DE3887810D1 - Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen. - Google Patents

Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen.

Info

Publication number
DE3887810D1
DE3887810D1 DE88117110T DE3887810T DE3887810D1 DE 3887810 D1 DE3887810 D1 DE 3887810D1 DE 88117110 T DE88117110 T DE 88117110T DE 3887810 T DE3887810 T DE 3887810T DE 3887810 D1 DE3887810 D1 DE 3887810D1
Authority
DE
Germany
Prior art keywords
image formation
formation method
secondary electrons
electrons emitted
emitted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88117110T
Other languages
English (en)
Other versions
DE3887810T2 (de
Inventor
Fumio Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE3887810D1 publication Critical patent/DE3887810D1/de
Application granted granted Critical
Publication of DE3887810T2 publication Critical patent/DE3887810T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
DE3887810T 1987-10-14 1988-10-14 Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen. Expired - Fee Related DE3887810T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62259208A JPH01102841A (ja) 1987-10-14 1987-10-14 画像形成方法

Publications (2)

Publication Number Publication Date
DE3887810D1 true DE3887810D1 (de) 1994-03-24
DE3887810T2 DE3887810T2 (de) 1994-07-14

Family

ID=17330893

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3887810T Expired - Fee Related DE3887810T2 (de) 1987-10-14 1988-10-14 Verfahren zur Bildherstellung durch Verwendung der vom Objekt emittierten Sekundärelektronen.

Country Status (5)

Country Link
US (1) US4894540A (de)
EP (1) EP0312082B1 (de)
JP (1) JPH01102841A (de)
KR (1) KR920002370B1 (de)
DE (1) DE3887810T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2602287B2 (ja) * 1988-07-01 1997-04-23 株式会社日立製作所 X線マスクの欠陥検査方法及びその装置
US5065147A (en) * 1989-05-17 1991-11-12 Hewlett-Packard Company Method and apparatus for simulating analog display in digital display test instrument
JP2707346B2 (ja) * 1990-01-12 1998-01-28 富士写真フイルム株式会社 放射線画像情報読取装置
JP2768548B2 (ja) * 1990-11-09 1998-06-25 シャープ株式会社 パネルディスプレイ表示装置
NL9100076A (nl) * 1991-01-17 1992-08-17 Philips Nv Methode voor automatische uitlijning van een elektronenmicroscoop en een elektronenmicroscoop geschikt voor uitvoering van een dergelijke methode.
US5212383A (en) * 1991-07-29 1993-05-18 David Scharf Color synthesizing scanning electron microscope
US5757516A (en) * 1993-01-11 1998-05-26 Canon Inc. Noise quenching method and apparatus for a colour display system
JP2980789B2 (ja) * 1993-05-06 1999-11-22 株式会社東芝 パターン寸法測定装置及びその方法
JPH07122624A (ja) * 1993-10-28 1995-05-12 Nec Corp ウェハのプリアライメント装置
JP3230911B2 (ja) * 1993-11-04 2001-11-19 株式会社日立製作所 走査電子顕微鏡及びその画像形成方法
US5821915A (en) * 1995-10-11 1998-10-13 Hewlett-Packard Company Method and apparatus for removing artifacts from scanned halftone images
US6212292B1 (en) * 1998-07-08 2001-04-03 California Institute Of Technology Creating an image of an object with an optical microscope
US6353222B1 (en) 1998-09-03 2002-03-05 Applied Materials, Inc. Determining defect depth and contour information in wafer structures using multiple SEM images
US6538249B1 (en) * 1999-07-09 2003-03-25 Hitachi, Ltd. Image-formation apparatus using charged particle beams under various focus conditions
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
WO2002045153A1 (en) * 2000-12-01 2002-06-06 Ebara Corporation Inspection method and apparatus using electron beam, and device production method using it
TWI494824B (zh) * 2010-08-24 2015-08-01 Quanta Comp Inc 光學觸控系統及方法
US8669524B2 (en) * 2010-10-25 2014-03-11 The Reseach Foundation of State University of New York Scanning incremental focus microscopy
CN113759412B (zh) * 2020-06-03 2023-08-22 上海联影医疗科技股份有限公司 获取束流形状和能量探测单元响应特征的方法、装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS568140A (en) * 1979-07-02 1981-01-27 Dainippon Screen Mfg Co Ltd Emphasizing method of sharpness in image scanning and recording apparatus
DE3016655C2 (de) * 1980-04-30 1983-12-15 Günter Hermann Dipl.-Ing. 4544 Ladbergen Heeke Verfahren zur Ortsfrequenzfilterung von Bildern
JPS57208132A (en) * 1981-06-17 1982-12-21 Toshiba Corp Electron-beam exposure apparatus
JPS59112217A (ja) * 1982-11-29 1984-06-28 Toshiba Corp 寸法測定方法
DE3470225D1 (en) * 1983-04-14 1988-05-05 Siemens Ag Method of reproducing electrical barrier layers (pn-junctions) in semiconductors by processing induced corpuscular beam signals within a scanning corpuscular microscope
US4719456A (en) * 1985-03-08 1988-01-12 Standard Microsystems Corporation Video dot intensity balancer
JPH069061B2 (ja) * 1986-03-26 1994-02-02 富士写真フイルム株式会社 画像デ−タの平滑化方法
US4768156A (en) * 1986-05-06 1988-08-30 The United States Of America As Represented By The Secretary Of The Navy Imaging system

Also Published As

Publication number Publication date
EP0312082A3 (en) 1990-01-31
US4894540A (en) 1990-01-16
KR890007052A (ko) 1989-06-17
JPH01102841A (ja) 1989-04-20
EP0312082A2 (de) 1989-04-19
KR920002370B1 (ko) 1992-03-23
JPH0550094B2 (de) 1993-07-28
EP0312082B1 (de) 1994-02-16
DE3887810T2 (de) 1994-07-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee