DE50200433D1 - Bearbeitung von inhomogenen Materialien - Google Patents

Bearbeitung von inhomogenen Materialien

Info

Publication number
DE50200433D1
DE50200433D1 DE50200433T DE50200433T DE50200433D1 DE 50200433 D1 DE50200433 D1 DE 50200433D1 DE 50200433 T DE50200433 T DE 50200433T DE 50200433 T DE50200433 T DE 50200433T DE 50200433 D1 DE50200433 D1 DE 50200433D1
Authority
DE
Germany
Prior art keywords
processing
glass
ceramic
inhomogeneous materials
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50200433T
Other languages
English (en)
Inventor
Dipl-Phys Kegeler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Priority to DE50200433T priority Critical patent/DE50200433D1/de
Application granted granted Critical
Publication of DE50200433D1 publication Critical patent/DE50200433D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/015—Temperature control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Glass Compositions (AREA)
DE50200433T 2001-11-02 2002-10-26 Bearbeitung von inhomogenen Materialien Expired - Lifetime DE50200433D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50200433T DE50200433D1 (de) 2001-11-02 2002-10-26 Bearbeitung von inhomogenen Materialien

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10154050A DE10154050A1 (de) 2001-11-02 2001-11-02 Bearbeitung von inhomogenen Materialien
DE50200433T DE50200433D1 (de) 2001-11-02 2002-10-26 Bearbeitung von inhomogenen Materialien

Publications (1)

Publication Number Publication Date
DE50200433D1 true DE50200433D1 (de) 2004-06-17

Family

ID=7704521

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10154050A Withdrawn DE10154050A1 (de) 2001-11-02 2001-11-02 Bearbeitung von inhomogenen Materialien
DE50200433T Expired - Lifetime DE50200433D1 (de) 2001-11-02 2002-10-26 Bearbeitung von inhomogenen Materialien

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10154050A Withdrawn DE10154050A1 (de) 2001-11-02 2001-11-02 Bearbeitung von inhomogenen Materialien

Country Status (5)

Country Link
US (1) US6875079B2 (de)
EP (1) EP1308242B1 (de)
JP (1) JP4406531B2 (de)
AT (1) ATE266500T1 (de)
DE (2) DE10154050A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8602845B2 (en) * 2011-09-23 2013-12-10 United Technologies Corporation Strengthening by machining
US10183376B1 (en) * 2015-10-20 2019-01-22 Seagate Technology Llc Carrier for mounting a bar of sliders or a stack of such bars to be lapped

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0592363A (ja) * 1991-02-20 1993-04-16 Hitachi Ltd 基板の両面同時研磨加工方法と加工装置及びそれを用いた磁気デイスク基板の研磨加工方法と磁気デイスクの製造方法並びに磁気デイスク
US5658183A (en) * 1993-08-25 1997-08-19 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including optical monitoring
US5508235A (en) * 1994-07-06 1996-04-16 Schott Glass Technologies, Inc. Cladding glass ceramic for use in high powered lasers
JP2736869B2 (ja) * 1994-11-16 1998-04-02 株式会社オハラ 磁気ディスク基板の製造方法
US5742026A (en) * 1995-06-26 1998-04-21 Corning Incorporated Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation
WO1997016826A1 (en) * 1995-11-03 1997-05-09 Seagate Technology, Inc. Sputtered thermally cycled texture layers formed of high melting point materials
US5691256A (en) * 1995-12-28 1997-11-25 Yamamura Glass Co., Ltd. Glass composition for magnetic disk substrates and magnetic disk substrate
US5873769A (en) * 1997-05-30 1999-02-23 Industrial Technology Research Institute Temperature compensated chemical mechanical polishing to achieve uniform removal rates
DE19737849A1 (de) * 1997-08-29 1999-03-11 Siemens Ag Vorrichtung und Verfahren zum Beheizen eines flüssigen oder zähflüssigen Poliermittels sowie Vorrichtung zum Polieren von Wafern
JP3467184B2 (ja) * 1998-02-05 2003-11-17 信越半導体株式会社 ワークの研磨方法
US6315635B1 (en) * 1999-03-31 2001-11-13 Taiwan Semiconductor Manufacturing Company, Ltd Method and apparatus for slurry temperature control in a polishing process
US6458018B1 (en) * 1999-04-23 2002-10-01 3M Innovative Properties Company Abrasive article suitable for abrading glass and glass ceramic workpieces
US6077151A (en) * 1999-05-17 2000-06-20 Vlsi Technology, Inc. Temperature control carrier head for chemical mechanical polishing process

Also Published As

Publication number Publication date
US6875079B2 (en) 2005-04-05
JP2003176155A (ja) 2003-06-24
JP4406531B2 (ja) 2010-01-27
EP1308242B1 (de) 2004-05-12
EP1308242A1 (de) 2003-05-07
ATE266500T1 (de) 2004-05-15
US20030087591A1 (en) 2003-05-08
DE10154050A1 (de) 2003-05-15

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: SCHOTT AG, 55122 MAINZ, DE

8364 No opposition during term of opposition