DE3853263T2 - Verfahren zur Herstellung von Leiterbahnen aus Supraleitern mit hoher kritischer Temperatur. - Google Patents

Verfahren zur Herstellung von Leiterbahnen aus Supraleitern mit hoher kritischer Temperatur.

Info

Publication number
DE3853263T2
DE3853263T2 DE3853263T DE3853263T DE3853263T2 DE 3853263 T2 DE3853263 T2 DE 3853263T2 DE 3853263 T DE3853263 T DE 3853263T DE 3853263 T DE3853263 T DE 3853263T DE 3853263 T2 DE3853263 T2 DE 3853263T2
Authority
DE
Germany
Prior art keywords
superconductors
production
critical temperature
conductor tracks
high critical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3853263T
Other languages
English (en)
Other versions
DE3853263D1 (de
Inventor
Arunara Gupta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3853263D1 publication Critical patent/DE3853263D1/de
Publication of DE3853263T2 publication Critical patent/DE3853263T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0324—Processes for depositing or forming copper oxide superconductor layers from a solution
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/737—From inorganic salt precursors, e.g. nitrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Electron Beam Exposure (AREA)
  • Recrystallisation Techniques (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DE3853263T 1987-11-18 1988-09-01 Verfahren zur Herstellung von Leiterbahnen aus Supraleitern mit hoher kritischer Temperatur. Expired - Fee Related DE3853263T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/121,982 US4997809A (en) 1987-11-18 1987-11-18 Fabrication of patterned lines of high Tc superconductors

Publications (2)

Publication Number Publication Date
DE3853263D1 DE3853263D1 (de) 1995-04-13
DE3853263T2 true DE3853263T2 (de) 1995-09-14

Family

ID=22399870

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3853263T Expired - Fee Related DE3853263T2 (de) 1987-11-18 1988-09-01 Verfahren zur Herstellung von Leiterbahnen aus Supraleitern mit hoher kritischer Temperatur.

Country Status (5)

Country Link
US (1) US4997809A (de)
EP (1) EP0317495B1 (de)
JP (1) JPH0682869B2 (de)
CA (1) CA1335438C (de)
DE (1) DE3853263T2 (de)

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JPS63250881A (ja) * 1987-04-07 1988-10-18 Semiconductor Energy Lab Co Ltd 超電導体の作製方法
US5198412A (en) * 1987-06-26 1993-03-30 Hewlett-Packard Company Method for making superconductor films
EP0310248B1 (de) * 1987-09-30 1992-03-25 General Motors Corporation Dünnschicht-Supraleiterstrukturierung durch fokussierte Strahlentechniken
US6056994A (en) * 1988-12-27 2000-05-02 Symetrix Corporation Liquid deposition methods of fabricating layered superlattice materials
JP2965641B2 (ja) * 1989-08-21 1999-10-18 松下電器産業株式会社 超伝導素子の製造方法
WO1991011031A1 (en) * 1990-01-16 1991-07-25 E.I. Du Pont De Nemours And Company Processes for making thin films and circuit elements of high temperature superconductors
JPH0446082A (ja) * 1990-06-13 1992-02-17 Sumitomo Electric Ind Ltd 高品質酸化物超電導薄膜の作製方法
US5786306A (en) * 1990-06-22 1998-07-28 Massachusetts Institute Of Technology Synthesis of high TC superconducting coatings and patterns by melt writing and oxidation of metallic precursor alloys
DE69210523T2 (de) * 1991-08-28 1997-01-02 Sumitomo Electric Industries Verfahren zur Herstellung von supraleitenden Schichten aus supraleitendem Oxyd in denen nicht-supraleitende Gebiete vorkommen und Verfahren zur Herstellung eines Bauelements welches solche Schichten enthält
US5238913A (en) * 1992-03-30 1993-08-24 The United States Of America As Represented By The United States Department Of Energy Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials
US5273788A (en) * 1992-07-20 1993-12-28 The University Of Utah Preparation of diamond and diamond-like thin films
EP0847314B1 (de) * 1996-04-17 1999-12-15 Koninklijke Philips Electronics N.V. Verfahren zur herstellung einer gesinterten struktur auf einem substrat
US6261938B1 (en) 1997-02-12 2001-07-17 Quantiscript, Inc. Fabrication of sub-micron etch-resistant metal/semiconductor structures using resistless electron beam lithography
CA2197400C (en) * 1997-02-12 2004-08-24 Universite De Sherbrooke Fabrication of sub-micron silicide structures on silicon using resistless electron beam lithography
US7108894B2 (en) * 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US7294366B2 (en) * 1998-09-30 2007-11-13 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
US7938079B2 (en) * 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US8110247B2 (en) * 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US20040197493A1 (en) * 1998-09-30 2004-10-07 Optomec Design Company Apparatus, methods and precision spray processes for direct write and maskless mesoscale material deposition
US20050156991A1 (en) * 1998-09-30 2005-07-21 Optomec Design Company Maskless direct write of copper using an annular aerosol jet
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
DE60115891T2 (de) * 2000-06-13 2006-06-14 Element Six Pty Ltd Verbunddiamantkörper
AU2002241771A1 (en) * 2000-10-23 2002-06-11 The Trustees Of Columbia University In The City Of New York Thick film high temperature superconducting device supporting high critical currents and method for fabricating same
WO2005039814A2 (en) * 2003-09-26 2005-05-06 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
JP4666575B2 (ja) * 2004-11-08 2011-04-06 東京エレクトロン株式会社 セラミック溶射部材の製造方法、該方法を実行するためのプログラム、記憶媒体、及びセラミック溶射部材
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US20080013299A1 (en) * 2004-12-13 2008-01-17 Optomec, Inc. Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array
US7938341B2 (en) * 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US7381633B2 (en) * 2005-01-27 2008-06-03 Hewlett-Packard Development Company, L.P. Method of making a patterned metal oxide film
KR101021459B1 (ko) * 2005-08-22 2011-03-15 도카로 가부시키가이샤 내손상성 등이 우수한 용사 피막 피복 부재 및 그 제조방법
US20090130436A1 (en) * 2005-08-22 2009-05-21 Yoshio Harada Spray coating member having excellent heat emmision property and so on and method for producing the same
JP4571561B2 (ja) * 2005-09-08 2010-10-27 トーカロ株式会社 耐プラズマエロージョン性に優れる溶射皮膜被覆部材およびその製造方法
US20070154634A1 (en) * 2005-12-15 2007-07-05 Optomec Design Company Method and Apparatus for Low-Temperature Plasma Sintering
JP4643478B2 (ja) * 2006-03-20 2011-03-02 トーカロ株式会社 半導体加工装置用セラミック被覆部材の製造方法
US7648782B2 (en) * 2006-03-20 2010-01-19 Tokyo Electron Limited Ceramic coating member for semiconductor processing apparatus
US7850864B2 (en) 2006-03-20 2010-12-14 Tokyo Electron Limited Plasma treating apparatus and plasma treating method
JP4729766B2 (ja) * 2006-08-10 2011-07-20 独立行政法人産業技術総合研究所 超電導酸化物材料の製造方法
US20100310630A1 (en) * 2007-04-27 2010-12-09 Technische Universitat Braunschweig Coated surface for cell culture
TWI482662B (zh) * 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) * 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
TW200918325A (en) * 2007-08-31 2009-05-01 Optomec Inc AEROSOL JET® printing system for photovoltaic applications
US8887658B2 (en) * 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
US10994473B2 (en) 2015-02-10 2021-05-04 Optomec, Inc. Fabrication of three dimensional structures by in-flight curing of aerosols
US10632746B2 (en) 2017-11-13 2020-04-28 Optomec, Inc. Shuttering of aerosol streams

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3801366A (en) * 1971-02-16 1974-04-02 J Lemelson Method of making an electrical circuit
IT1127303B (it) * 1979-12-20 1986-05-21 Oronzio De Nora Impianti Tprocedimento per la preparazione di ossidi misti catalitici
US5041420A (en) * 1987-06-26 1991-08-20 Hewlett-Packard Company Method for making superconductor films from organometallic precursors
JPS6477977A (en) * 1987-09-18 1989-03-23 Sanyo Electric Co Manufacture of superconductive wiring circuit

Also Published As

Publication number Publication date
EP0317495B1 (de) 1995-03-08
US4997809A (en) 1991-03-05
CA1335438C (en) 1995-05-02
EP0317495A3 (en) 1990-11-28
JPH01222488A (ja) 1989-09-05
EP0317495A2 (de) 1989-05-24
DE3853263D1 (de) 1995-04-13
JPH0682869B2 (ja) 1994-10-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee