DE3681478D1 - Trockenentwicklungsverfahren fuer schutzlackfilme. - Google Patents

Trockenentwicklungsverfahren fuer schutzlackfilme.

Info

Publication number
DE3681478D1
DE3681478D1 DE8686102665T DE3681478T DE3681478D1 DE 3681478 D1 DE3681478 D1 DE 3681478D1 DE 8686102665 T DE8686102665 T DE 8686102665T DE 3681478 T DE3681478 T DE 3681478T DE 3681478 D1 DE3681478 D1 DE 3681478D1
Authority
DE
Germany
Prior art keywords
development process
protective lacquer
dry development
lacquer films
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686102665T
Other languages
English (en)
Inventor
Shinya Katoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3681478D1 publication Critical patent/DE3681478D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Solid Materials (AREA)
DE8686102665T 1985-03-29 1986-02-28 Trockenentwicklungsverfahren fuer schutzlackfilme. Expired - Fee Related DE3681478D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60068286A JPS61234035A (ja) 1985-03-29 1985-03-29 遠紫外線照射ドライ現像方法

Publications (1)

Publication Number Publication Date
DE3681478D1 true DE3681478D1 (de) 1991-10-24

Family

ID=13369368

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686102665T Expired - Fee Related DE3681478D1 (de) 1985-03-29 1986-02-28 Trockenentwicklungsverfahren fuer schutzlackfilme.

Country Status (4)

Country Link
EP (1) EP0197286B1 (de)
JP (1) JPS61234035A (de)
KR (1) KR900001238B1 (de)
DE (1) DE3681478D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2200219A (en) * 1987-01-22 1988-07-27 Rosser Roy J Ultra-violet photo-ablative development of X-ray exposed photoresists
WO1989007286A1 (en) * 1988-02-08 1989-08-10 Stangl Guenther Process for producing a structure on a substrate coated with a resist based on an organic polymer
DE69208769T2 (de) * 1991-07-31 1996-07-18 Texas Instruments Inc Hochauflösendes lithographisches Verfahren
KR100504189B1 (ko) * 1997-12-31 2005-10-21 매그나칩 반도체 유한회사 원자외선광발생장치및그발생방법
KR20240104192A (ko) 2018-11-14 2024-07-04 램 리써치 코포레이션 차세대 리소그래피에서 유용한 하드 마스크들을 제조하기 위한 방법들
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
JP7189375B2 (ja) 2020-01-15 2022-12-13 ラム リサーチ コーポレーション フォトレジスト接着および線量低減のための下層
KR20230152171A (ko) * 2020-11-13 2023-11-02 램 리써치 코포레이션 포토레지스트의 건식 제거를 위한 프로세스 툴

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1181114A (en) * 1967-06-16 1970-02-11 Foxcroft Inv S Proprietary Ltd Improvements relating to the Photographic Production of Printing Plates and Relief Images
JPS5775426A (en) * 1980-10-30 1982-05-12 Toshiba Corp Ultraviolet rays irradiator for transcription
JPS5814132A (ja) * 1981-07-17 1983-01-26 Nippon Telegr & Teleph Corp <Ntt> ポジ形レジストパタン形成方法
FR2522532A1 (en) * 1982-03-02 1983-09-09 Soenen Antoine Microwave oven - with thermal extn. mechanism, used for emulsions
JPS6043824A (ja) * 1983-08-20 1985-03-08 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS61234035A (ja) 1986-10-18
EP0197286B1 (de) 1991-09-18
EP0197286A3 (en) 1987-10-21
KR900001238B1 (ko) 1990-03-05
KR860007724A (ko) 1986-10-15
EP0197286A2 (de) 1986-10-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee