DE3879278D1 - - Google Patents

Info

Publication number
DE3879278D1
DE3879278D1 DE88810347T DE3879278T DE3879278D1 DE 3879278 D1 DE3879278 D1 DE 3879278D1 DE 88810347 T DE88810347 T DE 88810347T DE 3879278 T DE3879278 T DE 3879278T DE 3879278 D1 DE3879278 D1 DE 3879278D1
Authority
DE
Germany
Prior art keywords
acid
anion
arene
unsubstituted
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE88810347T
Other languages
German (de)
English (en)
Inventor
Dr. Kurt Ch-4102 Binningen Ch Meier
Dr. Roger Pierre-Elie W-7858 Weil Am Rhein De Salvin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE3879278D1 publication Critical patent/DE3879278D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Road Signs Or Road Markings (AREA)
DE88810347T 1987-06-05 1988-05-30 Expired - Lifetime DE3879278D1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH214787 1987-06-05

Publications (1)

Publication Number Publication Date
DE3879278D1 true DE3879278D1 (enExample) 1993-04-22

Family

ID=4226968

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88810347T Expired - Lifetime DE3879278D1 (enExample) 1987-06-05 1988-05-30

Country Status (8)

Country Link
US (3) US4957946A (enExample)
EP (1) EP0294333B1 (enExample)
JP (1) JP2724720B2 (enExample)
AT (1) ATE87105T1 (enExample)
BR (1) BR8802717A (enExample)
CA (1) CA1316930C (enExample)
DE (1) DE3879278D1 (enExample)
ES (1) ES2039691T3 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE87105T1 (de) * 1987-06-05 1993-04-15 Ciba Geigy Ag Kationisch polymerisierbare gemische enthaltend ausgewaehlte haerter.
DE3888400D1 (de) * 1987-06-12 1994-04-21 Ciba Geigy Photoresistzusammensetzungen.
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2775880B2 (ja) * 1989-08-21 1998-07-16 ブラザー工業株式会社 転写記録媒体
JPH055006A (ja) * 1990-11-16 1993-01-14 Nippon Kayaku Co Ltd カチオン重合性有機材料組成物および当該組成物の安定化法
TW224108B (enExample) * 1992-05-06 1994-05-21 Ciba Geigy
US7316833B1 (en) 1993-06-24 2008-01-08 Penchiney Emballage Flexible Europe Multi-layer thermoplastic films and packages made therefrom
DE69433089T2 (de) 1993-06-24 2004-06-17 American National Can Co., Chicago Mehrschichtige strukturen aus single-site katalysierten polymeren
ES2134425T3 (es) * 1994-03-16 1999-10-01 Ciba Sc Holding Ag Sistemas de resina epoxidica de un solo componente para el procedimiento de goteo y el procedimiento de inmersion por rotacion en caliente.
US5670590A (en) * 1994-05-06 1997-09-23 Minnesota Mining And Manufacturing Company Energy polymerizable compositions, homopolymers and copolymers of oxazolines
US6140432A (en) * 1995-07-13 2000-10-31 Exxon Chemical Patents Inc. Polymerization catalyst systems, their production and use
US6124230A (en) * 1995-07-13 2000-09-26 Exxon Chemical Patents, Inc. Polymerization catalyst systems, their production and use
CA2187046A1 (fr) * 1996-10-03 1998-04-03 Alain Vallee Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
KR20010079826A (ko) * 1998-10-22 2001-08-22 베르너 훽스트, 지크프리트 포트호프 경화성 에폭시 수지 조성물
KR100345092B1 (ko) * 1999-03-08 2002-07-24 교도 인사쯔 가부시키가이샤 감광성 수지 조성물, 패턴 형성방법, 착색 화상 형성용감광액 및 컬러 필터
RU2297877C2 (ru) 2001-06-13 2007-04-27 Энерджи Энд Энвиронментал Интернэшнл, Л.К. Реакторы для полимеризации в объеме и способы такой полимеризации
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US7393627B2 (en) * 2004-03-16 2008-07-01 Cornell Research Foundation, Inc. Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
US20060234159A1 (en) * 2005-04-19 2006-10-19 Nitto Denko Corporation Photosensitive epoxy resin adhesive composition and use thereof
WO2007124092A2 (en) * 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US8163461B2 (en) * 2008-04-09 2012-04-24 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
JP6460672B2 (ja) * 2013-09-18 2019-01-30 キヤノン株式会社 膜の製造方法、光学部品の製造方法、回路基板の製造方法及び電子部品の製造方法
JP6195552B2 (ja) * 2014-02-21 2017-09-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
EP0094915B1 (de) * 1982-05-19 1987-01-21 Ciba-Geigy Ag Härtbare, Metallocenkomplexe enthaltende Zusammensetzungen, daraus erhältliche aktivierte Vorstufen und deren Verwendung
US5089536A (en) * 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
US5073476A (en) * 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
EP0152377B1 (de) * 1984-02-10 1987-12-09 Ciba-Geigy Ag Härtbare Zusammensetzung und deren Verwendung
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
CH678897A5 (enExample) * 1986-05-10 1991-11-15 Ciba Geigy Ag
EP0265373B1 (de) * 1986-09-19 1991-03-13 Ciba-Geigy Ag Verfahren zur Härtung von Polyisocyanat-Beschichtungen
ATE87105T1 (de) * 1987-06-05 1993-04-15 Ciba Geigy Ag Kationisch polymerisierbare gemische enthaltend ausgewaehlte haerter.
DE3888400D1 (de) * 1987-06-12 1994-04-21 Ciba Geigy Photoresistzusammensetzungen.
JP2001132614A (ja) * 1999-11-11 2001-05-18 Naoyoshi Hosoda 風力発電装置

Also Published As

Publication number Publication date
ES2039691T3 (es) 1993-10-01
EP0294333A3 (en) 1989-03-15
JPS63312360A (ja) 1988-12-20
EP0294333A2 (de) 1988-12-07
CA1316930C (en) 1993-04-27
ATE87105T1 (de) 1993-04-15
US5371259A (en) 1994-12-06
BR8802717A (pt) 1988-12-27
EP0294333B1 (de) 1993-03-17
JP2724720B2 (ja) 1998-03-09
US5565500A (en) 1996-10-15
US4957946A (en) 1990-09-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CIBA SPECIALTY CHEMICALS HOLDING INC., BASEL, CH

8327 Change in the person/name/address of the patent owner

Owner name: VANTICO AG, BASEL, CH