DE3704378A1 - Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente - Google Patents

Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente

Info

Publication number
DE3704378A1
DE3704378A1 DE19873704378 DE3704378A DE3704378A1 DE 3704378 A1 DE3704378 A1 DE 3704378A1 DE 19873704378 DE19873704378 DE 19873704378 DE 3704378 A DE3704378 A DE 3704378A DE 3704378 A1 DE3704378 A1 DE 3704378A1
Authority
DE
Germany
Prior art keywords
substrate
waveguide
strip
waveguide strip
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19873704378
Other languages
German (de)
English (en)
Inventor
Volker Doormann
Jens-Peter Krumme
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Original Assignee
Philips Patentverwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Patentverwaltung GmbH filed Critical Philips Patentverwaltung GmbH
Priority to DE19873704378 priority Critical patent/DE3704378A1/de
Priority to DE8787200878T priority patent/DE3775478D1/de
Priority to EP87200878A priority patent/EP0252536B1/fr
Priority to US07/051,568 priority patent/US4849080A/en
Priority to JP62122673A priority patent/JPH0769495B2/ja
Priority to CA000537616A priority patent/CA1291634C/fr
Publication of DE3704378A1 publication Critical patent/DE3704378A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/06—Epitaxial-layer growth by reactive sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/09—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on magneto-optical elements, e.g. exhibiting Faraday effect
    • G02F1/095—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on magneto-optical elements, e.g. exhibiting Faraday effect in an optical waveguide structure
    • G02F1/0955—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on magneto-optical elements, e.g. exhibiting Faraday effect in an optical waveguide structure used as non-reciprocal devices, e.g. optical isolators, circulators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Integrated Circuits (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE19873704378 1986-05-21 1987-02-12 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente Withdrawn DE3704378A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE19873704378 DE3704378A1 (de) 1986-05-21 1987-02-12 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente
DE8787200878T DE3775478D1 (de) 1986-05-21 1987-05-13 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente.
EP87200878A EP0252536B1 (fr) 1986-05-21 1987-05-13 Méthode de fabrication d'une microbande optique pour des éléments optiques non-réciproques
US07/051,568 US4849080A (en) 1986-05-21 1987-05-18 Method of manufacturing an optical stripline waveguide for non-reciprocal optical components
JP62122673A JPH0769495B2 (ja) 1986-05-21 1987-05-21 光学ストリップライン導波管の製造方法
CA000537616A CA1291634C (fr) 1986-05-21 1987-05-21 Methode de fabrication de microrubans de guidage de limiere pour composants optiques non reciproques

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3617060 1986-05-21
DE19873704378 DE3704378A1 (de) 1986-05-21 1987-02-12 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente

Publications (1)

Publication Number Publication Date
DE3704378A1 true DE3704378A1 (de) 1987-11-26

Family

ID=25843933

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19873704378 Withdrawn DE3704378A1 (de) 1986-05-21 1987-02-12 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente
DE8787200878T Expired - Lifetime DE3775478D1 (de) 1986-05-21 1987-05-13 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente.

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE8787200878T Expired - Lifetime DE3775478D1 (de) 1986-05-21 1987-05-13 Verfahren zur herstellung eines optischen streifenwellenleiters fuer nicht-reziproke optische bauelemente.

Country Status (5)

Country Link
US (1) US4849080A (fr)
EP (1) EP0252536B1 (fr)
JP (1) JPH0769495B2 (fr)
CA (1) CA1291634C (fr)
DE (2) DE3704378A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4430043A1 (de) * 1993-08-25 1995-03-02 Ricoh Kk Optischer integrierter Schaltkreis

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3825788A1 (de) * 1988-07-29 1990-02-01 Philips Patentverwaltung Verfahren zur herstellung von eisengranatschichten
DE3825787A1 (de) * 1988-07-29 1990-02-01 Philips Nv Verfahren zur herstellung von eisengranatschichten
US4990466A (en) * 1988-11-01 1991-02-05 Siemens Corporate Research, Inc. Method for fabricating index-guided semiconductor laser
GB9008916D0 (en) * 1990-04-20 1990-06-20 Townsend Peter D Optical waveguide fabrication
JP2565099B2 (ja) * 1993-08-09 1996-12-18 日本電気株式会社 光非相反回路
US5945255A (en) * 1997-06-09 1999-08-31 Taiwan Semiconductor Manufacturing Company, Ltd. Birefringent interlayer for attenuating standing wave photoexposure of a photoresist layer formed over a reflective layer
US6947651B2 (en) * 2001-05-10 2005-09-20 Georgia Tech Research Corporation Optical waveguides formed from nano air-gap inter-layer dielectric materials and methods of fabrication thereof
JP2022112261A (ja) * 2021-01-21 2022-08-02 大学共同利用機関法人自然科学研究機構 光学素子、光学装置、および、光学素子の製造方法
CN114061175B (zh) * 2021-11-23 2023-08-01 北京量子信息科学研究院 激光制冷器及激光制冷方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607698A (en) * 1968-10-11 1971-09-21 Ibm Epitaxial garnet films
FR2152462B1 (fr) * 1971-09-16 1974-09-06 Thomson Csf
US3928092A (en) * 1974-08-28 1975-12-23 Bell Telephone Labor Inc Simultaneous molecular beam deposition of monocrystalline and polycrystalline III(a)-V(a) compounds to produce semiconductor devices
US3997690A (en) * 1975-05-27 1976-12-14 Honeywell Inc. Method of adjusting refractive index of PLZT optical coating on optical element
US4322276A (en) * 1979-06-20 1982-03-30 Deposition Technology, Inc. Method for producing an inhomogeneous film for selective reflection/transmission of solar radiation
JPS5637635A (en) * 1979-09-05 1981-04-11 Mitsubishi Electric Corp Manufacture of semiconductor device
DE3160998D1 (en) * 1980-03-10 1983-11-03 Teijin Ltd Selectively light-transmitting laminated structure
US4376138A (en) * 1982-01-04 1983-03-08 Bell Telephone Laboratories, Incorporated Optical waveguides in InGaAsP and InP
JPS5974526A (ja) * 1982-10-22 1984-04-27 Hitachi Ltd 光アイソレ−タおよびその製造方法
JPS59178415A (ja) * 1983-03-30 1984-10-09 Hitachi Ltd 薄膜光アイソレ−タとその製造方法
JPS60107616A (ja) * 1983-11-16 1985-06-13 Hitachi Ltd 導波型フアラデ−回転素子
US4608142A (en) * 1983-11-17 1986-08-26 Nippon Sheet Glass Co., Ltd. Method of manufacturing magneto-optic recording film
DE3424467A1 (de) * 1984-07-03 1986-01-16 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur herstellung wismut-substituierter ferrimagnetischer granatschichten

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4430043A1 (de) * 1993-08-25 1995-03-02 Ricoh Kk Optischer integrierter Schaltkreis
US5719981A (en) * 1993-08-25 1998-02-17 Ricoh Company, Ltd. Opto-electric device
DE4430043C2 (de) * 1993-08-25 2000-01-05 Ricoh Kk Optischer integrierter Schaltkreis

Also Published As

Publication number Publication date
US4849080A (en) 1989-07-18
JPH0769495B2 (ja) 1995-07-31
EP0252536A1 (fr) 1988-01-13
CA1291634C (fr) 1991-11-05
EP0252536B1 (fr) 1991-12-27
DE3775478D1 (de) 1992-02-06
JPS62287211A (ja) 1987-12-14

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Legal Events

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8139 Disposal/non-payment of the annual fee