DE375594T1 - Herstellung duenner ferroelektrischer filme. - Google Patents

Herstellung duenner ferroelektrischer filme.

Info

Publication number
DE375594T1
DE375594T1 DE198989630229T DE89630229T DE375594T1 DE 375594 T1 DE375594 T1 DE 375594T1 DE 198989630229 T DE198989630229 T DE 198989630229T DE 89630229 T DE89630229 T DE 89630229T DE 375594 T1 DE375594 T1 DE 375594T1
Authority
DE
Germany
Prior art keywords
colloidal suspension
barium
production
thin film
ferroelectric films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE198989630229T
Other languages
English (en)
Inventor
Francis S. Manchester Connecticut 06040 Galasso
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RTX Corp
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Publication of DE375594T1 publication Critical patent/DE375594T1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H10N30/8536—Alkaline earth metal based oxides, e.g. barium titanates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Chemically Coating (AREA)

Claims (2)

Anmeldung Nr. 89630229.6 Patentansprüche
1. Verfahren zum Herstellen eines dünnen Films eines ferroelektrischen Materials vom Bariumtitanattyp, beinhaltend die Schritte:
a) Auflösen eines Bariumsalzes in Wasser;
b) Auflösen von Titansalz in einem organischen Lösungsmittel;
c) Vermischen der Lösungen, die in den Schritten a und b hergestellt worden sind, um eine kolloidale Suspension herzustellen;
d) Auftragen der kolloidalen Suspension in einer dünnen Schicht auf ein Substrat;
e) Trocknen der kolloidalen Suspensionsschicht, um die Lösungsmittel auszutreiben; und
f) Brennen der getrockneten kolloidalen Suspension, um den Bariumtitanattyp-Dünnfilm zu bilden.
2. Verfahren nach Anspruch 1, wobei ein weiteres Element, das aus der Gruppe ausgewählt wird, die aus Strontium, Rubidium, Cäsium und den Seltene-Erde-Elementen und Gemischen derselben besteht, einen Teil des Bariums ersetzt.
DE198989630229T 1988-12-23 1989-12-19 Herstellung duenner ferroelektrischer filme. Pending DE375594T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US28911288A 1988-12-23 1988-12-23

Publications (1)

Publication Number Publication Date
DE375594T1 true DE375594T1 (de) 1990-11-08

Family

ID=23110106

Family Applications (1)

Application Number Title Priority Date Filing Date
DE198989630229T Pending DE375594T1 (de) 1988-12-23 1989-12-19 Herstellung duenner ferroelektrischer filme.

Country Status (3)

Country Link
EP (1) EP0375594A1 (de)
JP (1) JPH02221121A (de)
DE (1) DE375594T1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3235145B2 (ja) * 1991-11-01 2001-12-04 株式会社村田製作所 チタン酸バリウム薄膜の形成方法
JPH0773732A (ja) * 1993-06-23 1995-03-17 Sharp Corp 誘電体薄膜素子及びその製造方法
JP3007795B2 (ja) * 1994-06-16 2000-02-07 シャープ株式会社 複合金属酸化物誘電体薄膜の製造方法
JP4743481B2 (ja) * 2004-03-25 2011-08-10 昭和電工株式会社 チタン含有ペロブスカイト型化合物およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU895020A1 (ru) * 1979-10-29 1987-04-15 МГУ им.М.В.Ломоносова Способ получени пленок титаната бари
FR2570373B1 (fr) * 1984-09-19 1987-01-09 Centre Nat Rech Scient Procede de preparation de gels thixotropes d'oxalates mixtes, et plus particulierement d'un gel thixotrope d'oxalate double de titane et de baryum
JP2922738B2 (ja) * 1992-11-30 1999-07-26 キヤノン株式会社 輪郭形成方法及び装置

Also Published As

Publication number Publication date
EP0375594A1 (de) 1990-06-27
JPH02221121A (ja) 1990-09-04

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