DE3887810D1 - Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen. - Google Patents
Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen.Info
- Publication number
- DE3887810D1 DE3887810D1 DE88117110T DE3887810T DE3887810D1 DE 3887810 D1 DE3887810 D1 DE 3887810D1 DE 88117110 T DE88117110 T DE 88117110T DE 3887810 T DE3887810 T DE 3887810T DE 3887810 D1 DE3887810 D1 DE 3887810D1
- Authority
- DE
- Germany
- Prior art keywords
- image formation
- formation method
- secondary electrons
- electrons emitted
- emitted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62259208A JPH01102841A (ja) | 1987-10-14 | 1987-10-14 | 画像形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3887810D1 true DE3887810D1 (de) | 1994-03-24 |
DE3887810T2 DE3887810T2 (de) | 1994-07-14 |
Family
ID=17330893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3887810T Expired - Fee Related DE3887810T2 (de) | 1987-10-14 | 1988-10-14 | Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4894540A (de) |
EP (1) | EP0312082B1 (de) |
JP (1) | JPH01102841A (de) |
KR (1) | KR920002370B1 (de) |
DE (1) | DE3887810T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2602287B2 (ja) * | 1988-07-01 | 1997-04-23 | 株式会社日立製作所 | X線マスクの欠陥検査方法及びその装置 |
US5065147A (en) * | 1989-05-17 | 1991-11-12 | Hewlett-Packard Company | Method and apparatus for simulating analog display in digital display test instrument |
JP2707346B2 (ja) * | 1990-01-12 | 1998-01-28 | 富士写真フイルム株式会社 | 放射線画像情報読取装置 |
JP2768548B2 (ja) * | 1990-11-09 | 1998-06-25 | シャープ株式会社 | パネルディスプレイ表示装置 |
NL9100076A (nl) * | 1991-01-17 | 1992-08-17 | Philips Nv | Methode voor automatische uitlijning van een elektronenmicroscoop en een elektronenmicroscoop geschikt voor uitvoering van een dergelijke methode. |
US5212383A (en) * | 1991-07-29 | 1993-05-18 | David Scharf | Color synthesizing scanning electron microscope |
US5757516A (en) * | 1993-01-11 | 1998-05-26 | Canon Inc. | Noise quenching method and apparatus for a colour display system |
JP2980789B2 (ja) * | 1993-05-06 | 1999-11-22 | 株式会社東芝 | パターン寸法測定装置及びその方法 |
JPH07122624A (ja) * | 1993-10-28 | 1995-05-12 | Nec Corp | ウェハのプリアライメント装置 |
JP3230911B2 (ja) * | 1993-11-04 | 2001-11-19 | 株式会社日立製作所 | 走査電子顕微鏡及びその画像形成方法 |
US5821915A (en) * | 1995-10-11 | 1998-10-13 | Hewlett-Packard Company | Method and apparatus for removing artifacts from scanned halftone images |
US6212292B1 (en) * | 1998-07-08 | 2001-04-03 | California Institute Of Technology | Creating an image of an object with an optical microscope |
US6353222B1 (en) | 1998-09-03 | 2002-03-05 | Applied Materials, Inc. | Determining defect depth and contour information in wafer structures using multiple SEM images |
US6538249B1 (en) * | 1999-07-09 | 2003-03-25 | Hitachi, Ltd. | Image-formation apparatus using charged particle beams under various focus conditions |
US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
WO2002045153A1 (en) * | 2000-12-01 | 2002-06-06 | Ebara Corporation | Inspection method and apparatus using electron beam, and device production method using it |
TWI494824B (zh) * | 2010-08-24 | 2015-08-01 | Quanta Comp Inc | 光學觸控系統及方法 |
US8669524B2 (en) * | 2010-10-25 | 2014-03-11 | The Reseach Foundation of State University of New York | Scanning incremental focus microscopy |
CN113759412B (zh) * | 2020-06-03 | 2023-08-22 | 上海联影医疗科技股份有限公司 | 获取束流形状和能量探测单元响应特征的方法、装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS568140A (en) * | 1979-07-02 | 1981-01-27 | Dainippon Screen Mfg Co Ltd | Emphasizing method of sharpness in image scanning and recording apparatus |
DE3016655C2 (de) * | 1980-04-30 | 1983-12-15 | Günter Hermann Dipl.-Ing. 4544 Ladbergen Heeke | Verfahren zur Ortsfrequenzfilterung von Bildern |
JPS57208132A (en) * | 1981-06-17 | 1982-12-21 | Toshiba Corp | Electron-beam exposure apparatus |
JPS59112217A (ja) * | 1982-11-29 | 1984-06-28 | Toshiba Corp | 寸法測定方法 |
DE3470225D1 (en) * | 1983-04-14 | 1988-05-05 | Siemens Ag | Method of reproducing electrical barrier layers (pn-junctions) in semiconductors by processing induced corpuscular beam signals within a scanning corpuscular microscope |
US4719456A (en) * | 1985-03-08 | 1988-01-12 | Standard Microsystems Corporation | Video dot intensity balancer |
JPH069061B2 (ja) * | 1986-03-26 | 1994-02-02 | 富士写真フイルム株式会社 | 画像デ−タの平滑化方法 |
US4768156A (en) * | 1986-05-06 | 1988-08-30 | The United States Of America As Represented By The Secretary Of The Navy | Imaging system |
-
1987
- 1987-10-14 JP JP62259208A patent/JPH01102841A/ja active Granted
-
1988
- 1988-10-14 EP EP88117110A patent/EP0312082B1/de not_active Expired - Lifetime
- 1988-10-14 US US07/257,557 patent/US4894540A/en not_active Expired - Lifetime
- 1988-10-14 DE DE3887810T patent/DE3887810T2/de not_active Expired - Fee Related
- 1988-10-14 KR KR1019880013430A patent/KR920002370B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0312082A3 (en) | 1990-01-31 |
US4894540A (en) | 1990-01-16 |
KR890007052A (ko) | 1989-06-17 |
JPH01102841A (ja) | 1989-04-20 |
EP0312082A2 (de) | 1989-04-19 |
KR920002370B1 (ko) | 1992-03-23 |
JPH0550094B2 (de) | 1993-07-28 |
EP0312082B1 (de) | 1994-02-16 |
DE3887810T2 (de) | 1994-07-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |