DE60031899T2 - Verfahren zur Herstellung einer integrierten Sensormatrixanordung - Google Patents
Verfahren zur Herstellung einer integrierten Sensormatrixanordung Download PDFInfo
- Publication number
- DE60031899T2 DE60031899T2 DE60031899T DE60031899T DE60031899T2 DE 60031899 T2 DE60031899 T2 DE 60031899T2 DE 60031899 T DE60031899 T DE 60031899T DE 60031899 T DE60031899 T DE 60031899T DE 60031899 T2 DE60031899 T2 DE 60031899T2
- Authority
- DE
- Germany
- Prior art keywords
- mask
- protective layer
- openings
- shadow mask
- shadow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000011159 matrix material Substances 0.000 title 1
- 238000000034 method Methods 0.000 claims abstract description 35
- 230000008021 deposition Effects 0.000 claims abstract description 5
- 239000011241 protective layer Substances 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 230000005669 field effect Effects 0.000 claims description 7
- 238000011282 treatment Methods 0.000 claims 2
- 239000011253 protective coating Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 206010042618 Surgical procedure repeated Diseases 0.000 abstract 1
- 238000003491 array Methods 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 24
- 239000004065 semiconductor Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 210000001331 nose Anatomy 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Physical Vapour Deposition (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE9900239A SE523918C2 (sv) | 1999-01-25 | 1999-01-25 | Förfarande för framställning av integrerade sensorgrupper på ett gemensamt substrat samt en mask för användning vid förfarandet |
| SE9900239 | 1999-01-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60031899D1 DE60031899D1 (de) | 2007-01-04 |
| DE60031899T2 true DE60031899T2 (de) | 2007-06-21 |
Family
ID=20414232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60031899T Expired - Lifetime DE60031899T2 (de) | 1999-01-25 | 2000-01-24 | Verfahren zur Herstellung einer integrierten Sensormatrixanordung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6410445B1 (enExample) |
| EP (1) | EP1022561B1 (enExample) |
| JP (1) | JP4105355B2 (enExample) |
| AT (1) | ATE346290T1 (enExample) |
| DE (1) | DE60031899T2 (enExample) |
| SE (1) | SE523918C2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7232694B2 (en) * | 2004-09-28 | 2007-06-19 | Advantech Global, Ltd. | System and method for active array temperature sensing and cooling |
| JP5384752B2 (ja) * | 2010-12-27 | 2014-01-08 | シャープ株式会社 | 蒸着膜の形成方法及び表示装置の製造方法 |
| JP5384751B2 (ja) | 2010-12-27 | 2014-01-08 | シャープ株式会社 | 蒸着膜の形成方法及び表示装置の製造方法 |
| US8673791B2 (en) | 2012-05-25 | 2014-03-18 | International Business Machines Corporation | Method and apparatus for substrate-mask alignment |
| WO2024025475A1 (en) * | 2022-07-29 | 2024-02-01 | Ams-Osram Asia Pacific Pte. Ltd. | Method of manufacturing an optical device, and optical device |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2857251A (en) | 1953-01-28 | 1958-10-21 | Atlantic Refining Co | Process and dual-detector apparatus for analyzing gases |
| US3595621A (en) | 1968-09-30 | 1971-07-27 | Anthony John Andreatch | Catalytic analyzer |
| US4169126A (en) | 1976-09-03 | 1979-09-25 | Johnson, Matthey & Co., Limited | Temperature-responsive device |
| US4321322A (en) | 1979-06-18 | 1982-03-23 | Ahnell Joseph E | Pulsed voltammetric detection of microorganisms |
| DE3151891A1 (de) | 1981-12-30 | 1983-07-14 | Zimmer, Günter, Dr.rer. nat., 4600 Dortmund | Halbleiter-sensor fuer die messung der konzentration von teilchen in fluiden |
| CS231026B1 (en) | 1982-09-27 | 1984-09-17 | Lubomir Serak | Method of voltmetric determination of oxygen and sensor to perform this method |
| CH665908A5 (de) | 1983-08-30 | 1988-06-15 | Cerberus Ag | Vorrichtung zum selektiven detektieren der gasfoermigen bestandteile von gasgemischen in luft mittels eines gassensors. |
| US4897162A (en) | 1986-11-14 | 1990-01-30 | The Cleveland Clinic Foundation | Pulse voltammetry |
| DE3729286A1 (de) | 1987-09-02 | 1989-03-16 | Draegerwerk Ag | Messgeraet zur analyse eines gasgemisches |
| JPH0695082B2 (ja) | 1987-10-08 | 1994-11-24 | 新コスモス電機株式会社 | 吸引式オゾンガス検知器 |
| US4875083A (en) | 1987-10-26 | 1989-10-17 | North Carolina State University | Metal-insulator-semiconductor capacitor formed on silicon carbide |
| US5120421A (en) * | 1990-08-31 | 1992-06-09 | The United States Of America As Represented By The United States Department Of Energy | Electrochemical sensor/detector system and method |
| JPH0572163A (ja) | 1990-11-30 | 1993-03-23 | Mitsui Mining Co Ltd | 半導体式ガスセンサー |
| NL9002750A (nl) | 1990-12-13 | 1992-07-01 | Imec Inter Uni Micro Electr | Sensor van het diode type. |
| GB9114018D0 (en) * | 1991-06-28 | 1991-08-14 | Philips Electronic Associated | Thin-film transistor manufacture |
| JPH05240838A (ja) | 1992-02-27 | 1993-09-21 | Kagome Co Ltd | 加工飲食品に含まれるジアセチルの測定方法 |
| US5332681A (en) | 1992-06-12 | 1994-07-26 | The United States Of America As Represented By The Secretary Of The Navy | Method of making a semiconductor device by forming a nanochannel mask |
| US5285084A (en) | 1992-09-02 | 1994-02-08 | Kobe Steel Usa | Diamond schottky diodes and gas sensors fabricated therefrom |
| US5323022A (en) | 1992-09-10 | 1994-06-21 | North Carolina State University | Platinum ohmic contact to p-type silicon carbide |
| JP3266699B2 (ja) | 1993-06-22 | 2002-03-18 | 株式会社日立製作所 | 触媒の評価方法及び触媒効率制御方法ならびにＮＯｘ浄化触媒評価装置 |
| JP3496307B2 (ja) | 1994-02-18 | 2004-02-09 | 株式会社デンソー | 触媒劣化検知法及び空燃比センサ |
| SE503265C2 (sv) | 1994-09-23 | 1996-04-29 | Forskarpatent Ab | Förfarande och anordning för gasdetektion |
| WO1997021094A1 (en) * | 1995-12-01 | 1997-06-12 | Innogenetics N.V. | Impedimetric detection system and method of production thereof |
| US5691215A (en) | 1996-08-26 | 1997-11-25 | Industrial Technology Research Institute | Method for fabricating a sub-half micron MOSFET device with insulator filled shallow trenches planarized via use of negative photoresist and de-focus exposure |
| SE524102C2 (sv) | 1999-06-04 | 2004-06-29 | Appliedsensor Sweden Ab | Mikro-hotplate-anordning med integrerad gaskänslig fälteffektsensor |
-
1999
- 1999-01-25 SE SE9900239A patent/SE523918C2/sv not_active IP Right Cessation
-
2000
- 2000-01-24 AT AT00850013T patent/ATE346290T1/de not_active IP Right Cessation
- 2000-01-24 EP EP00850013A patent/EP1022561B1/en not_active Expired - Lifetime
- 2000-01-24 JP JP2000014955A patent/JP4105355B2/ja not_active Expired - Fee Related
- 2000-01-24 DE DE60031899T patent/DE60031899T2/de not_active Expired - Lifetime
- 2000-01-25 US US09/491,020 patent/US6410445B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| SE523918C2 (sv) | 2004-06-01 |
| JP4105355B2 (ja) | 2008-06-25 |
| EP1022561A3 (en) | 2004-10-20 |
| JP2000221161A (ja) | 2000-08-11 |
| US6410445B1 (en) | 2002-06-25 |
| EP1022561A2 (en) | 2000-07-26 |
| SE9900239L (enExample) | 2000-07-26 |
| EP1022561B1 (en) | 2006-11-22 |
| SE9900239D0 (sv) | 1999-01-25 |
| ATE346290T1 (de) | 2006-12-15 |
| DE60031899D1 (de) | 2007-01-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |