DE3855843T2 - Elektronenstrahl-Analysegerät - Google Patents

Elektronenstrahl-Analysegerät

Info

Publication number
DE3855843T2
DE3855843T2 DE3855843T DE3855843T DE3855843T2 DE 3855843 T2 DE3855843 T2 DE 3855843T2 DE 3855843 T DE3855843 T DE 3855843T DE 3855843 T DE3855843 T DE 3855843T DE 3855843 T2 DE3855843 T2 DE 3855843T2
Authority
DE
Germany
Prior art keywords
electron beam
beam analyzer
analyzer
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3855843T
Other languages
English (en)
Other versions
DE3855843D1 (de
Inventor
Yoshitsugu Tsutsumi
Shinjiro Ueda
Tadashi Otaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3855843D1 publication Critical patent/DE3855843D1/de
Publication of DE3855843T2 publication Critical patent/DE3855843T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
DE3855843T 1987-12-23 1988-12-20 Elektronenstrahl-Analysegerät Expired - Fee Related DE3855843T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62324009A JP2607572B2 (ja) 1987-12-23 1987-12-23 荷電粒子を用いる分析装置および方法

Publications (2)

Publication Number Publication Date
DE3855843D1 DE3855843D1 (de) 1997-04-30
DE3855843T2 true DE3855843T2 (de) 1997-11-06

Family

ID=18161110

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3855843T Expired - Fee Related DE3855843T2 (de) 1987-12-23 1988-12-20 Elektronenstrahl-Analysegerät

Country Status (4)

Country Link
US (1) US4889995A (de)
EP (1) EP0321925B1 (de)
JP (1) JP2607572B2 (de)
DE (1) DE3855843T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016114983A1 (de) * 2016-08-12 2018-02-15 Pfeiffer Vacuum Gmbh Vakuumsystem
DE112015006315B4 (de) 2015-04-15 2021-09-23 Hitachi High-Tech Corporation Ladungsteilchenstrahleinrichtung und Evakuierungsverfahren dafür

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348759A (ja) * 1989-07-18 1991-03-01 Nec Corp 蛍光ｘ線分析装置
DE4136950A1 (de) * 1991-11-11 1993-05-13 Pfeiffer Vakuumtechnik Mehrstufiges vakuumpumpsystem
DE10032607B4 (de) * 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
EP1515359A1 (de) * 2003-09-12 2005-03-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Kammer mit geringer durch Elektronen stimulierter Desorption
GB0322889D0 (en) * 2003-09-30 2003-10-29 Boc Group Plc Vacuum pump
US7112803B2 (en) * 2004-07-23 2006-09-26 Applied Materials, Israel, Ltd. Beam directing system and method for use in a charged particle beam column
JP5016988B2 (ja) * 2007-06-19 2012-09-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびその真空立上げ方法
US8987664B2 (en) * 2013-02-07 2015-03-24 Shimadzu Corporation Mass spectrometry device
JP6207344B2 (ja) * 2013-10-30 2017-10-04 日本電子株式会社 荷電粒子線装置
US10204761B2 (en) * 2014-10-09 2019-02-12 Hitachi High-Technologies Corporation Charged particle beam device, electron microscope and sample observation method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3385102A (en) * 1966-04-21 1968-05-28 Nat Res Corp Rapid cycle leak detection of plural test pieces
NL7010108A (de) * 1969-09-30 1971-04-01
JPH0732133B2 (ja) * 1987-05-19 1995-04-10 株式会社日立製作所 半導体製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112015006315B4 (de) 2015-04-15 2021-09-23 Hitachi High-Tech Corporation Ladungsteilchenstrahleinrichtung und Evakuierungsverfahren dafür
DE102016114983A1 (de) * 2016-08-12 2018-02-15 Pfeiffer Vacuum Gmbh Vakuumsystem

Also Published As

Publication number Publication date
EP0321925A2 (de) 1989-06-28
EP0321925A3 (de) 1990-04-11
EP0321925B1 (de) 1997-03-26
JP2607572B2 (ja) 1997-05-07
DE3855843D1 (de) 1997-04-30
JPH01166457A (ja) 1989-06-30
US4889995A (en) 1989-12-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee