DE3850177D1 - Verfahren zur Herstellung von tertiären Alkyldimethylhalosilanen. - Google Patents

Verfahren zur Herstellung von tertiären Alkyldimethylhalosilanen.

Info

Publication number
DE3850177D1
DE3850177D1 DE3850177T DE3850177T DE3850177D1 DE 3850177 D1 DE3850177 D1 DE 3850177D1 DE 3850177 T DE3850177 T DE 3850177T DE 3850177 T DE3850177 T DE 3850177T DE 3850177 D1 DE3850177 D1 DE 3850177D1
Authority
DE
Germany
Prior art keywords
alkyldimethylhalosilanes
tertiary
preparation
tertiary alkyldimethylhalosilanes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3850177T
Other languages
English (en)
Other versions
DE3850177T2 (de
Inventor
Akihiko Shirahata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Toray Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Silicone Co Ltd filed Critical Toray Silicone Co Ltd
Publication of DE3850177D1 publication Critical patent/DE3850177D1/de
Application granted granted Critical
Publication of DE3850177T2 publication Critical patent/DE3850177T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/12Organo silicon halides
    • C07F7/121Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
    • C07F7/123Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
DE3850177T 1987-07-09 1988-07-07 Verfahren zur Herstellung von tertiären Alkyldimethylhalosilanen. Expired - Fee Related DE3850177T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17170087 1987-07-09
JP62203857A JPH0637503B2 (ja) 1987-07-09 1987-08-17 t−アルキルジメチルハロゲノシランの製造方法

Publications (2)

Publication Number Publication Date
DE3850177D1 true DE3850177D1 (de) 1994-07-21
DE3850177T2 DE3850177T2 (de) 1994-11-03

Family

ID=26494336

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3850177T Expired - Fee Related DE3850177T2 (de) 1987-07-09 1988-07-07 Verfahren zur Herstellung von tertiären Alkyldimethylhalosilanen.

Country Status (5)

Country Link
US (1) US4814474A (de)
EP (1) EP0298487B1 (de)
JP (1) JPH0637503B2 (de)
CA (1) CA1317304C (de)
DE (1) DE3850177T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4814259A (en) * 1987-11-09 1989-03-21 Rockwell International Corporation Laser generated electrically conductive pattern
JP2551901B2 (ja) * 1991-07-26 1996-11-06 エフ エム シー コーポレーション 接触アルキル化方法
US5211888A (en) * 1991-07-26 1993-05-18 Fmc Corporation Catalyzed hydrocarbyllithium process
US5340507A (en) * 1991-07-26 1994-08-23 Fmc Corporation Catalyzed hydrocarbyllithium process
JPH07157491A (ja) * 1993-12-03 1995-06-20 Shin Etsu Chem Co Ltd α位に3級炭化水素基を有するシランの製造方法
US6429327B1 (en) 1999-01-21 2002-08-06 Fmc Corporation Organometallic catalysts
JP2002145888A (ja) * 2000-11-06 2002-05-22 Shin Etsu Chem Co Ltd テキシル基を有するクロロシラン化合物及びその製造方法
CN115010746A (zh) * 2022-07-20 2022-09-06 江苏八巨药业有限公司 一种叔丁基二甲基氯硅烷的制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2496419A (en) * 1949-06-03 1950-02-07 Dow Corning Production of cyclopropane
US2802852A (en) * 1955-03-24 1957-08-13 Gen Electric Processes of cleaving silicon-to-carbon bonds
DE2546919A1 (de) * 1975-10-20 1977-04-28 Consortium Elektrochem Ind Verfahren zum herstellen von methylchlorsilanen
JPS60222492A (ja) * 1984-04-17 1985-11-07 Shin Etsu Chem Co Ltd 第3級炭化水素シリル化合物の製造方法
JPS60237092A (ja) * 1984-05-08 1985-11-25 Shin Etsu Chem Co Ltd 第3級炭化水素シリル化合物の製造方法

Also Published As

Publication number Publication date
JPH01104083A (ja) 1989-04-21
DE3850177T2 (de) 1994-11-03
JPH0637503B2 (ja) 1994-05-18
US4814474A (en) 1989-03-21
EP0298487A3 (de) 1991-02-27
CA1317304C (en) 1993-05-04
EP0298487A2 (de) 1989-01-11
EP0298487B1 (de) 1994-06-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee