DE60017626D1 - Dendritische Polymere und deren Herstellung - Google Patents

Dendritische Polymere und deren Herstellung

Info

Publication number
DE60017626D1
DE60017626D1 DE60017626T DE60017626T DE60017626D1 DE 60017626 D1 DE60017626 D1 DE 60017626D1 DE 60017626 T DE60017626 T DE 60017626T DE 60017626 T DE60017626 T DE 60017626T DE 60017626 D1 DE60017626 D1 DE 60017626D1
Authority
DE
Germany
Prior art keywords
preparation
dendritic polymers
dendritic
polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60017626T
Other languages
English (en)
Other versions
DE60017626T2 (de
Inventor
Osamu Watanabe
Takanobu Takeda
Jun Hatakeyama
Tomohiro Kobayashi
Toshinobu Ishihara
Jun Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE60017626D1 publication Critical patent/DE60017626D1/de
Publication of DE60017626T2 publication Critical patent/DE60017626T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B19/00—Slide fasteners
    • A44B19/10—Slide fasteners with a one-piece interlocking member on each stringer tape
    • A44B19/12—Interlocking member in the shape of a continuous helix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE60017626T 1999-03-26 2000-03-27 Dendritische Polymere und deren Herstellung Expired - Lifetime DE60017626T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8288499 1999-03-26
JP8288499 1999-03-26

Publications (2)

Publication Number Publication Date
DE60017626D1 true DE60017626D1 (de) 2005-03-03
DE60017626T2 DE60017626T2 (de) 2005-12-22

Family

ID=13786710

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60017626T Expired - Lifetime DE60017626T2 (de) 1999-03-26 2000-03-27 Dendritische Polymere und deren Herstellung

Country Status (5)

Country Link
US (1) US6414101B1 (de)
EP (1) EP1038890B1 (de)
KR (1) KR100503192B1 (de)
DE (1) DE60017626T2 (de)
TW (1) TWI226339B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1471111B1 (de) * 2002-01-31 2010-12-15 DIC Corporation Styrolharzzusammensetzung und herstellungsverfahren dafür
KR100814315B1 (ko) * 2003-11-26 2008-03-18 닛뽕소다 가부시키가이샤 신규한 다분기 고분자
KR20060132620A (ko) * 2003-12-22 2006-12-21 라이온 가부시키가이샤 고분기 폴리머 및 그 제조 방법, 및 이러한 고분기폴리머를 함유하는 레지스트 조성물
CN100503666C (zh) * 2003-12-22 2009-06-24 狮王株式会社 超支化聚合物及其制造方法、以及含有该超支化聚合物的抗蚀剂组合物
US7662538B2 (en) * 2004-11-08 2010-02-16 Du Pont Electronic Polymers L.P. Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
CN101133090B (zh) * 2005-03-03 2011-01-26 国立大学法人东京工业大学 超支化聚合物及其制造方法
US7771913B2 (en) * 2006-04-04 2010-08-10 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process using the same
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US20080008956A1 (en) * 2006-06-23 2008-01-10 Eastman Kodak Company Positive-working imageable members with branched hydroxystyrene polymers
WO2008029806A1 (fr) * 2006-09-07 2008-03-13 Nissan Chemical Industries, Ltd. Polymère hyperramifié et son procédé de production
TWI331611B (en) * 2006-11-23 2010-10-11 Ind Tech Res Inst Mononuclear star-branched polymer dielectric material and organic thin film transistor
US20080268839A1 (en) * 2007-04-27 2008-10-30 Ayers John I Reducing a number of registration termination massages in a network for cellular devices
JP4466881B2 (ja) * 2007-06-06 2010-05-26 信越化学工業株式会社 フォトマスクブランク、レジストパターンの形成方法、及びフォトマスクの製造方法
US11331392B2 (en) 2014-12-04 2022-05-17 The Trustees Of Columbia University In The City Of New York Biodegradable thermo-responsive polymers and uses thereof

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518495A (en) 1978-07-24 1980-02-08 Rohm & Haas Method of manufacturing polymer composition and polymer bead
JPS6030686B2 (ja) 1980-08-30 1985-07-18 丸善石油株式会社 パラヒドロキシスチレン重合体の製造方法
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4603101A (en) 1985-09-27 1986-07-29 General Electric Company Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
EP0249139B2 (de) 1986-06-13 1998-03-11 MicroSi, Inc. (a Delaware corporation) Lackzusammensetzung und -anwendung
JPS6336602A (ja) 1986-07-31 1988-02-17 Nippon Telegr & Teleph Corp <Ntt> アンテナ融雪装置
JP2578646B2 (ja) 1988-07-18 1997-02-05 三洋電機株式会社 非水系二次電池
JPH03223858A (ja) 1990-01-30 1991-10-02 Matsushita Electric Ind Co Ltd パターン形成方法
JP2970879B2 (ja) 1990-01-30 1999-11-02 和光純薬工業株式会社 化学増幅型レジスト材料
US5252435A (en) 1990-01-30 1993-10-12 Matsushita Electric Industrial Co., Ltd. Method for forming pattern
DE69100978T2 (de) 1990-06-14 1994-08-04 Sekisui Chemical Co Ltd Verfahren zur Herstellung von Sternverbindungen.
HUT64986A (en) 1990-06-29 1994-03-28 Hoechst Celanese Corp Process for the production of polymers and copolymers with low optical density for use as photoresisting material
US5239015A (en) 1990-06-29 1993-08-24 Hoechst Celanese Corporation Process for making low optical density polymers and copolymers for photoresists and optical applications
EP0496405A1 (de) 1991-01-25 1992-07-29 Mitsubishi Kasei Corporation Poröser Harz und Verfahren zu seiner Herstellung
JPH06266105A (ja) 1993-03-17 1994-09-22 Fujitsu Ltd ネガ型レジスト組成物
US5587441A (en) * 1994-11-08 1996-12-24 Cornell Research Foundation, Inc. Hyperbranched polymers from AB monomers
US5591809A (en) * 1995-08-18 1997-01-07 Hoechst Celanese Corporation Process for preparing hyperbranched polymers
JP3591672B2 (ja) 1996-02-05 2004-11-24 富士写真フイルム株式会社 ポジ型感光性組成物
KR100607384B1 (ko) 1997-09-22 2006-08-02 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 내식막 조성물의 제조방법
US6252025B1 (en) * 1998-08-11 2001-06-26 Eastman Kodak Company Vinyl hyperbranched polymer with photographically useful end groups

Also Published As

Publication number Publication date
DE60017626T2 (de) 2005-12-22
KR100503192B1 (ko) 2005-07-25
KR20000076960A (ko) 2000-12-26
EP1038890A1 (de) 2000-09-27
EP1038890B1 (de) 2005-01-26
TWI226339B (en) 2005-01-11
US6414101B1 (en) 2002-07-02

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