DE3680499D1 - Verfahren zum herstellen eines integrierten lateralen transistors und eine ihn enthaltende integrierte schaltung. - Google Patents

Verfahren zum herstellen eines integrierten lateralen transistors und eine ihn enthaltende integrierte schaltung.

Info

Publication number
DE3680499D1
DE3680499D1 DE8686202321T DE3680499T DE3680499D1 DE 3680499 D1 DE3680499 D1 DE 3680499D1 DE 8686202321 T DE8686202321 T DE 8686202321T DE 3680499 T DE3680499 T DE 3680499T DE 3680499 D1 DE3680499 D1 DE 3680499D1
Authority
DE
Germany
Prior art keywords
integrated
producing
circuit containing
lateral transistor
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686202321T
Other languages
English (en)
Inventor
Bertrand Jacques
Pierre Leduc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3680499D1 publication Critical patent/DE3680499D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0804Emitter regions of bipolar transistors
    • H01L29/0808Emitter regions of bipolar transistors of lateral transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/735Lateral transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
DE8686202321T 1985-12-31 1986-12-18 Verfahren zum herstellen eines integrierten lateralen transistors und eine ihn enthaltende integrierte schaltung. Expired - Lifetime DE3680499D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8519479A FR2592525B1 (fr) 1985-12-31 1985-12-31 Procede de fabrication d'un transistor lateral integre et circuit integre le comprenant

Publications (1)

Publication Number Publication Date
DE3680499D1 true DE3680499D1 (de) 1991-08-29

Family

ID=9326355

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686202321T Expired - Lifetime DE3680499D1 (de) 1985-12-31 1986-12-18 Verfahren zum herstellen eines integrierten lateralen transistors und eine ihn enthaltende integrierte schaltung.

Country Status (5)

Country Link
US (1) US5596220A (de)
EP (1) EP0228748B1 (de)
JP (1) JPH088260B2 (de)
DE (1) DE3680499D1 (de)
FR (1) FR2592525B1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2558472B2 (ja) * 1987-08-19 1996-11-27 松下電子工業株式会社 半導体集積回路
FR2625611B1 (fr) * 1987-12-30 1990-05-04 Radiotechnique Compelec Circuit integre presentant un transistor lateral
FR2640813A1 (fr) * 1988-12-16 1990-06-22 Radiotechnique Compelec Circuit integre presentant un transistor vertical
FR2640814B1 (fr) * 1988-12-16 1991-03-15 Radiotechnique Compelec Circuit integre presentant un transistor vertical
FR2661556A1 (fr) * 1990-04-27 1991-10-31 Philips Composants Circuit integre presentant un transistor lateral multi-collecteurs.
FR2703831A1 (fr) * 1993-04-07 1994-10-14 Philips Composants Dispositif semiconducteur comprenant un transistor latéral.

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5318383B2 (de) * 1974-10-07 1978-06-14
US4167425A (en) * 1975-09-19 1979-09-11 Siemens Aktiengesellschaft Method for producing lateral bipolar transistor by ion-implantation and controlled temperature treatment
FR2365213A1 (fr) * 1976-09-21 1978-04-14 Thomson Csf Transistor bipolaire lateral et circuits utilisant ce transistor
JPS5788769A (en) * 1980-11-25 1982-06-02 Hitachi Ltd Semiconductor device
US4510676A (en) * 1983-12-06 1985-04-16 International Business Machines, Corporation Method of fabricating a lateral PNP transistor
US4689651A (en) * 1985-07-29 1987-08-25 Motorola, Inc. Low voltage clamp

Also Published As

Publication number Publication date
US5596220A (en) 1997-01-21
EP0228748A1 (de) 1987-07-15
FR2592525B1 (fr) 1988-02-12
FR2592525A1 (fr) 1987-07-03
JPS62159467A (ja) 1987-07-15
JPH088260B2 (ja) 1996-01-29
EP0228748B1 (de) 1991-07-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee