ATE374923T1 - Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten - Google Patents

Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten

Info

Publication number
ATE374923T1
ATE374923T1 AT00953853T AT00953853T ATE374923T1 AT E374923 T1 ATE374923 T1 AT E374923T1 AT 00953853 T AT00953853 T AT 00953853T AT 00953853 T AT00953853 T AT 00953853T AT E374923 T1 ATE374923 T1 AT E374923T1
Authority
AT
Austria
Prior art keywords
signal
thin film
improved
polarizer
thickness
Prior art date
Application number
AT00953853T
Other languages
English (en)
Inventor
Shao Yang
Original Assignee
Inverness Medical Biostar Inc
Asahi Kasei Kabushiki Kaisha L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inverness Medical Biostar Inc, Asahi Kasei Kabushiki Kaisha L filed Critical Inverness Medical Biostar Inc
Application granted granted Critical
Publication of ATE374923T1 publication Critical patent/ATE374923T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
AT00953853T 1999-08-06 2000-08-03 Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten ATE374923T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14768299P 1999-08-06 1999-08-06

Publications (1)

Publication Number Publication Date
ATE374923T1 true ATE374923T1 (de) 2007-10-15

Family

ID=22522484

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00953853T ATE374923T1 (de) 1999-08-06 2000-08-03 Bindungsanalyseinstrumente basierend auf lichtabschwächung durch dünnschichten

Country Status (11)

Country Link
US (1) US6483585B1 (de)
EP (1) EP1200799B1 (de)
JP (2) JP3645523B2 (de)
KR (1) KR20020060155A (de)
CN (2) CN1246664C (de)
AT (1) ATE374923T1 (de)
AU (1) AU6623000A (de)
DE (1) DE60036621T2 (de)
HK (1) HK1043827A1 (de)
TW (1) TW464761B (de)
WO (1) WO2001011310A1 (de)

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US7342661B2 (en) * 2004-12-03 2008-03-11 Therma-Wave, Inc. Method for noise improvement in ellipsometers
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US7910356B2 (en) 2005-02-01 2011-03-22 Purdue Research Foundation Multiplexed biological analyzer planar array apparatus and methods
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WO2008089495A2 (en) * 2007-01-19 2008-07-24 Purdue Research Foundation System with extended range of molecular sensing through integrated multi-modal data acquisition
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US9503691B2 (en) * 2008-02-19 2016-11-22 Time Warner Cable Enterprises Llc Methods and apparatus for enhanced advertising and promotional delivery in a network
JP5358822B2 (ja) * 2008-04-30 2013-12-04 大塚電子株式会社 状態測定装置および状態測定方法
JP2010104422A (ja) * 2008-10-28 2010-05-13 Fujifilm Corp 撮像システムおよび撮像方法
CN101441174B (zh) * 2008-12-17 2010-08-25 宁波大学 一种测量介质热光系数和热膨胀系数的装置及方法
CN102230986B (zh) * 2011-05-20 2013-10-09 北京航空航天大学 一种光学相位器件及其应用方法和系统
US9360302B2 (en) * 2011-12-15 2016-06-07 Kla-Tencor Corporation Film thickness monitor
KR101442792B1 (ko) * 2012-08-31 2014-09-23 (주)유텍시스템 사파이어 웨이퍼의 검사 방법
CN106706639B (zh) * 2016-12-19 2019-11-22 清华大学 一种通过扫描形貌测量全场实时氧化速率的方法
CN107782280B (zh) * 2017-10-20 2020-09-01 维沃移动通信有限公司 一种贴膜厚度的检测方法和移动终端
CN110132420B (zh) * 2018-02-09 2020-11-27 上海微电子装备（集团）股份有限公司 偏振测量装置、偏振测量方法及光配向方法
CN208477552U (zh) * 2018-04-01 2019-02-05 印芯科技股份有限公司 光学识别模块
US10996165B1 (en) * 2020-03-19 2021-05-04 The Boeing Company Apparatus and method for measuring UV coating effectiveness
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US11686683B2 (en) 2020-04-30 2023-06-27 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for detecting contamination of thin-films
CN112180238A (zh) * 2020-09-25 2021-01-05 贵州航天计量测试技术研究所 一种基于液晶相变的集成电路内部短路失效定位方法
DE102022134504A1 (de) 2022-12-22 2024-06-27 Technische Universität Dresden, Körperschaft des öffentlichen Rechts Verfahren und gerät zur schichtdickenbestimmung histologischer schnittpräparate und konzentrationsbestimmung von biologischen substanzen in histologischen präparaten

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Also Published As

Publication number Publication date
EP1200799A1 (de) 2002-05-02
JP3645523B2 (ja) 2005-05-11
WO2001011310A1 (en) 2001-02-15
CN100504291C (zh) 2009-06-24
CN1246664C (zh) 2006-03-22
JP2005049350A (ja) 2005-02-24
HK1043827A1 (zh) 2002-09-27
CN1734230A (zh) 2006-02-15
US6483585B1 (en) 2002-11-19
EP1200799B1 (de) 2007-10-03
JP2003506697A (ja) 2003-02-18
DE60036621D1 (de) 2007-11-15
DE60036621T2 (de) 2008-06-26
TW464761B (en) 2001-11-21
AU6623000A (en) 2001-03-05
KR20020060155A (ko) 2002-07-16
CN1367870A (zh) 2002-09-04

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