DE3706127C2 - - Google Patents
Info
- Publication number
- DE3706127C2 DE3706127C2 DE3706127A DE3706127A DE3706127C2 DE 3706127 C2 DE3706127 C2 DE 3706127C2 DE 3706127 A DE3706127 A DE 3706127A DE 3706127 A DE3706127 A DE 3706127A DE 3706127 C2 DE3706127 C2 DE 3706127C2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- resist
- etching
- reactive ion
- ion etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/95—Multilayer mask including nonradiation sensitive layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61097002A JPS62253785A (ja) | 1986-04-28 | 1986-04-28 | 間欠的エツチング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3706127A1 DE3706127A1 (de) | 1987-10-29 |
DE3706127C2 true DE3706127C2 (US06211527-20010403-C00003.png) | 1989-01-19 |
Family
ID=14180009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19873706127 Granted DE3706127A1 (de) | 1986-04-28 | 1987-02-25 | Diskontinuierliches aetzverfahren |
Country Status (3)
Country | Link |
---|---|
US (1) | US4790903A (US06211527-20010403-C00003.png) |
JP (1) | JPS62253785A (US06211527-20010403-C00003.png) |
DE (1) | DE3706127A1 (US06211527-20010403-C00003.png) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4241045C1 (de) * | 1992-12-05 | 1994-05-26 | Bosch Gmbh Robert | Verfahren zum anisotropen Ätzen von Silicium |
DE19919832A1 (de) * | 1999-04-30 | 2000-11-09 | Bosch Gmbh Robert | Verfahren zum anisotropen Plasmaätzen von Halbleitern |
US8293430B2 (en) | 2005-01-27 | 2012-10-23 | Applied Materials, Inc. | Method for etching a molybdenum layer suitable for photomask fabrication |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4915779A (en) * | 1988-08-23 | 1990-04-10 | Motorola Inc. | Residue-free plasma etch of high temperature AlCu |
US4945069A (en) * | 1988-12-16 | 1990-07-31 | Texas Instruments, Incorporated | Organic space holder for trench processing |
US5169494A (en) * | 1989-03-27 | 1992-12-08 | Matsushita Electric Industrial Co., Ltd. | Fine pattern forming method |
US5086248A (en) * | 1989-08-18 | 1992-02-04 | Galileo Electro-Optics Corporation | Microchannel electron multipliers |
US5205902A (en) * | 1989-08-18 | 1993-04-27 | Galileo Electro-Optics Corporation | Method of manufacturing microchannel electron multipliers |
ATE135496T1 (de) * | 1990-03-27 | 1996-03-15 | Canon Kk | Dünnschicht-halbleiterbauelement |
US5085676A (en) * | 1990-12-04 | 1992-02-04 | E. I. Du Pont De Nemours And Company | Novel multicomponent fluid separation membranes |
JP3041972B2 (ja) * | 1991-01-10 | 2000-05-15 | 富士通株式会社 | 半導体装置の製造方法 |
JPH07183194A (ja) * | 1993-12-24 | 1995-07-21 | Sony Corp | 多層レジストパターン形成方法 |
US5733657A (en) * | 1994-10-11 | 1998-03-31 | Praxair Technology, Inc. | Method of preparing membranes from blends of polymers |
AUPP590798A0 (en) * | 1998-09-14 | 1998-10-08 | Commonwealth Scientific And Industrial Research Organisation | Method of manufacture of high temperature superconductors |
AU773535B2 (en) * | 1998-09-14 | 2004-05-27 | Commonwealth Scientific And Industrial Research Organisation | Superconducting device |
US6383938B2 (en) | 1999-04-21 | 2002-05-07 | Alcatel | Method of anisotropic etching of substrates |
US6291357B1 (en) | 1999-10-06 | 2001-09-18 | Applied Materials, Inc. | Method and apparatus for etching a substrate with reduced microloading |
US6849554B2 (en) | 2002-05-01 | 2005-02-01 | Applied Materials, Inc. | Method of etching a deep trench having a tapered profile in silicon |
US7154086B2 (en) * | 2003-03-19 | 2006-12-26 | Burle Technologies, Inc. | Conductive tube for use as a reflectron lens |
US20040224524A1 (en) * | 2003-05-09 | 2004-11-11 | Applied Materials, Inc. | Maintaining the dimensions of features being etched on a lithographic mask |
US7521000B2 (en) | 2003-08-28 | 2009-04-21 | Applied Materials, Inc. | Process for etching photomasks |
US7352064B2 (en) * | 2004-11-04 | 2008-04-01 | International Business Machines Corporation | Multiple layer resist scheme implementing etch recipe particular to each layer |
US7879510B2 (en) | 2005-01-08 | 2011-02-01 | Applied Materials, Inc. | Method for quartz photomask plasma etching |
US7790334B2 (en) | 2005-01-27 | 2010-09-07 | Applied Materials, Inc. | Method for photomask plasma etching using a protected mask |
US7829243B2 (en) | 2005-01-27 | 2010-11-09 | Applied Materials, Inc. | Method for plasma etching a chromium layer suitable for photomask fabrication |
US20080073516A1 (en) * | 2006-03-10 | 2008-03-27 | Laprade Bruce N | Resistive glass structures used to shape electric fields in analytical instruments |
US7615385B2 (en) | 2006-09-20 | 2009-11-10 | Hypres, Inc | Double-masking technique for increasing fabrication yield in superconducting electronics |
US7786019B2 (en) * | 2006-12-18 | 2010-08-31 | Applied Materials, Inc. | Multi-step photomask etching with chlorine for uniformity control |
US9941121B1 (en) | 2017-01-24 | 2018-04-10 | International Business Machines Corporation | Selective dry etch for directed self assembly of block copolymers |
CN115440585A (zh) * | 2022-09-01 | 2022-12-06 | 中国科学院光电技术研究所 | 金属纳米结构及其离子束刻蚀加工方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS563669A (en) * | 1979-06-20 | 1981-01-14 | Fuji Denshi Kogyo Kk | Ion-treating method |
US4333814A (en) * | 1979-12-26 | 1982-06-08 | Western Electric Company, Inc. | Methods and apparatus for improving an RF excited reactive gas plasma |
JPS56123381A (en) * | 1980-01-24 | 1981-09-28 | Fujitsu Ltd | Method and device for plasma etching |
US4417948A (en) * | 1982-07-09 | 1983-11-29 | International Business Machines Corporation | Self developing, photoetching of polyesters by far UV radiation |
US4587184A (en) * | 1983-07-27 | 1986-05-06 | Siemens Aktiengesellschaft | Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks |
-
1986
- 1986-04-28 JP JP61097002A patent/JPS62253785A/ja active Granted
-
1987
- 1987-02-25 DE DE19873706127 patent/DE3706127A1/de active Granted
-
1988
- 1988-03-18 US US07/180,641 patent/US4790903A/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4241045C1 (de) * | 1992-12-05 | 1994-05-26 | Bosch Gmbh Robert | Verfahren zum anisotropen Ätzen von Silicium |
DE19919832A1 (de) * | 1999-04-30 | 2000-11-09 | Bosch Gmbh Robert | Verfahren zum anisotropen Plasmaätzen von Halbleitern |
US8293430B2 (en) | 2005-01-27 | 2012-10-23 | Applied Materials, Inc. | Method for etching a molybdenum layer suitable for photomask fabrication |
Also Published As
Publication number | Publication date |
---|---|
JPS641555B2 (US06211527-20010403-C00003.png) | 1989-01-11 |
DE3706127A1 (de) | 1987-10-29 |
US4790903A (en) | 1988-12-13 |
JPS62253785A (ja) | 1987-11-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8380 | Miscellaneous part iii |
Free format text: DAS AKTENZEICHEN AUF DER TITELSEITE DER PATENTSCHRIFT LAUTET RICHTIG : P 37 06 127.5-45 |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |