DE60033907D1 - Lichtempfindliche Druckplatte und Verfahren zu ihrer Herstellung - Google Patents

Lichtempfindliche Druckplatte und Verfahren zu ihrer Herstellung

Info

Publication number
DE60033907D1
DE60033907D1 DE60033907T DE60033907T DE60033907D1 DE 60033907 D1 DE60033907 D1 DE 60033907D1 DE 60033907 T DE60033907 T DE 60033907T DE 60033907 T DE60033907 T DE 60033907T DE 60033907 D1 DE60033907 D1 DE 60033907D1
Authority
DE
Germany
Prior art keywords
preparation
printing plate
photosensitive printing
photosensitive
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60033907T
Other languages
English (en)
Other versions
DE60033907T2 (de
Inventor
Hirotaka Komine
Eiji Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Publication of DE60033907D1 publication Critical patent/DE60033907D1/de
Application granted granted Critical
Publication of DE60033907T2 publication Critical patent/DE60033907T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
DE60033907T 1999-11-08 2000-11-06 Lichtempfindliche Druckplatte und Verfahren zu ihrer Herstellung Expired - Fee Related DE60033907T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31740599 1999-11-08
JP31740599A JP4361651B2 (ja) 1999-11-08 1999-11-08 感光性印刷版およびその製造方法

Publications (2)

Publication Number Publication Date
DE60033907D1 true DE60033907D1 (de) 2007-04-26
DE60033907T2 DE60033907T2 (de) 2007-11-22

Family

ID=18087885

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60033907T Expired - Fee Related DE60033907T2 (de) 1999-11-08 2000-11-06 Lichtempfindliche Druckplatte und Verfahren zu ihrer Herstellung

Country Status (4)

Country Link
US (1) US6461784B1 (de)
EP (1) EP1098224B1 (de)
JP (1) JP4361651B2 (de)
DE (1) DE60033907T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6767693B1 (en) 2002-07-30 2004-07-27 Advanced Micro Devices, Inc. Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices
US6884735B1 (en) * 2002-08-21 2005-04-26 Advanced Micro Devices, Inc. Materials and methods for sublithographic patterning of gate structures in integrated circuit devices
JP6702251B2 (ja) * 2017-04-17 2020-05-27 信越化学工業株式会社 ポジ型レジストフィルム積層体及びパターン形成方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111102A (en) 1975-03-24 1976-10-01 Fuji Photo Film Co Ltd Photosensitive printing plates
GB1542131A (en) * 1975-02-19 1979-03-14 Fuji Photo Film Co Ltd Light-sensitive printing plate precursors and process for the production thereof
JPS5512974A (en) 1978-07-15 1980-01-29 Konishiroku Photo Ind Co Ltd Photosensitive printing plate
JPS5734558A (en) 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS5758152A (en) 1980-09-25 1982-04-07 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS57211146A (en) 1981-06-23 1982-12-24 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS58182636A (ja) 1982-04-20 1983-10-25 Fuji Photo Film Co Ltd 感光性印刷版
JPS60191262A (ja) * 1984-03-12 1985-09-28 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版の製造法
JPH04145437A (ja) * 1990-10-08 1992-05-19 Konica Corp 水無し平版の製造方法
DE4335425A1 (de) * 1993-10-18 1995-04-20 Hoechst Ag Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial
US5595862A (en) * 1995-02-01 1997-01-21 Eastman Kodak Company Photographic elements containing matte particles of bimodal size distribution
JPH08286380A (ja) * 1995-04-11 1996-11-01 Mitsubishi Chem Corp 感光性平版印刷版およびその製造方法
US5916741A (en) * 1997-08-26 1999-06-29 Eastman Kodak Company Photographic elements containing elastomeric matting agent

Also Published As

Publication number Publication date
JP4361651B2 (ja) 2009-11-11
EP1098224B1 (de) 2007-03-14
US6461784B1 (en) 2002-10-08
DE60033907T2 (de) 2007-11-22
JP2001133985A (ja) 2001-05-18
EP1098224A1 (de) 2001-05-09

Similar Documents

Publication Publication Date Title
DE69841948D1 (de) Lithographieplatte und Verfahren zu derer Herstellung
DE60024190D1 (de) Infrarotlaser-bebilderbare Flachdruckplatte und Verfahren zu ihrer Herstellung
DE69804876D1 (de) Flachdruckplatte
DE69833046D1 (de) Verfahren zur Herstellung einer lithographischen Druckplatte
DE60016863D1 (de) Wässrige Emulsion und Verfahren zu ihrer Herstellung
DE69800419T2 (de) Kapsel mit verlängerter Wirkstofffreisetzung und Verfahren zu ihrer Herstellung
DE69612333T2 (de) Druckvorrichtung und Verfahren zu ihrer Herstellung
DE69907742D1 (de) Flachdruckplatte sowie verfahren zu ihrer herstellung
DE69718066D1 (de) Drucker und Verfahren zu seiner Herstellung
DE60037564D1 (de) Trockentoner, Verfahren zu dessen Herstellung, Bildherstellungsverfahren
DE69815501D1 (de) Flachdruckplatte und verfahren zu deren herstellung
DE60010604D1 (de) Glänzende Oberflächenstruktur und Verfahren zu ihrer Herstellung
DE69905983D1 (de) Photoempfindliche Zusammensetzung, Verfahren zu ihrer Herstellung und Druckplattenmaterial
DE10082462T1 (de) Aufzeichnungsblatt und Verfahren zu dessen Herstellung
DE60025303D1 (de) Lithographischer Projektionsapparat
DE60108054D1 (de) Kautschukzusammensetzung und Verfahren zu ihrer Herstellung
DE60030204D1 (de) Lithographischer Projektionsapparat
DE69909711D1 (de) Lithographische Druckplattenvorstufe und lithographisches Verfahren
DE50108789D1 (de) Rasterwalze und Verfahren zu ihrer Herstellung und Wiederaufbereitung
DE60033907D1 (de) Lichtempfindliche Druckplatte und Verfahren zu ihrer Herstellung
DE50006207D1 (de) Druckplatte und Verfahren zu ihrer Herstellung
DE69706870T2 (de) Flachdruckplatten
DE60039095D1 (de) Taxolverbindung und Verfahren zu ihrer Herstellung
DE69519765D1 (de) Druckplatte und Verfahren zu deren Herstellung
DE69802868D1 (de) Schablonendruckverfahren und Vorrichtung sowie Schablone und Verfahren zu ihrer Herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee