FR2522532A1 - Microwave oven - with thermal extn. mechanism, used for emulsions - Google Patents

Microwave oven - with thermal extn. mechanism, used for emulsions Download PDF

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Publication number
FR2522532A1
FR2522532A1 FR8203384A FR8203384A FR2522532A1 FR 2522532 A1 FR2522532 A1 FR 2522532A1 FR 8203384 A FR8203384 A FR 8203384A FR 8203384 A FR8203384 A FR 8203384A FR 2522532 A1 FR2522532 A1 FR 2522532A1
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France
Prior art keywords
radiation
emulsions
heating
thermal
microwave oven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR8203384A
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French (fr)
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Individual
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Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR8203384A priority Critical patent/FR2522532A1/en
Publication of FR2522532A1 publication Critical patent/FR2522532A1/en
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Constitution Of High-Frequency Heating (AREA)

Abstract

Microwave oven includes a mechanism for heat extraction associated with the operation of the radiation source, and a system for thermally filtering the radiation capable of preventing any heating of the heatable zone of the furnace. This thermal filter is operated manually. The system permits a heating from a powerful source of wave radiation close to the material to be heated, without the latter's deterioration. The furnace is for use in insolation of emulsions and presensitised liquids. Emulsion and presensitised liquids can be locally heated without heating sensitive supports and such as paper, photographs, tin, etc.

Description

La présente invention concerne les appareils du type " fours a ondes", permettant d'insoler des émulsions et des liquides pré-sensibilisés.  The present invention relates to devices of the "wave ovens" type, allowing exposure of emulsions and pre-sensitized liquids.

Les appareils connus de ce genre sont en général d'un encombrement important. De tels appareils sont d'un emploi malaisé et demandent de trés nombreuses manipulations pour leur mise en oeuvre.. Dans d'autres dispositif la mise sous tension du four provoque une très nette augmentation de temperature qui excluait son utilisation pour l'insolation d'émulsions dont les supports sont très sensibles à la chaleur comme le papier, les photographies ou l'étain. Known devices of this kind are generally very large. Such devices are difficult to use and require very many manipulations for their implementation. In other devices the powering of the oven causes a very marked increase in temperature which precludes its use for insolation. emulsions whose supports are very sensitive to heat such as paper, photographs or tin.

Le four, selon l'invention, permet d'éviter ces inconvénients. Il est en effet associé à un extracteur calorifique et est d'autre part isolé de I'élément a insoler par une membrane transparente et isolante. The oven according to the invention makes it possible to avoid these drawbacks. It is in fact associated with a heat extractor and is on the other hand isolated from the element to be exposed by a transparent and insulating membrane.

Dans le dispositif, selon l'invention, la mise en marche de l'emetteur d'ondes électromagnétiques ( de type ultra-violet par exemple) est couplée avec un ventilateur d'extraction fonctionnant pendant toute la durée d'allumage de la source émettrice du rayonnement. In the device according to the invention, the switching on of the electromagnetic wave transmitter (of the ultra-violet type for example) is coupled with an extraction fan operating during the entire duration of ignition of the emitting source. radiation.

Par ailleurs, un dispositif mobile permet de placer a volonté entre la source emettrice d'ondes et la surface å insoler une membrane micacée laissant libre la propagation des ondes électromagnétiques, mais arrêtant la propagation des calories indésirables lorsque l'on procède a l'insolatio de surfaces ou de matières très sensibles a la chaleur comme déjà cite plus haut. Une poignée située a l'avant du four permet, par l'intermediain d'une glissière de type classique, la mise en place de la membrane micacée d'occultation thermique ou son effacement selon les besoins. In addition, a mobile device makes it possible to place at will between the source emitting waves and the surface to be exposed a micaceous membrane leaving free the propagation of electromagnetic waves, but stopping the propagation of unwanted calories when one proceeds to the insolation. surfaces or materials very sensitive to heat as already mentioned above. A handle located at the front of the oven allows, by means of a slide of the conventional type, the establishment of the micaceous membrane for thermal occultation or its erasing as required.

Le dessin annexé est une vue en coupe du dipositif lorsque l'émetteur de rayonnement est sous tension. The accompanying drawing is a sectional view of the device when the radiation emitter is energized.

Tel qu'il est représenté, le dispositif comporte une structure métal- lique ( A) et une source émettrice d'ondes électromagnétiques( B ) équipée selon certaines variantes d'un ou de plusieurs réflecteurs d'ondes ( C
Le dispositif est équipé d'un espace d'insolation ( D ). Entre t A ) et ( C se situe l'écran d'occultation thermique ( E ) qui peut entre manoeuvré à l'aide d'une tirette ( F ). Un ventilateur fonctionnant en extraction t G ) est situé au sommet de la structure (A ). As shown, the device comprises a metallic structure (A) and a source emitting electromagnetic waves (B) equipped according to certain variants with one or more wave reflectors (C
The device is equipped with an exposure space (D). Between t A) and (C is the thermal blanking screen (E) which can be operated using a pull tab (F). A fan operating in extraction t G) is located at the top of the structure (AT ).

Le Dispositif, objet de la présente invention , peut être utilisé dar tous les cas ou il est necessaire d'avoir une forte puissance d'émission df
rayonnement ondulatoire tout en ayant comme autre impératif majeur une fait élévation de tempeture au niveau de la surface ou de la matière à insoler par ce rayonnement,
Des applications particulierement intéressantes peuvent être obtenues dans son utilisation en matiére de photographie, de reprographie ou de diverses activités liées à la décoration, par exemple lors de l'insolation de résines diverses, durcissables sous l'action de rayonnements ondulatoires en particulier sous l'action d'un intense rayonnement de la longueur d'onde de l'ultra-violet, l'intensité du rayonnement ayant souvent pour corrélatior un échauffement de la zone d'insolation, ce qui est évité par l'application de la présente invention The device, object of the present invention, can be used in all cases where it is necessary to have a high transmission power df
wave radiation while having as another major imperative a rise in tempeture at the level of the surface or of the material to be exposed by this radiation,
Particularly interesting applications can be obtained in its use in photography, reprography or various activities related to decoration, for example during the exposure of various resins, curable under the action of wave radiation in particular under the action of intense radiation of the wavelength of the ultraviolet, the intensity of the radiation often having for correlation a heating of the insolation zone, which is avoided by the application of the present invention

Claims (4)

REVENDICATIONS 1 . Four à rayonnement ondulatoire , caractérisé par le fait qu'il comporte un moyen d'extraction calorifique lié a la mise en oeuvre de la source de rayonnement. 1. Oven with wave radiation, characterized in that it comprises a heat extraction means linked to the use of the radiation source. 2 . Four à ondes lie a un système de filtrage thermique du rayonne excluant un quelconque échauffement de la zone d'insolation. 2. Wave oven linked to a thermal filtering system of the rayon excluding any heating of the exposure zone. 3 . Four selon la revendication 1 qui permet d'avoir une source de rayonnement ondulatoire puissante et rapprochée de la matiere a insoler sans détérioration de celle-ci.  3. Oven according to claim 1 which makes it possible to have a source of powerful wave radiation close to the material to be exposed without deterioration thereof. 4 . Four a ondes , selon la revendication 2 caractérisé par le fai que le filtrage thermique est occultable manuellement.  4. Wave oven, according to claim 2 characterized in that the thermal filtering can be concealed manually.
FR8203384A 1982-03-02 1982-03-02 Microwave oven - with thermal extn. mechanism, used for emulsions Withdrawn FR2522532A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8203384A FR2522532A1 (en) 1982-03-02 1982-03-02 Microwave oven - with thermal extn. mechanism, used for emulsions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8203384A FR2522532A1 (en) 1982-03-02 1982-03-02 Microwave oven - with thermal extn. mechanism, used for emulsions

Publications (1)

Publication Number Publication Date
FR2522532A1 true FR2522532A1 (en) 1983-09-09

Family

ID=9271472

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8203384A Withdrawn FR2522532A1 (en) 1982-03-02 1982-03-02 Microwave oven - with thermal extn. mechanism, used for emulsions

Country Status (1)

Country Link
FR (1) FR2522532A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0197286A2 (en) * 1985-03-29 1986-10-15 Fujitsu Limited A dry development method for a resist film
FR2754613A1 (en) * 1996-10-16 1998-04-17 Rollin Sa IMPROVED MACHINE FOR INSOLING PHOTOPOLYMER PLATES FOR FLEXOGRAPHIC PRINTING

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0197286A2 (en) * 1985-03-29 1986-10-15 Fujitsu Limited A dry development method for a resist film
EP0197286A3 (en) * 1985-03-29 1987-10-21 Fujitsu Limited A dry development method for a resist film and an apparatus therefor
FR2754613A1 (en) * 1996-10-16 1998-04-17 Rollin Sa IMPROVED MACHINE FOR INSOLING PHOTOPOLYMER PLATES FOR FLEXOGRAPHIC PRINTING
EP0837370A1 (en) * 1996-10-16 1998-04-22 Rollin S.A. Exposure apparatus for flexographic printing plates
US5983800A (en) * 1996-10-16 1999-11-16 Rollin S.A. Machine for insulating and cooling photopolymer plates for flexographic printing

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Legal Events

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ER Errata listed in the french official journal (bopi)

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