers
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TWI331213B (en) * 2005-11-29 2010-10-01 Horiba Ltd Sample analyzing method, sample analyzing apparatus,and recording medium
CN108931509B (zh) 2005-12-21 2022-04-15 梅索斯卡莱科技公司 分析装置、方法和试剂
US7807448B2 (en) 2005-12-21 2010-10-05 Glezer Eli N Assay modules having assay reagents and methods of making and using same
CN101071261B (zh) * 2006-05-12 2010-05-26 鸿富锦精密工业（深圳）有限公司 红外截止滤光片镀膜面的检测方法
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US7659968B2 (en) * 2007-01-19 2010-02-09 Purdue Research Foundation System with extended range of molecular sensing through integrated multi-modal data acquisition
US7787126B2 (en) 2007-03-26 2010-08-31 Purdue Research Foundation Method and apparatus for conjugate quadrature interferometric detection of an immunoassay
NL1034311C2 (nl) * 2007-08-30 2009-03-03 Delbia B V Inrichting voor het door middel van ellipsometrie vaststellen van de concentratie van een in een oplossing aanwezige stof.
US9503691B2 (en) * 2008-02-19 2016-11-22 Time Warner Cable Enterprises Llc Methods and apparatus for enhanced advertising and promotional delivery in a network
JP5358822B2 (ja) * 2008-04-30 2013-12-04 大塚電子株式会社 状態測定装置および状態測定方法
JP2010104422A (ja) * 2008-10-28 2010-05-13 Fujifilm Corp 撮像システムおよび撮像方法
CN101441174B (zh) * 2008-12-17 2010-08-25 宁波大学 一种测量介质热光系数和热膨胀系数的装置及方法
CN102230986B (zh) * 2011-05-20 2013-10-09 北京航空航天大学 一种光学相位器件及其应用方法和系统
US9360302B2 (en) * 2011-12-15 2016-06-07 Kla-Tencor Corporation Film thickness monitor
KR101442792B1 (ko) * 2012-08-31 2014-09-23 (주)유텍시스템 사파이어 웨이퍼의 검사 방법
CN106706639B (zh) * 2016-12-19 2019-11-22 清华大学 一种通过扫描形貌测量全场实时氧化速率的方法
CN107782280B (zh) * 2017-10-20 2020-09-01 维沃移动通信有限公司 一种贴膜厚度的检测方法和移动终端
CN110132420B (zh) * 2018-02-09 2020-11-27 上海微电子装备（集团）股份有限公司 偏振测量装置、偏振测量方法及光配向方法
CN208477552U (zh) * 2018-04-01 2019-02-05 印芯科技股份有限公司 光学识别模块
US10996165B1 (en) * 2020-03-19 2021-05-04 The Boeing Company Apparatus and method for measuring UV coating effectiveness
US11686683B2 (en) 2020-04-30 2023-06-27 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for detecting contamination of thin-films
DE102021103455A1 (de) * 2020-04-30 2021-11-04 Taiwan Semiconductor Manufacturing Co., Ltd. System und verfahren zur erkennung der verunreinigung vondünnschichten
CN112180238A (zh) * 2020-09-25 2021-01-05 贵州航天计量测试技术研究所 一种基于液晶相变的集成电路内部短路失效定位方法

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Also Published As

Publication number Publication date
AU6623000A (en) 2001-03-05
CN1367870A (zh) 2002-09-04
CN1734230A (zh) 2006-02-15
KR20020060155A (ko) 2002-07-16
JP3645523B2 (ja) 2005-05-11
CN100504291C (zh) 2009-06-24
US6483585B1 (en) 2002-11-19
EP1200799B1 (de) 2007-10-03
JP2005049350A (ja) 2005-02-24
WO2001011310A1 (en) 2001-02-15
HK1043827A1 (zh) 2002-09-27
TW464761B (en) 2001-11-21
DE60036621T2 (de) 2008-06-26
CN1246664C (zh) 2006-03-22
ATE374923T1 (de) 2007-10-15
EP1200799A1 (de) 2002-05-02
JP2003506697A (ja) 2003-02-18

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8380 Miscellaneous part iii

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