DE3786063D1 - Bedampfen von fluessigen monomeren. - Google Patents

Bedampfen von fluessigen monomeren.

Info

Publication number
DE3786063D1
DE3786063D1 DE8787904345T DE3786063T DE3786063D1 DE 3786063 D1 DE3786063 D1 DE 3786063D1 DE 8787904345 T DE8787904345 T DE 8787904345T DE 3786063 T DE3786063 T DE 3786063T DE 3786063 D1 DE3786063 D1 DE 3786063D1
Authority
DE
Germany
Prior art keywords
liquid monomers
steaming liquid
steaming
monomers
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787904345T
Other languages
English (en)
Other versions
DE3786063T2 (de
Inventor
Angelo Yializis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Spectrum Control Inc
Original Assignee
Spectrum Control Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spectrum Control Inc filed Critical Spectrum Control Inc
Publication of DE3786063D1 publication Critical patent/DE3786063D1/de
Application granted granted Critical
Publication of DE3786063T2 publication Critical patent/DE3786063T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/16—Evaporating by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/06—Flash distillation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/145—Organic dielectrics vapour deposited

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
DE8787904345T 1986-06-23 1987-06-23 Bedampfen von fluessigen monomeren. Expired - Lifetime DE3786063T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87717586A 1986-06-23 1986-06-23
PCT/US1987/001455 WO1987007848A1 (en) 1986-06-23 1987-06-23 Flash evaporation of monomer fluids

Publications (2)

Publication Number Publication Date
DE3786063D1 true DE3786063D1 (de) 1993-07-08
DE3786063T2 DE3786063T2 (de) 1993-09-09

Family

ID=25369416

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787904345T Expired - Lifetime DE3786063T2 (de) 1986-06-23 1987-06-23 Bedampfen von fluessigen monomeren.

Country Status (4)

Country Link
EP (1) EP0270656B1 (de)
JP (1) JP2530350B2 (de)
DE (1) DE3786063T2 (de)
WO (1) WO1987007848A1 (de)

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Publication number Priority date Publication date Assignee Title
EP0420596B1 (de) * 1989-09-26 1996-06-19 Canon Kabushiki Kaisha Gasversorgungsvorrichtung und ihre Verwendung für eine Filmabscheidungsanlage
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US6110531A (en) * 1991-02-25 2000-08-29 Symetrix Corporation Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition
DE4124018C1 (de) * 1991-07-19 1992-11-19 Leybold Ag, 6450 Hanau, De
DE69218152T2 (de) * 1991-12-26 1997-08-28 Canon Kk Herstellungsverfahren einer niedergeschlagenen Schicht mittels CVD, unter Verwendung von flüssigem Rohstoff und dazu geeignete Vorrichtung
JP3222518B2 (ja) * 1991-12-26 2001-10-29 キヤノン株式会社 液体原料気化装置および薄膜形成装置
EP0585848A1 (de) * 1992-09-02 1994-03-09 Hoechst Aktiengesellschaft Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten
US5681615A (en) * 1995-07-27 1997-10-28 Battelle Memorial Institute Vacuum flash evaporated polymer composites
US6116184A (en) * 1996-05-21 2000-09-12 Symetrix Corporation Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
US5997642A (en) * 1996-05-21 1999-12-07 Symetrix Corporation Method and apparatus for misted deposition of integrated circuit quality thin films
US5951923A (en) * 1996-05-23 1999-09-14 Ebara Corporation Vaporizer apparatus and film deposition apparatus therewith
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US5902641A (en) * 1997-09-29 1999-05-11 Battelle Memorial Institute Flash evaporation of liquid monomer particle mixture
US6207239B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
US6274204B1 (en) 1998-12-16 2001-08-14 Battelle Memorial Institute Method of making non-linear optical polymer
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6228434B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making a conformal coating of a microtextured surface
US6207238B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition for high and/or low index of refraction polymers
US6228436B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making light emitting polymer composite material
EP1145338B1 (de) 1998-12-16 2012-12-05 Samsung Display Co., Ltd. Umwelt-sperrmaterial für organische elektrolumineszente vorrichtung und herstellungsverfahren
US6217947B1 (en) 1998-12-16 2001-04-17 Battelle Memorial Institute Plasma enhanced polymer deposition onto fixtures
US6358570B1 (en) 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
US6506461B2 (en) * 1999-03-31 2003-01-14 Battelle Memorial Institute Methods for making polyurethanes as thin films
US6623861B2 (en) 2001-04-16 2003-09-23 Battelle Memorial Institute Multilayer plastic substrates
US6413645B1 (en) 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
US6866901B2 (en) 1999-10-25 2005-03-15 Vitex Systems, Inc. Method for edge sealing barrier films
US6573652B1 (en) 1999-10-25 2003-06-03 Battelle Memorial Institute Encapsulated display devices
US20100330748A1 (en) 1999-10-25 2010-12-30 Xi Chu Method of encapsulating an environmentally sensitive device
US6548912B1 (en) 1999-10-25 2003-04-15 Battelle Memorial Institute Semicoductor passivation using barrier coatings
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
DE10049856A1 (de) * 2000-10-09 2002-03-07 Siemens Ag Vorrichtung zum kontinuierlichen Verdampfen kleiner Mengen einer Flüssigkeit
US8808457B2 (en) 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US8900366B2 (en) 2002-04-15 2014-12-02 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
JP5778376B2 (ja) * 2005-12-29 2015-09-16 スリーエム イノベイティブ プロパティズ カンパニー コーティングプロセスにおいて材料を噴霧化する方法
US9822454B2 (en) 2006-12-28 2017-11-21 3M Innovative Properties Company Nucleation layer for thin film metal layer formation
US20110175031A1 (en) * 2008-09-24 2011-07-21 Idemitsu Kosan Co., Ltd. Composite organic electroluminescent material
US9337446B2 (en) 2008-12-22 2016-05-10 Samsung Display Co., Ltd. Encapsulated RGB OLEDs having enhanced optical output
US9184410B2 (en) 2008-12-22 2015-11-10 Samsung Display Co., Ltd. Encapsulated white OLEDs having enhanced optical output
US8590338B2 (en) 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
JPWO2014103756A1 (ja) * 2012-12-25 2017-01-12 コニカミノルタ株式会社 ガスバリア性フィルム
DE102016225257A1 (de) * 2016-12-16 2018-06-21 Robert Bosch Gmbh Vorrichtung und Verfahren zum Verdampfen eines Ausgangsstoffs

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1766699A (en) * 1926-09-11 1930-06-24 Ig Farbenindustrie Ag Apparatus for continuous distillation of difficultly-distillable liquids
US2258445A (en) * 1940-02-06 1941-10-07 Du Pont Apparatus for vaporization
DE886441C (de) * 1941-07-04 1953-08-13 Siemens Ag Verfahren und Vorrichtung zum UEberziehen von Traegerstoffen mit moeglichst gleichmaessigen duennen Schichten organischer Stoffe
GB1253124A (de) * 1969-02-28 1971-11-10
US4076866A (en) * 1975-03-30 1978-02-28 Massachusetts Institute Of Technology Method of growing films by flash vaporization
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film
JPS59177365A (ja) * 1983-03-24 1984-10-08 Matsushita Electric Ind Co Ltd 蒸発方法とその装置
JPS60145372A (ja) * 1984-01-09 1985-07-31 Furukawa Electric Co Ltd:The 耐熱性樹脂の被覆方法
JPS6184367A (ja) * 1984-10-03 1986-04-28 Ulvac Corp 有機薄膜の形成法

Also Published As

Publication number Publication date
EP0270656A1 (de) 1988-06-15
EP0270656A4 (de) 1989-05-30
WO1987007848A1 (en) 1987-12-30
JPS63503552A (ja) 1988-12-22
EP0270656B1 (de) 1993-06-02
DE3786063T2 (de) 1993-09-09
JP2530350B2 (ja) 1996-09-04

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