DE4026494C2 - - Google Patents

Info

Publication number
DE4026494C2
DE4026494C2 DE4026494A DE4026494A DE4026494C2 DE 4026494 C2 DE4026494 C2 DE 4026494C2 DE 4026494 A DE4026494 A DE 4026494A DE 4026494 A DE4026494 A DE 4026494A DE 4026494 C2 DE4026494 C2 DE 4026494C2
Authority
DE
Germany
Prior art keywords
cathode
anode
evaporation
arc
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE4026494A
Other languages
German (de)
English (en)
Other versions
DE4026494A1 (de
Inventor
Horst Dipl.-Phys. Dr. 4270 Dorsten De Ehrich
Michael Dipl.-Phys. 4600 Dortmund De Mausbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Original Assignee
Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH filed Critical Plasco Dr Ehrich Plasma-Coating 6501 Heidesheim De GmbH
Priority to DE4042337A priority Critical patent/DE4042337C1/de
Priority to DE4026494A priority patent/DE4026494A1/de
Priority to PCT/EP1991/001446 priority patent/WO1992003841A2/de
Priority to AU82911/91A priority patent/AU8291191A/en
Publication of DE4026494A1 publication Critical patent/DE4026494A1/de
Application granted granted Critical
Publication of DE4026494C2 publication Critical patent/DE4026494C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE4026494A 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren Granted DE4026494A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
PCT/EP1991/001446 WO1992003841A2 (de) 1990-08-22 1991-08-01 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
AU82911/91A AU8291191A (en) 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4026494A DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren

Publications (2)

Publication Number Publication Date
DE4026494A1 DE4026494A1 (de) 1992-02-27
DE4026494C2 true DE4026494C2 (ko) 1992-05-21

Family

ID=39523631

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4026494A Granted DE4026494A1 (de) 1990-08-22 1990-08-22 Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
DE4042337A Expired - Lifetime DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE4042337A Expired - Lifetime DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them

Country Status (3)

Country Link
AU (1) AU8291191A (ko)
DE (2) DE4026494A1 (ko)
WO (1) WO1992003841A2 (ko)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4444763A1 (de) * 1994-12-19 1996-06-27 Apvv Angewandte Plasma Vakuum Elektrode zur Materialverdampfung für die Beschichtung von Substraten
DE19521419A1 (de) * 1995-06-14 1996-12-19 Plasma Applikation Mbh Ges Verdampfereinheit zur Verdampfung von Materialien im elektrischen Vakuumbogen
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6279505B1 (en) 1997-03-14 2001-08-28 The Coca-Cola Company Plastic containers with an external gas barrier coating
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6982119B2 (en) 2002-04-15 2006-01-03 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4200429A1 (de) * 1992-01-10 1993-07-15 Ehrich Plasma Coating Verfahren zur ionisation thermisch erzeugter materialdaempfe und vorrichtung zur durchfuehrung des verfahrens
DE4203371C1 (ko) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
DE4409761B4 (de) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma
DE19600993A1 (de) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
ATE256762T1 (de) * 1999-11-17 2004-01-15 Applied Films Gmbh & Co Kg Elektrodenanordnung
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
DE102020124270A1 (de) 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren und Vorrichtung zur anodischen Bogenverdampfung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1496697A (fr) * 1965-10-20 1967-09-29 Gen Precision Inc Appareil de revêtement de la surface d'un substrat
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4197157A (en) * 1975-03-19 1980-04-08 Arthur D. Little, Inc. Method for forming refractory tubing
GB2106545B (en) * 1981-02-23 1985-06-26 Rimma Ivanovna Stupak Consumable cathode for electric-arc evaporator of metal
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
DE3239131A1 (de) * 1982-10-22 1984-04-26 Ulrich 8950 Kaufbeuren Goetz Verfahren zur thermischen verdampfung von metallen im vakuum
DE3413891C2 (de) * 1984-04-12 1987-01-08 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
DE3829260A1 (de) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasmabeschichtungskammer mit entfernbarem schutzschirm
JPH06149358A (ja) * 1992-11-13 1994-05-27 Matsushita Electric Works Ltd 移動ロボット

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4444763A1 (de) * 1994-12-19 1996-06-27 Apvv Angewandte Plasma Vakuum Elektrode zur Materialverdampfung für die Beschichtung von Substraten
DE19521419A1 (de) * 1995-06-14 1996-12-19 Plasma Applikation Mbh Ges Verdampfereinheit zur Verdampfung von Materialien im elektrischen Vakuumbogen
US6279505B1 (en) 1997-03-14 2001-08-28 The Coca-Cola Company Plastic containers with an external gas barrier coating
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6808753B2 (en) 2000-08-24 2004-10-26 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6811826B2 (en) 2000-08-24 2004-11-02 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same
US6982119B2 (en) 2002-04-15 2006-01-03 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith

Also Published As

Publication number Publication date
WO1992003841A3 (de) 1992-04-16
DE4026494A1 (de) 1992-02-27
WO1992003841A2 (de) 1992-03-05
DE4042337C1 (en) 1991-09-12
AU8291191A (en) 1992-03-17

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