DE3856357T2 - Filme aus oxydischen Supraleitern mit hohem Tc - Google Patents
Filme aus oxydischen Supraleitern mit hohem TcInfo
- Publication number
- DE3856357T2 DE3856357T2 DE3856357T DE3856357T DE3856357T2 DE 3856357 T2 DE3856357 T2 DE 3856357T2 DE 3856357 T DE3856357 T DE 3856357T DE 3856357 T DE3856357 T DE 3856357T DE 3856357 T2 DE3856357 T2 DE 3856357T2
- Authority
- DE
- Germany
- Prior art keywords
- films
- film
- superconducting
- rare earth
- superconductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
- 239000002887 superconductor Substances 0.000 title claims description 36
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 239000000203 mixture Substances 0.000 claims abstract description 25
- 229910052788 barium Inorganic materials 0.000 claims abstract description 16
- 229910000314 transition metal oxide Inorganic materials 0.000 claims abstract description 14
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 12
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 17
- 229910052746 lanthanum Inorganic materials 0.000 claims description 9
- 229910052706 scandium Inorganic materials 0.000 claims description 4
- 230000007704 transition Effects 0.000 claims description 3
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 abstract description 39
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 36
- 239000001301 oxygen Substances 0.000 abstract description 36
- 229910052751 metal Inorganic materials 0.000 abstract description 33
- 239000002184 metal Substances 0.000 abstract description 32
- 238000000137 annealing Methods 0.000 abstract description 21
- 150000002739 metals Chemical class 0.000 abstract description 18
- 229910052761 rare earth metal Inorganic materials 0.000 abstract description 17
- 229910052802 copper Inorganic materials 0.000 abstract description 10
- 229910052723 transition metal Inorganic materials 0.000 abstract description 9
- 150000003624 transition metals Chemical class 0.000 abstract description 8
- 230000008021 deposition Effects 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 229910052720 vanadium Inorganic materials 0.000 abstract description 2
- 230000002411 adverse Effects 0.000 abstract 1
- 238000005137 deposition process Methods 0.000 abstract 1
- 238000010583 slow cooling Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 139
- 238000000034 method Methods 0.000 description 22
- 239000010949 copper Substances 0.000 description 13
- 239000005751 Copper oxide Substances 0.000 description 11
- 229910000431 copper oxide Inorganic materials 0.000 description 11
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910007052 Li—Ti—O Inorganic materials 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000006557 surface reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052566 spinel group Inorganic materials 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/80—Constructional details
- H10N60/85—Superconducting active materials
- H10N60/855—Ceramic superconductors
- H10N60/857—Ceramic superconductors comprising copper oxide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/93—Electric superconducting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/701—Coated or thin film device, i.e. active or passive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/701—Coated or thin film device, i.e. active or passive
- Y10S505/702—Josephson junction present
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
- Y10S505/732—Evaporative coating with superconducting material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/742—Annealing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US2758487A | 1987-03-18 | 1987-03-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3856357D1 DE3856357D1 (de) | 1999-09-09 |
| DE3856357T2 true DE3856357T2 (de) | 2000-02-24 |
Family
ID=21838570
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3856357T Revoked DE3856357T2 (de) | 1987-03-18 | 1988-03-04 | Filme aus oxydischen Supraleitern mit hohem Tc |
| DE3855305T Expired - Fee Related DE3855305T3 (de) | 1987-03-18 | 1988-03-04 | Schichten von Supraleiteroxyden mit hohem Tc und Verfahren zu deren Herstellung |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3855305T Expired - Fee Related DE3855305T3 (de) | 1987-03-18 | 1988-03-04 | Schichten von Supraleiteroxyden mit hohem Tc und Verfahren zu deren Herstellung |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US5447906A (OSRAM) |
| EP (2) | EP0662724B1 (OSRAM) |
| JP (1) | JP2711253B2 (OSRAM) |
| AT (2) | ATE138501T1 (OSRAM) |
| CA (1) | CA1335954C (OSRAM) |
| DE (2) | DE3856357T2 (OSRAM) |
| ES (1) | ES2134370T3 (OSRAM) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5204318A (en) * | 1987-03-27 | 1993-04-20 | Massachusetts Institute Of Technology | Preparation of superconducting oxides and oxide-metal composites |
| CA1332324C (en) * | 1987-03-30 | 1994-10-11 | Jun Shioya | Method for producing thin film of oxide superconductor |
| JPH0753638B2 (ja) * | 1987-03-30 | 1995-06-07 | 住友電気工業株式会社 | 超電導薄膜の形成方法 |
| JPH0778000B2 (ja) * | 1987-03-31 | 1995-08-23 | 住友電気工業株式会社 | 酸化物超電導薄膜の製造方法 |
| JPS63244529A (ja) * | 1987-03-30 | 1988-10-12 | Sumitomo Electric Ind Ltd | 超電導薄膜の形成方法 |
| JP2702711B2 (ja) * | 1987-04-13 | 1998-01-26 | 松下電器産業株式会社 | 薄膜超電導体の製造方法 |
| FR2625614A1 (fr) * | 1987-05-22 | 1989-07-07 | Massachusetts Inst Technology | Pellicules minces d'oxydes supraconducteurs |
| DE3886586T2 (de) * | 1987-05-26 | 1994-04-28 | Sumitomo Electric Industries | Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Mischoxid. |
| DE3815185A1 (de) * | 1987-08-05 | 1989-02-16 | Siemens Ag | Verfahren zur herstellung einer hybridstruktur mit halbleitendem und supraleitendem material |
| KR910007382B1 (ko) * | 1987-08-07 | 1991-09-25 | 가부시기가이샤 히다찌세이사꾸쇼 | 초전도 재료 및 초전도 박막의 제조방법 |
| US4914080A (en) * | 1988-01-27 | 1990-04-03 | Fujitsu Limited | Method for fabricating superconductive film |
| US8309118B2 (en) * | 2001-09-28 | 2012-11-13 | Mcneil-Ppc, Inc. | Film forming compositions containing sucralose |
| EP1422313A1 (de) | 2002-11-05 | 2004-05-26 | Theva Dünnschichttechnik GmbH | Vorrichtung und Verfahren zum Aufdampfen eines Beschichtungsmaterials im Vakuum mit kontinuierlicher Materialnachführung |
| US20050159298A1 (en) * | 2004-01-16 | 2005-07-21 | American Superconductor Corporation | Oxide films with nanodot flux pinning centers |
| CN100564312C (zh) * | 2004-12-23 | 2009-12-02 | 超导技术公司 | (RE)Ba2Cu3O7-δ薄膜超导体的RF性质优化的组成 |
| US8954125B2 (en) | 2011-07-28 | 2015-02-10 | International Business Machines Corporation | Low-loss superconducting devices |
| CA3012494C (en) * | 2016-02-08 | 2022-09-20 | Thunder Bay Regional Health Research Institute | Amorphous lead oxide based energy detection devices and methods of manufacture thereof |
| US10472555B2 (en) | 2016-04-08 | 2019-11-12 | Schlumberger Technology Corporation | Polymer gel for water control applications |
| CN115485422B (zh) * | 2020-05-20 | 2024-07-02 | Hrl实验室有限责任公司 | 在硅衬底上生长通过结晶光学膜氢化而在红外光谱中可选地具有极小光损耗的结晶光学膜的方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4316785A (en) * | 1979-11-05 | 1982-02-23 | Nippon Telegraph & Telephone Public Corporation | Oxide superconductor Josephson junction and fabrication method therefor |
| JPS60173885A (ja) * | 1984-02-18 | 1985-09-07 | Nippon Telegr & Teleph Corp <Ntt> | 酸化物超伝導材料およびその製造方法 |
| JPS6161556A (ja) * | 1984-08-31 | 1986-03-29 | Norinosuke Kojima | ダイアル式電話機利用の自動通報装置 |
| JPS6161555A (ja) * | 1984-08-31 | 1986-03-29 | Norinosuke Kojima | ダイアル式電話機利用の自動通報方法 |
| US6638894B1 (en) * | 1987-01-09 | 2003-10-28 | Lucent Technologies Inc. | Devices and systems based on novel superconducting material |
| US5151406A (en) * | 1987-02-26 | 1992-09-29 | Sumitomo Electric Industries, Ltd. | Laminated superconductor |
| JP2567386B2 (ja) * | 1987-02-26 | 1996-12-25 | 住友電気工業株式会社 | 超電導導体 |
| JP2645489B2 (ja) * | 1987-03-12 | 1997-08-25 | 株式会社 半導体エネルギー研究所 | 超電導体の作製方法 |
| DE3854626T2 (de) * | 1987-03-12 | 1996-07-04 | Semiconductor Energy Lab | Verfahren zur Herstellung von Komponenten aus supraleitenden oxidkeramischen Materialien. |
| JPS63241823A (ja) * | 1987-03-27 | 1988-10-07 | Nissin Electric Co Ltd | 超電導薄膜の製造方法 |
| CA1332324C (en) * | 1987-03-30 | 1994-10-11 | Jun Shioya | Method for producing thin film of oxide superconductor |
-
1988
- 1988-01-20 JP JP63008600A patent/JP2711253B2/ja not_active Expired - Fee Related
- 1988-02-29 CA CA000560149A patent/CA1335954C/en not_active Expired - Fee Related
- 1988-03-04 DE DE3856357T patent/DE3856357T2/de not_active Revoked
- 1988-03-04 DE DE3855305T patent/DE3855305T3/de not_active Expired - Fee Related
- 1988-03-04 AT AT88103367T patent/ATE138501T1/de not_active IP Right Cessation
- 1988-03-04 EP EP95104274A patent/EP0662724B1/en not_active Revoked
- 1988-03-04 ES ES95104274T patent/ES2134370T3/es not_active Expired - Lifetime
- 1988-03-04 EP EP88103367A patent/EP0282839B2/en not_active Expired - Lifetime
- 1988-03-04 AT AT95104274T patent/ATE183021T1/de not_active IP Right Cessation
-
1994
- 1994-06-23 US US08/264,227 patent/US5447906A/en not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/478,296 patent/US5863869A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0662724B1 (en) | 1999-08-04 |
| US5447906A (en) | 1995-09-05 |
| JP2711253B2 (ja) | 1998-02-10 |
| EP0282839B2 (en) | 2005-03-09 |
| EP0282839B1 (en) | 1996-05-22 |
| DE3855305T2 (de) | 1996-12-05 |
| CA1335954C (en) | 1995-06-20 |
| EP0662724A2 (en) | 1995-07-12 |
| ATE183021T1 (de) | 1999-08-15 |
| EP0282839A2 (en) | 1988-09-21 |
| JPS63237313A (ja) | 1988-10-03 |
| EP0282839A3 (en) | 1990-07-25 |
| ATE138501T1 (de) | 1996-06-15 |
| US5863869A (en) | 1999-01-26 |
| DE3856357D1 (de) | 1999-09-09 |
| DE3855305D1 (de) | 1996-06-27 |
| DE3855305T3 (de) | 2005-10-06 |
| EP0662724A3 (OSRAM) | 1995-08-09 |
| ES2134370T3 (es) | 1999-10-01 |
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