DE60033269D1 - Vorrichtung und Verfahren zur Härtung von Silikonkautschuk - Google Patents

Vorrichtung und Verfahren zur Härtung von Silikonkautschuk

Info

Publication number
DE60033269D1
DE60033269D1 DE60033269T DE60033269T DE60033269D1 DE 60033269 D1 DE60033269 D1 DE 60033269D1 DE 60033269 T DE60033269 T DE 60033269T DE 60033269 T DE60033269 T DE 60033269T DE 60033269 D1 DE60033269 D1 DE 60033269D1
Authority
DE
Germany
Prior art keywords
silicone rubber
curing silicone
curing
rubber
silicone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60033269T
Other languages
English (en)
Inventor
Masanobu Sugimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Application granted granted Critical
Publication of DE60033269D1 publication Critical patent/DE60033269D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
DE60033269T 2000-02-21 2000-12-21 Vorrichtung und Verfahren zur Härtung von Silikonkautschuk Expired - Lifetime DE60033269D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000042293A JP3538707B2 (ja) 2000-02-21 2000-02-21 シリコーンゴム硬化方法および硬化装置

Publications (1)

Publication Number Publication Date
DE60033269D1 true DE60033269D1 (de) 2007-03-22

Family

ID=18565389

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60033269T Expired - Lifetime DE60033269D1 (de) 2000-02-21 2000-12-21 Vorrichtung und Verfahren zur Härtung von Silikonkautschuk

Country Status (6)

Country Link
US (1) US6440501B2 (de)
EP (1) EP1128551B1 (de)
JP (1) JP3538707B2 (de)
KR (1) KR100491868B1 (de)
CN (1) CN1309161C (de)
DE (1) DE60033269D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5548206A (en) * 1993-09-30 1996-08-20 National Semiconductor Corporation System and method for dual mode DC-DC power conversion
GB2383470B (en) * 2001-11-12 2004-04-28 Transense Technologies Plc Self contained radio apparatus for transmission of data
US7616637B1 (en) 2002-04-01 2009-11-10 Cisco Technology, Inc. Label switching in fibre channel networks
US7206288B2 (en) 2002-06-12 2007-04-17 Cisco Technology, Inc. Methods and apparatus for characterizing a route in fibre channel fabric
US7433326B2 (en) 2002-11-27 2008-10-07 Cisco Technology, Inc. Methods and devices for exchanging peer parameters between network devices
US7916628B2 (en) 2004-11-01 2011-03-29 Cisco Technology, Inc. Trunking for fabric ports in fibre channel switches and attached devices
KR100962516B1 (ko) * 2008-11-14 2010-06-14 이만석 도전성 실리콘을 사용한 전극의 절연 표면처리 방법
CN104070623B (zh) * 2013-08-01 2016-06-01 上海威宁整形制品有限公司 一种硅橡胶乳房假体外壳硫化设备
KR101689325B1 (ko) 2015-07-08 2016-12-23 주식회사 케이티 데이터 보안 방법 및 이를 위한 장치
RU2700037C1 (ru) * 2015-12-04 2019-09-12 Кистлер Холдинг Аг Устройство для измерения ускорения и способ изготовления такого устройства для измерения ускорения
CN108004899A (zh) * 2017-12-27 2018-05-08 翁毅 一种路面快速铺平系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3836388A (en) * 1972-10-18 1974-09-17 Western Electric Co Distributing a fluid evenly over the surface of an article
JPS6192026A (ja) * 1984-10-11 1986-05-10 Matsushita Electric Ind Co Ltd 表面波遅延線の遅延時間調整方法
JPS6196812A (ja) * 1984-10-17 1986-05-15 Murata Mfg Co Ltd 電子部品
JPH01228310A (ja) * 1988-03-09 1989-09-12 Murata Mfg Co Ltd 圧電共振子の製造方法
JPH01228311A (ja) 1988-03-09 1989-09-12 Murata Mfg Co Ltd 圧電共振子の製造方法
US4862827A (en) * 1988-06-28 1989-09-05 Wacker-Chemie Gmbh Apparatus for coating semiconductor components on a dielectric film
JPH04208414A (ja) * 1990-11-30 1992-07-30 Toto Ltd 人造大理石製造用遠赤外線硬化装置
US5240746A (en) * 1991-02-25 1993-08-31 Delco Electronics Corporation System for performing related operations on workpieces
JPH08252914A (ja) * 1995-03-15 1996-10-01 Seiko Epson Corp インクジェットヘッドおよびその製造方法
CA2230269C (en) * 1995-08-25 2001-04-24 Mitsui Chemicals, Incorporated Piezoelectric oscillator component, structure for supporting piezoelectric oscillator and method of mounting piezoelectric oscillator
JPH10154717A (ja) 1996-11-21 1998-06-09 Nec Eng Ltd 接着剤乾燥機構
US6323471B1 (en) * 1998-11-25 2001-11-27 Shunichi Yagi Microwave and far infrared heating under reduced pressure

Also Published As

Publication number Publication date
US20010016233A1 (en) 2001-08-23
US6440501B2 (en) 2002-08-27
CN1309161C (zh) 2007-04-04
JP2001232649A (ja) 2001-08-28
JP3538707B2 (ja) 2004-06-14
KR100491868B1 (ko) 2005-05-27
EP1128551A3 (de) 2003-12-10
CN1322058A (zh) 2001-11-14
KR20010083215A (ko) 2001-08-31
EP1128551B1 (de) 2007-02-07
EP1128551A2 (de) 2001-08-29

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Legal Events

Date Code Title Description
8332 No legal effect for de